二手 AMAT / APPLIED MATERIALS Endura 5500 #9221707 待售
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ID: 9221707
优质的: 1993
PVD System
Chambers:
(4) PVD chambers (2 TiN and 2 Al)
(2) Degas chambers
(1) Preclean chamber
CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887
CTI-CRYOGENICS Roughing Valve 8112579G001
CTI-CRYOGENICS On-Board 8F Cryopump 8116142G001
CTI-CRYOGENICS Roughing Valve 8112579G001
CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001
CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887
CTI-CRYOGENICS SPLTR Box Tool 8135240G001
MKS Type 627 Pressure Transducer
MKS Type 627 Pressure Transducer
MKS Type 627 Pressure Transducer
CTI-CRYOGENICS Roughing Valve 8112579G001
CTI-CRYOGENICS SPLTR Box Tool 8135240G001
CTI-CRYOGENICS On-Board FastRegen Sputtering Control
CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001
CTI-CRYOGENICS Roughing Valve 8112579G001
CTI-CRYOGENICS Valve 8112095
CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001
CTI-CRYOGENICS On-Board FastRegen Sputtering Control
MKS Type 627 Pressure Transducer
Endura Wafer Lift Assembly 101 Rev. 003 0010-70271
8" Preclean II RF Match 0010-20524 (Label PN 0060-21140)
Endura Wafer Lift Assembly Preclean 2 Rev. 003, 21902-08
MKS Type 627 Pressure Transducer
0010-20277
8" Degas Lamp 350C 0010-20317
8" Degas Lamp 350C 0010-20317
CTI-CRYOGENICS On-Board Module 8113100G001
CTI-CRYOGENICS Roughing Valve 8112579G001
Gas Box #1 0010-20217 Rev. B
CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887
CTI-CRYOGENICS On-Board 8F Cryopump 8116142G001
Loadlock A (11)
Loadlock B (0620-01049)
Operator Control Panel BD Assy. 0100-20032 Rev. D
ViewSonic E55 Monitor VCDTS21914-2M
Standalone VGA Monitor Base 0010-70386 Rev. A
Gas Box #2 0010-20218 Rev. B
Gen Rack #1
ADVANCED ENERGY MDX-L12M
ADVANCED ENERGY MDX-L12-650
ADVANCED ENERGY MDX-L12M-650
Gen Rack #2
ADVANCED ENERGY MDX-L12M
ADVANCED ENERGY MDX-L12M
Gen Rack #3
ADVANCED ENERGY LF10A
COMDEL RF Power Source CPS-1001S
GRANVILLE-PHILLIPS Ionization Gauge Supply 332102
15V PS Assembly
24V PS Assembly
CTI-CRYOGENICS On-Board 3PH MTR Control 8124063G001
CPRSR High Perf Model 9600 3620-01389 Rev. A
CTI-CRYOGENICS On-Board 3PH MTR Control 8124063G001
Thornton 200CR
CTI-CRYOGENICS 9600 Compressor 8135917G001
CTI-CRYOGENICS 9600 Compressor 8135909G001
NESLAB BOM # 327099991701
EBARA A30W
EBARA A70W
HARMONIC GEAR UGH50-28
VEXTA 5-Phase Stepping Motor A4249-9215HG
VEXTA 5-Phase Stepping Motor A4249-9215HG-A1
GEORG FISCHER V 82
Supply voltage: 480 VAC, 3 phase, 50/60 Hz
Max system rating: 150 kW
Largest load ampere rating: 42 A
Interrupt current: 10,000 Amps IC
1993 vintage.
AMAT/APPLICED MATERIALS/AKT Endura 5500是为半导体制造业设计的大面积等离子体加工设备。该系统可用于通过等离子体蚀刻和沉积处理多种晶片，包括硅和蓝宝石。也可用于屏障层、氧化物层、薄膜堆栈等多种其他用途。AKT Endura 5500是一个独立的、完全集成的单元，包含一个工艺室、气柜和工艺控制模块。这允许对包括压力、气体和功率设置在内的多个功能进行独立控制,从而可以根据特定应用对过程进行精确定制。机器还包括多种屏蔽材料,以保护用户免受刀具环境中存在的高电压和高温的影响。该资产被设计为对工艺室的温度、功率和气流进行高度精确的控制。电源级别从300W到5000W不等,允许进行多种流程设置。腔室温度维持在1033摄氏度至1133C之间，而压力范围为0.002托至760托。另外，腔室的流量可以从0.18升/分钟到15升/分钟不等。AMAT ENDURA 5500还通过其离子和中性粒子质谱仪（IPMS）提供实时现场分析。这使操作员能够监控等离子体环境并实现对过程的精确控制。此外,该模型还具有改进的过程控制模块,可提供增强的设备诊断和过程优化。此外，AKT ENDURA 5500提供了增强的安全功能，包括故障检测系统和防护性气体包络，以容纳任何溢出物。这确保了人员的安全和过程的完整性。ENDURA 5500是一个高效的热处理单元,旨在实现精确的过程控制和可重复性。是先进半导体器件制造与集成的理想选择。它为硅片的蚀刻和沉积等工艺提供了一个可靠、经济高效的解决方桉。通过实时现场分析和设置范围，这台机器非常适合各种应用。
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