二手 AMAT / APPLIED MATERIALS Endura 5500 #9036092 待售

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ID: 9036092
PVD System, 8" Wafer handling: SMIF Front panel type: wide body Software version: B88810 Single board computer in controller: Yes Ion gauges: Yes Robots (standard, HP, HP+, VHP, etc): Buffer robot: HP+ Transfer robot:HP+ Blade material: Metal Blade material: Metal Load Lock: Wide Body Narrow Body: tilt-out Index handler type: Loadlock vents: N2 vent Basic Chamber setup: (PC II, Cooldown, O/D, pass through, CVD, other - w/o details) A: Cool down B: Cool down C: Pre clean II D: Pre clean II E: Orient / Enhanced degas F: Orient / Enhanced degas Process: VECTRA IMP Ti Platform: Endura RF coil power supply: Advance Energy HFV 8000 Chamber temperature: Heater 100°C - Bake 30% Pump Type: CTI 8F Enhanced Fast Regen Low Vib MFC #1: Argon Heater MFC #1 type / size: Stec SEC-4400M 50 Sccm MFC #2: Argon Final MFC #2 type / size: Stec SEC-4400M 100 Sccm Source type: Vectra IMP Target type / vendor: D-Bond 0.25" - Honeywell Target part # 7VX00236 Coil part # 7VX20266 Magnet type / part number: Type RH-2 P/N 0010-21676 Ar Psi: 20 PSI Power supply: MDX 12KW Shutter: Linkage Heater: Original 4F Process Kit (type/desc): IMP Process Kit Version 4.5 Upper Shield Part No: 0020-22498 Lower Shield Part No: 0020-22499 Shield Clamp Kit Part No: 0240-25440 DC Bias Hardware Kit PN: 0240-20021 Process: CVD TiN Platform: ENDURA Chamber temperature: 400°C Chamber type: TxZ HP+ Heater: AMAT P/N 0010-03244 Pump Type: ALCATEL 602 P HX: AMAT 1 HX temperature: 60°C MFC #1: Argon Edge Purge MFC #1 type / size: Stec SEC-4400M 3000 Sccm MFC #2: Argon BTPur MFC #2 type / size: Stec SEC-4400M 2000 Sccm MFC #3: He Carrier MFC #3 type / size: Stec SEC-4400M 500 Sccm MFC #4: N2 Dil MFC #4 type / size: Stec SEC-4400M 1000 Sccm MFC #5: He Dil MFC #5 type / size: Stec SEC-4400M 1000 Sccm MFC #6: N2 MFC #6 type / size: Stec SEC-4400M 1000 Sccm RF Power supply: ADVANCE ENERGY PDX 900-2V HE carrier pressure: 18 PSI HE DIL pressure: 30 PSI Ampole temperature: 50°C Gas line temperature: 60°C Hot Box: 70°C CVD Ion gauge: Absent Process Kit (type/desc) INSERT LINER EXHAUST TXZ 200MM: 0021-02469 RING, LOWER, ISOLATOR: 0021-02155 RING, MIDDLE, ISOLATOR: 0021-02156 EDGE RING, PURGE HEATER, 200MM TXZ: 0021-03094 SCREW, CENTERING PURGE HEATER 200MM TXZ: 0021-07418 OUTER SHIELD W/O WINDOW, TXZ CHAMBER: 0021-03980 INNER SHIELD HP TXZ IMP. UNIF.: 0040-06127 PIN, LIFT, TXZ HEATER: 0200-01798 PLATE,BLOCKER,TXZ 200MM: 0021-35744 FACE PLATE, BKM3 TXZ 200MM: 0040-01878 CHAMBER INSERT 200MM TXZ CIP: 0200-00261 ISOLATOR, SIN, ENH, PUMPING LID, DXZ GECO: 0200-10163 TUBE GAS FEED: 0020-31425 LID LINER, HPTXZ: 0200-00689 Process: PVD TiN Platform: ENDURA Ch temp control: Without temp control Chamber type: WB Pump Type: CTI 8F Enhanced Fast Regen Low Vib MFC #1: Argon MFC #1 type / size: Stec SEC-4400M 100 Sccm MFC #2: N2 MFC #2 type / size: Stec SEC-4400M 200 Sccm Source type: G-12 Target type / vendor: D-Bond 0.35" - Praxair Target part #: 7VX00135 Magnet type / part number: Type G-12 P/N 0010-20768 N2 Psi: 20 PSI Ar Psi: 20 PSI Power supply: MDX - L12M - 650 Shutter: Linkage Heater: SST Pedestal Unclamped 101 Process Kit (type/desc): Shield Mounting G12 btn hd Upper Shield Part No: 0020-25730 Lower Shield Part No: 0020-25077 Pedestal Part No: 0021-22028 Cover Ring Part No: 0020-24914 Process: Pre-clean Pedestal type: Preclean II Pik1 Power supply 1: 400 KHz Power supply 2: 13.56 MHz Gasline fittings: VCR Loadlock fittings: VCR MFC type: Millipore / STEC Paste chamber: NA Chamber cryo pump type: CTI 8F Enhanced Fast Regen Low Vib Umbilicals: Mainframe to controller: ~25 ft Mainframe to generator racks: ~25 ft Mainframe to cryo compressor: ~25 ft Main AC to system controller/sys. AC: ~25 ft Syst cont/sys AC to primary Gen rack: ~25 ft Main AC to primary generator rack: ~25 ft Main AC to pump frame: ~25 ft Main AC to Neslab heat exchanger: ~25 ft Monitor cable: ~25 ft Monitor2 cable: ~25 ft Monitor3 cable: ~15 ft EMO button guard ring: Yes Water leak detector: yes Buffer and transfer lid hoist: Yes Support Equipment: AMAT 0 Heat exchanger 0010-76467 Cryo compressors: (2) CTI Cryo pump 1 8135900G001 Neslab with resistivity meter Soft copy pdf manuals Currently in a fab 2003 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500反应堆是一种先进的、具有成本效益的多用途集群工具,为要求苛刻的晶圆制造工艺提供了改进的性能要求。该反应堆能够在蚀刻和沉积过程中提供可靠和均匀的环境。AKT Endura 5500反应堆专为单室、双室和多室操作而设计,采用先进的真空设备,具有优越的气体分配和多种选择。AMAT ENDURA 5500采用紧凑的设计,需要最小的空间,占用不到3立方米,使其能够轻松融入任何生产过程。AKT ENDURA 5500允许在三维方向上轻松定位,使其设置和运行更加高效和方便。APPLIED MATERIALS Endura 5500还具有独特的冷却系统,可实现更快的吞吐量和运行之间的冷却。这种多功能集群工具还为蚀刻和沉积过程提供了选项。Endura 5500包括模块化蚀刻和沉积室设计,允许在同一空间进行蚀刻时进行沉积。这种多用途特性确保了在一个反应堆内能够完成各种各样的过程。Endura 5500Reactor提供低成本和低维护,并具有出色的性能和耐用性。其气体输送装置有利于提高吞吐量和提高产品产量。AMAT/APPLIED MATERIALS/AKT ENDURA 5500的高真空能力提高了质量和可重复性,同时消除了晶圆边缘效应。ENDURA 5500具有广泛的控制选项,为蚀刻和沉积过程提供了高度的控制和准确性。反应堆既包括过程控制机,也包括操作员面板,以提高操作员的便利性。该控制工具可管理多个过程参数,流程开发速度快,性能高,精度高.APPLIED MATERIALS ENDURA 5500的高级功能和紧凑的设计使其成为许多应用程序的理想选择。它具有灵活性和易于安装,可将其集成到任何流程中,同时提供优化的结果和卓越的性能。反应堆可以处理从蚀刻到沉积的任何过程,成本低,重复性高,吞吐量提高。
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