二手 AMAT / APPLIED MATERIALS Endura 5500 #9177283 待售
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已售出
ID: 9177283
晶圆大小: 8"
System, 8"
Wafer shape: SNNF
Chamber 1: SIP Cu
Process 1: Low temperature Cu
Chamber 2: Wide body
Process 2: TTN
Chamber 3: Wide body
Process 3: TTN
Chamber 4: SIP Cu
Process 4: Low temperature Cu
Chamber A: Pass through
Chamber B: Cooldown
Chamber E: Orient / Degas
Chamber F: Orient / Degas
Transfer robot type: HEWLETT-PACKARD
Transfer robot blade: Metal
Buffer robot type: HEWLETT-PACKARD
Buffer robot blade: Metal
Loadlock type: Narrow BD with tilt out
Signal tower: 4 Color R/G/Y/B
MF Facilities: Bottom
System umbilical: 25 ft
EMIs: Turn to release
No facility power (UPS)
No loadlock pump
Loadlock slit valve O-Ring: Viton (Black)
Heat exchanger 1: NESLAB
Heat exchanger 2: M-Pack
Hard drive: SCSI
(2) CRTs
No GEM
No OTF
Main AC box: 480 V type, wide type
Chamber A:
Chamber type: Pass through
Gas valves: Fujakin
Slit valve o-ring: Viton (Black)
Clear chamber lid
Chamber B:
Chamber type: Cooldown
Gas valves: Fujakin
Slit valve o-ring: Viton (Black)
Heater / Cathode cooling: PCW
Clear chamber lid
Chamber 1:
Chamber type: SIP Cu
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (Black)
Shutter option
Chamber process: Low temperature Cu
Lid type: SIP Source
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6
Susceptor / Pedestal: Low temperature ESC
Wall cooling: PCW
Heater / Cathode cooling: M-Pack
Gate valve position: 3-Pos
Process kit type: SIP
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21676
Gas 1:
MFC Size: N2 100 Sccm
Gas name: AR
MFC Type: STEC 7440
MFC Number: MFC16
Gas stick configuration: Single
Chamber 2:
Chamber type: Wide body
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve O-Ring: Viton (black)
Shutter option
Chamber process: TTN
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ
Susceptor / Pedestal: A101
Heater / Cathode cooling: PCW
Gate valve position: 3-Pos
Process kit type: A101
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21844
Chamber 3:
Chamber type: Wide body
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (black)
Shutter option
Chamber process: TTN
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ
Susceptor / Pedestal: A101
Heater / Cathode cooling: PCW
Gate valve position: 3-Pos
Process kit type: A101
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21844
Chamber 4:
Chamber type: SIP Cu
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (black)
Shutter option
Chamber process: Low temperature Cu
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6
Susceptor / Pedestal: Low temperature ESC
Heater / Cathode cooling: NESLAB III
Process kit type: SIP
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21676
Power supply: 208 VAC, 3 Phase, 5 wire, 400 A.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是为高级蚀刻应用而设计的反应堆设备。这种工具能够达到极高的通量,具有双工艺室设计,允许同时操作蚀刻和清洁过程。AKT Endura 5500具有较大的工艺窗口,能够支持低温蚀刻和清洁的2.6 um设备。AMAT ENDURA 5500配备了用于高选择性蚀刻的专利待定直流脉冲等离子体源,以及在某些薄膜上允许更高蚀刻速率的大面积等离子体。该系统能够在整个基板上具有高蚀刻均匀性的晶片上实现<2%的可重复蚀刻速率均匀性。APPLIED MATERIALS Endura 5500还拥有一个强大的过程控制单元,它允许实时配方和监测诸如基材温度、蚀刻速率和蚀刻均匀性等参数。这台反应堆机器还采用了集成的集群工具,为不间断的自动化端到端处理提供集群解决方桉。Endura 5500具有广泛的柔性基板传输空间以及卡带到卡带、基板到卡带、直接卡带到卡带传输。它还具有高级流程控制模块(APCM),允许用户准确监控、分析和修改其流程配方。AMAT Endura 5500配备了车载监控资产,使其成为要求苛刻的流程可靠稳定的平台。该控制模型具有PID控制和反馈偏差监控功能。PID控制可实现准确和可重复的过程稳定性,而反馈偏差监视可确保过程在预定义的范围内运行。此外,AMAT/APPLICED MATERIALS/AKT ENDURA 5500维护设计低,有超过200点诊断。这包括集成的预防性维护设备、高级流程诊断和远程监控功能。这有助于减少停机时间,因为它允许用户快速识别和解决问题。总体而言,AKT ENDURA 5500是为蚀刻应用而设计的先进反应堆系统。它具有双工艺室设计、直流脉冲等离子体源、配方调节控制单元、先进的集群机、低维护设计等特点。这些特性使得APPLIED MATERIALS ENDURA 5500高效可靠,成为尖端蚀刻工艺的绝佳选择。
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