二手 AMAT / APPLIED MATERIALS Endura 5500 #9241774 待售

看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。

ID: 9241774
晶圆大小: 8"
优质的: 2000
MOCVD System, 8" Wafer shape: SNNF MF Facilities: Bottom Load lock type: Narrow BD without tilt out CTI-CRYOGENICS Buffer chamber CTI-CRYOGENICS Transfer chamber No SMIF interface Mainframe: Buffer robot type: HP+ Wafer sensor: Mini beam Buffer robot blade: Metal Transfer robot type: HP+ Transfer robot blade: Metal Hard Disk Drive (HDD): SCSI (2) CRT Monitors Chamber 1: Type: IMP Vectra Process 1: Ti Susceptor / Pedestal: B101 Process kit type: IMP Single manometer configuration Lid type: G12 Chamber pump: 3P Onboard 8F Manometer 1: 100 mTorr Heater / Cathode cooling: NESLAB II CTI-CRYOGENICS Cryo pump LEYBOLD Turbotronik NT 150/360 Turbo controller (2) RF Generators / DC Supplies ADVANCED ENERGY MDX-L12M ADVANCED ENERGY HFV-8000 ADVANCED ENERGY CX-600S RF Match: 13.56 MHz, 2 MHz Shutter option Gate valve position: 3-Position 2 MHz Matching box capacitor: 0.01uF Chamber 2: Chamber type: TxZ HP+ Process 2: CVD TiN Susceptor / Pedestal: HP+ Dual manometer Wall cooling: AMAT1 Chamber pump: AA70W Manometer 1: 10 Torr Manometer 2: 100 Torr No endpoint system Throttle valve Heater / Cathode cooling: PCW ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply LEYBOLD 361C Turbo pump LEYBOLD Turbotronik NT 150/360 Turbo controller EBARA AA70W Pump Gate valve position: 2-Positions Chamber 3: Chamber type: TxZ HP+ Chamber process: CVD TiN Pump configuration: 361C Susceptor / Pedestal: HP+ Dual manometer Wall cooling: AMAT1 Chamber pump: AA70W Manometer 1: 10 Torr Manometer 2: 100 Torr Throttle valve Heater / Cathode cooling: PCW ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply LEYBOLD 361C Turbo pump EBARA AA70W Pump Gate valve position: 2-Positions No endpoint system Chamber A: Chamber type: Pass through Chamber lid: Clear lid Chamber B: Chamber type: Cool down Heater / Cathode cooling: PCW Chamber lid: Clear lid Chamber D: Chamber type: PCII Chamber process: Oxide etch Single manometer Lid type: Resonator EDWARDS iL600N Chamber pump Manometer 1: 100 m Torr COMDEL CPS 1001S RF Generator / DC Supply LEYBOLD Turbovac 361C Turbo pump LEYBOLD Turbotronik NT 150/360 Turbo controller EBARA iL70 Pump RFPP LF10A RF Generator / DC Supply RF Match: 13.56 MHz COMDEL CPS-1001S RFPP LF-10A Module: AMAT / APPLIED MATERIALS System controller (2) AMAT / APPLIED MATERIALS Generator racks AMAT / APPLIED MATERIALS Main AC box NESLAB AMAT / APPLIED MATERIALS Heat exchanger CTI-CRYOGENICS 9600 Compressor CTI-CRYOGENICS 3P Motor controller EDWARDS iL600N Pump Controllers: Slot / Top rack board 1 / SBC Board 2 / Videl board 3 / OMS Board 4 / Digital input / Output board 1 5 / Digital input / Output board 2 6 / Digital input / Output board 3 7 / Digital input / Output board 4 8 / Digital input / Output board 5 9 / Digital input / Output board 6 10 / SEI Board 13 / Digital input / Output board 7 (Option) 14 / AO Board 1 (Option) 15 / Stepper board 1 18 / Stepper board 2 19 / AI Board 20 / AO Board 2 21 / AO Board 3 22 / Hard Disk Drive (HDD) 23 / Grounding JAC 24 / Convectron board 25 / Convectron board 26 / Convectron board 27 / Convectron board 28 / TC 29 / TC 30 / ION Gauge board 1 31 / ION Gauge board 2 32 / Spare 33 / Digital input / Output board 8 34 / Digital input / Output board 9 35 / Digital input / Output board 10 37 / Digital input / Output board 12 39 / Digital input / Output board 14 40 / Floppy disk 42 / Cryo temp 43 / AI Mux 44 / AI Mux 45 / AI Mux 47 / Opto detect board 1 48 / Opto detect board 2 49 / Opto detect board 3 Power supply: 200 VAC, 60 Hz, 3 Phase, 343 A, 150 kVA 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种创新的自动化化学气相沉积(CVD)薄膜涂层反应器,设计用于先进的半导体、太阳能、光电等应用。AKT Endura 5500反应堆具有5500升的工艺室容积和热墙反应堆设计,得益于广泛的主动冷却设备,提供了高热效率和可靠性。该反应器基于AKT专利的热墙工艺,为各种薄膜材料提供了最佳生长条件。AMAT ENDURA 5500利用专利衬里,允许晶片直接装入腔室,而不会将外部产生的粒子引入工艺。这些衬里被设计用来最小化或消除由于现场拥挤而造成的晶片的口袋和变薄。此外,随附的洗涤器条在腔内保持最高的工艺纯度。此外,APPLIED MATERIALS ENDURA 5500还包括一个板载测量室,用于优化过程控制和提供最佳薄膜属性。AKT ENDURA 5500采用创新的均匀喷射器激发系统和专利的多点激发模式,消除阴影效应,在较大的晶圆尺寸上实现均匀,为高效均匀的薄膜生长提供均匀等离子体。反应堆的热墙设计为先进材料创造了理想的工作环境,即使在高温下也能产生优越的薄膜特性。机动化载波加载和端站机器人设计为支持大容量吞吐量。全自动单元提供了一个锁载室,一个人机界面(HMI),用于简化控制,温度控制和操作过程中的实时监控。综上所述,AMAT Endura 5500是一种可靠高效的CVD反应堆,设计用于工艺流体控制和生产。这款热壁机采用5500升工艺室和外部洗涤器衬里,非常适合种植薄膜材料,创造出最佳的薄膜特性。均匀喷射器励磁工具、多点励磁模式和机动载波载荷能力为射频薄膜沉积提供了高效可靠的资产。
还没有评论