二手 AMAT / APPLIED MATERIALS Endura 5500 #9177283 待售

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ID: 9177283
晶圆大小: 8"
System, 8" Wafer shape: SNNF Chamber 1: SIP Cu Process 1: Low temperature Cu Chamber 2: Wide body Process 2: TTN Chamber 3: Wide body Process 3: TTN Chamber 4: SIP Cu Process 4: Low temperature Cu Chamber A: Pass through Chamber B: Cooldown Chamber E: Orient / Degas Chamber F: Orient / Degas Transfer robot type: HEWLETT-PACKARD Transfer robot blade: Metal Buffer robot type: HEWLETT-PACKARD Buffer robot blade: Metal Loadlock type: Narrow BD with tilt out Signal tower: 4 Color R/G/Y/B MF Facilities: Bottom System umbilical: 25 ft EMIs: Turn to release No facility power (UPS) No loadlock pump Loadlock slit valve O-Ring: Viton (Black) Heat exchanger 1: NESLAB Heat exchanger 2: M-Pack Hard drive: SCSI (2) CRTs No GEM No OTF Main AC box: 480 V type, wide type Chamber A: Chamber type: Pass through Gas valves: Fujakin Slit valve o-ring: Viton (Black) Clear chamber lid Chamber B: Chamber type: Cooldown Gas valves: Fujakin Slit valve o-ring: Viton (Black) Heater / Cathode cooling: PCW Clear chamber lid Chamber 1: Chamber type: SIP Cu Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (Black) Shutter option Chamber process: Low temperature Cu Lid type: SIP Source RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6 Susceptor / Pedestal: Low temperature ESC Wall cooling: PCW Heater / Cathode cooling: M-Pack Gate valve position: 3-Pos Process kit type: SIP Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21676 Gas 1: MFC Size: N2 100 Sccm Gas name: AR MFC Type: STEC 7440 MFC Number: MFC16 Gas stick configuration: Single Chamber 2: Chamber type: Wide body Manometer config: Single Manometer 1: 100 mTorr Slit valve O-Ring: Viton (black) Shutter option Chamber process: TTN Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ Susceptor / Pedestal: A101 Heater / Cathode cooling: PCW Gate valve position: 3-Pos Process kit type: A101 Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21844 Chamber 3: Chamber type: Wide body Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (black) Shutter option Chamber process: TTN Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ Susceptor / Pedestal: A101 Heater / Cathode cooling: PCW Gate valve position: 3-Pos Process kit type: A101 Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21844 Chamber 4: Chamber type: SIP Cu Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (black) Shutter option Chamber process: Low temperature Cu Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6 Susceptor / Pedestal: Low temperature ESC Heater / Cathode cooling: NESLAB III Process kit type: SIP Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21676 Power supply: 208 VAC, 3 Phase, 5 wire, 400 A.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是为高级蚀刻应用而设计的反应堆设备。这种工具能够达到极高的通量,具有双工艺室设计,允许同时操作蚀刻和清洁过程。AKT Endura 5500具有较大的工艺窗口,能够支持低温蚀刻和清洁的2.6 um设备。AMAT ENDURA 5500配备了用于高选择性蚀刻的专利待定直流脉冲等离子体源,以及在某些薄膜上允许更高蚀刻速率的大面积等离子体。该系统能够在整个基板上具有高蚀刻均匀性的晶片上实现<2%的可重复蚀刻速率均匀性。APPLIED MATERIALS Endura 5500还拥有一个强大的过程控制单元,它允许实时配方和监测诸如基材温度、蚀刻速率和蚀刻均匀性等参数。这台反应堆机器还采用了集成的集群工具,为不间断的自动化端到端处理提供集群解决方桉。Endura 5500具有广泛的柔性基板传输空间以及卡带到卡带、基板到卡带、直接卡带到卡带传输。它还具有高级流程控制模块(APCM),允许用户准确监控、分析和修改其流程配方。AMAT Endura 5500配备了车载监控资产,使其成为要求苛刻的流程可靠稳定的平台。该控制模型具有PID控制和反馈偏差监控功能。PID控制可实现准确和可重复的过程稳定性,而反馈偏差监视可确保过程在预定义的范围内运行。此外,AMAT/APPLICED MATERIALS/AKT ENDURA 5500维护设计低,有超过200点诊断。这包括集成的预防性维护设备、高级流程诊断和远程监控功能。这有助于减少停机时间,因为它允许用户快速识别和解决问题。总体而言,AKT ENDURA 5500是为蚀刻应用而设计的先进反应堆系统。它具有双工艺室设计、直流脉冲等离子体源、配方调节控制单元、先进的集群机、低维护设计等特点。这些特性使得APPLIED MATERIALS ENDURA 5500高效可靠,成为尖端蚀刻工艺的绝佳选择。
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