二手 AMAT / APPLIED MATERIALS Endura 5500 #9004064 待售

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ID: 9004064
晶圆大小: 8"
HP PVD system, 8" Wafer type: notch Buffer robot type: HP Transfer robot type: HP Buffer robot blade: metal Wafer sensors: cassette Loadlock type: Narrow body with tilt Fab installation: TTW Transfer robot blade: metal Software revision E8.86 Signal tower: Red-amber-green System umbilicals: 50 ft standard EMO's: momentary Loadlock slit valve O rings: Viton (black) No heat exchangers Hard drive: 5 Gb Chamber 2: PVD wide body Process 2: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: None Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC18, Standard gas stick configuration Gas 2 140sccm Argon, STEC 4400 MC mtl seal, MFC19, Standard gas stick configuration Gas valves: Nupro Chamber 3: PVD wide body Process 3: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC2, Standard gas stick configuration Gas 2 100sccm Nitrogen, STEC 4400 MC mtl seal, MFC3, Standard gas stick configuration Gas valves: Nupro Chamber 4: PVD wide body Process 4: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: other Chamber lid clamps: yes Magnet number: 0010-01198 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC5, Standard gas stick configuration Gas 2 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC6, Standard gas stick configuration Gas valves: Nupro Chamber A: Pass through Gas valves: Nupro Slit valve oring: Viton black Chamber orings: Viton black Chamber B: Cooldown Gas valves: Nupro Slit valve oring: Viton brown Manometer: None Heater / cathode cooling: PCW Chamber pump: Edwards Chamber orings: Viton black No turbo pump Chamber E: Orienter / Degas Chamber F: Orienter / Degas AC Rack damaged during transport 1995 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是用于制造半导体元件和系统的关键工具。它主要用于创建符合各种行业标准的高耐用性、低功耗部件和设备。与市场上许多其他工具相比,AKT Endura 5500提供了更高的性能和可靠性,使其成为许多晶圆制造工艺的理想选择。AMAT ENDURA 5500是一个单室、水平反应堆,可以处理多种晶圆尺寸。它设计用于快速、高精度的等离子体蚀刻和沉积过程。设备在腔室底部使用气体喷嘴,设计用于提高蚀刻速度和效率。AMAT Endura 5500的炮塔装有组合载荷锁定和气体注入端口,与手动操作相比,可以更快、低成本的装卸。该系统有几种不同的操作模式,包括"线圈到晶圆"模式,这种模式能够实现可重复的过程周期和提高吞吐量。APPLIED MATERIALS Endura 5500配备了为真空完整性而设计的高级石英室和盖子。该腔室可实现高精度的沉积和蚀刻过程,并具有较低的颗粒水平,同时覆盖广泛的压力和温度范围。该单元还采用了强大的可编程控制器,包括自动和手动控制模式来处理晶圆制造过程的所有部分。ENDURA 5500还配备了先进的晶圆清洗机,旨在进一步提高产量。它采用一种特殊的动力驱动的刷子,高速旋转,有效地去除晶圆表面的任何颗粒。该工具还包括一个快速响应的实时粒子监控器,以确保安全的晶圆清洗和燃烧过程控制。AMAT/APPLIED MATERIALS/AKT ENDURA 5500是最先进半导体器件亚微米精密製造的极可靠工具。它在高通量、单晶片工艺中提供高质量的性能,使其成为晶片制造操作的经济选择。该资产采用高耐力、低功耗的组件构建,可以保证多年的精确、准确运行。
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