二手 AMAT / APPLIED MATERIALS Endura 5500 #9036092 待售
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ID: 9036092
PVD System, 8"
Wafer handling: SMIF
Front panel type: wide body
Software version: B88810
Single board computer in controller: Yes
Ion gauges: Yes
Robots (standard, HP, HP+, VHP, etc):
Buffer robot: HP+
Transfer robot:HP+
Blade material: Metal
Blade material: Metal
Load Lock: Wide Body
Narrow Body: tilt-out
Index handler type:
Loadlock vents: N2 vent
Basic Chamber setup: (PC II, Cooldown, O/D, pass through, CVD, other - w/o details)
A: Cool down
B: Cool down
C: Pre clean II
D: Pre clean II
E: Orient / Enhanced degas
F: Orient / Enhanced degas
Process: VECTRA IMP Ti
Platform: Endura
RF coil power supply: Advance Energy HFV 8000
Chamber temperature: Heater 100°C - Bake 30%
Pump Type: CTI 8F Enhanced Fast Regen Low Vib
MFC #1: Argon Heater
MFC #1 type / size: Stec SEC-4400M 50 Sccm
MFC #2: Argon Final
MFC #2 type / size: Stec SEC-4400M 100 Sccm
Source type: Vectra IMP
Target type / vendor: D-Bond 0.25" - Honeywell
Target part # 7VX00236
Coil part # 7VX20266
Magnet type / part number: Type RH-2 P/N 0010-21676
Ar Psi: 20 PSI
Power supply: MDX 12KW
Shutter: Linkage
Heater: Original 4F
Process Kit (type/desc): IMP Process Kit Version 4.5
Upper Shield Part No: 0020-22498
Lower Shield Part No: 0020-22499
Shield Clamp Kit Part No: 0240-25440
DC Bias Hardware Kit PN: 0240-20021
Process: CVD TiN
Platform: ENDURA
Chamber temperature: 400°C
Chamber type: TxZ HP+
Heater: AMAT P/N 0010-03244
Pump Type: ALCATEL 602 P
HX: AMAT 1
HX temperature: 60°C
MFC #1: Argon Edge Purge
MFC #1 type / size: Stec SEC-4400M 3000 Sccm
MFC #2: Argon BTPur
MFC #2 type / size: Stec SEC-4400M 2000 Sccm
MFC #3: He Carrier
MFC #3 type / size: Stec SEC-4400M 500 Sccm
MFC #4: N2 Dil
MFC #4 type / size: Stec SEC-4400M 1000 Sccm
MFC #5: He Dil
MFC #5 type / size: Stec SEC-4400M 1000 Sccm
MFC #6: N2
MFC #6 type / size: Stec SEC-4400M 1000 Sccm
RF Power supply: ADVANCE ENERGY PDX 900-2V
HE carrier pressure: 18 PSI
HE DIL pressure: 30 PSI
Ampole temperature: 50°C
Gas line temperature: 60°C
Hot Box: 70°C
CVD Ion gauge: Absent
Process Kit (type/desc)
INSERT LINER EXHAUST TXZ 200MM: 0021-02469
RING, LOWER, ISOLATOR: 0021-02155
RING, MIDDLE, ISOLATOR: 0021-02156
EDGE RING, PURGE HEATER, 200MM TXZ: 0021-03094
SCREW, CENTERING PURGE HEATER 200MM TXZ: 0021-07418
OUTER SHIELD W/O WINDOW, TXZ CHAMBER: 0021-03980
INNER SHIELD HP TXZ IMP. UNIF.: 0040-06127
PIN, LIFT, TXZ HEATER: 0200-01798
PLATE,BLOCKER,TXZ 200MM: 0021-35744
FACE PLATE, BKM3 TXZ 200MM: 0040-01878
CHAMBER INSERT 200MM TXZ CIP: 0200-00261
ISOLATOR, SIN, ENH, PUMPING LID, DXZ GECO: 0200-10163
TUBE GAS FEED: 0020-31425
LID LINER, HPTXZ: 0200-00689
Process: PVD TiN
Platform: ENDURA
Ch temp control: Without temp control
Chamber type: WB
Pump Type: CTI 8F Enhanced Fast Regen Low Vib
MFC #1: Argon
MFC #1 type / size: Stec SEC-4400M 100 Sccm
MFC #2: N2
MFC #2 type / size: Stec SEC-4400M 200 Sccm
Source type: G-12
Target type / vendor: D-Bond 0.35" - Praxair
Target part #: 7VX00135
Magnet type / part number: Type G-12 P/N 0010-20768
N2 Psi: 20 PSI
Ar Psi: 20 PSI
Power supply: MDX - L12M - 650
Shutter: Linkage
Heater: SST Pedestal Unclamped 101
Process Kit (type/desc): Shield Mounting G12 btn hd
Upper Shield Part No: 0020-25730
Lower Shield Part No: 0020-25077
Pedestal Part No: 0021-22028
Cover Ring Part No: 0020-24914
Process: Pre-clean
Pedestal type: Preclean II Pik1
Power supply 1: 400 KHz
Power supply 2: 13.56 MHz
Gasline fittings: VCR
Loadlock fittings: VCR
MFC type: Millipore / STEC
Paste chamber: NA
Chamber cryo pump type: CTI 8F Enhanced Fast Regen Low Vib
Umbilicals:
Mainframe to controller: ~25 ft
Mainframe to generator racks: ~25 ft
Mainframe to cryo compressor: ~25 ft
Main AC to system controller/sys. AC: ~25 ft
Syst cont/sys AC to primary Gen rack: ~25 ft
Main AC to primary generator rack: ~25 ft
Main AC to pump frame: ~25 ft
Main AC to Neslab heat exchanger: ~25 ft
Monitor cable: ~25 ft
Monitor2 cable: ~25 ft
Monitor3 cable: ~15 ft
EMO button guard ring: Yes
Water leak detector: yes
Buffer and transfer lid hoist: Yes
Support Equipment:
AMAT 0 Heat exchanger 0010-76467
Cryo compressors:
(2) CTI Cryo pump 1 8135900G001
Neslab with resistivity meter
Soft copy pdf manuals
Currently in a fab
2003 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500反应堆是一种先进的、具有成本效益的多用途集群工具,为要求苛刻的晶圆制造工艺提供了改进的性能要求。该反应堆能够在蚀刻和沉积过程中提供可靠和均匀的环境。AKT Endura 5500反应堆专为单室、双室和多室操作而设计,采用先进的真空设备,具有优越的气体分配和多种选择。AMAT ENDURA 5500采用紧凑的设计,需要最小的空间,占用不到3立方米,使其能够轻松融入任何生产过程。AKT ENDURA 5500允许在三维方向上轻松定位,使其设置和运行更加高效和方便。APPLIED MATERIALS Endura 5500还具有独特的冷却系统,可实现更快的吞吐量和运行之间的冷却。这种多功能集群工具还为蚀刻和沉积过程提供了选项。Endura 5500包括模块化蚀刻和沉积室设计,允许在同一空间进行蚀刻时进行沉积。这种多用途特性确保了在一个反应堆内能够完成各种各样的过程。Endura 5500Reactor提供低成本和低维护,并具有出色的性能和耐用性。其气体输送装置有利于提高吞吐量和提高产品产量。AMAT/APPLIED MATERIALS/AKT ENDURA 5500的高真空能力提高了质量和可重复性,同时消除了晶圆边缘效应。ENDURA 5500具有广泛的控制选项,为蚀刻和沉积过程提供了高度的控制和准确性。反应堆既包括过程控制机,也包括操作员面板,以提高操作员的便利性。该控制工具可管理多个过程参数,流程开发速度快,性能高,精度高.APPLIED MATERIALS ENDURA 5500的高级功能和紧凑的设计使其成为许多应用程序的理想选择。它具有灵活性和易于安装,可将其集成到任何流程中,同时提供优化的结果和卓越的性能。反应堆可以处理从蚀刻到沉积的任何过程,成本低,重复性高,吞吐量提高。
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