二手 AMAT / APPLIED MATERIALS Endura 5500 #9241774 待售
看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。
单击可缩放
![Loading](/img/loader.gif)
已售出
ID: 9241774
晶圆大小: 8"
优质的: 2000
MOCVD System, 8"
Wafer shape: SNNF
MF Facilities: Bottom
Load lock type: Narrow BD without tilt out
CTI-CRYOGENICS Buffer chamber
CTI-CRYOGENICS Transfer chamber
No SMIF interface
Mainframe:
Buffer robot type: HP+
Wafer sensor: Mini beam
Buffer robot blade: Metal
Transfer robot type: HP+
Transfer robot blade: Metal
Hard Disk Drive (HDD): SCSI
(2) CRT Monitors
Chamber 1:
Type: IMP Vectra
Process 1: Ti
Susceptor / Pedestal: B101
Process kit type: IMP
Single manometer configuration
Lid type: G12
Chamber pump: 3P Onboard 8F
Manometer 1: 100 mTorr
Heater / Cathode cooling: NESLAB II
CTI-CRYOGENICS Cryo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
(2) RF Generators / DC Supplies
ADVANCED ENERGY MDX-L12M
ADVANCED ENERGY HFV-8000
ADVANCED ENERGY CX-600S
RF Match: 13.56 MHz, 2 MHz
Shutter option
Gate valve position: 3-Position
2 MHz Matching box capacitor: 0.01uF
Chamber 2:
Chamber type: TxZ HP+
Process 2: CVD TiN
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
No endpoint system
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA AA70W Pump
Gate valve position: 2-Positions
Chamber 3:
Chamber type: TxZ HP+
Chamber process: CVD TiN
Pump configuration: 361C
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
EBARA AA70W Pump
Gate valve position: 2-Positions
No endpoint system
Chamber A:
Chamber type: Pass through
Chamber lid: Clear lid
Chamber B:
Chamber type: Cool down
Heater / Cathode cooling: PCW
Chamber lid: Clear lid
Chamber D:
Chamber type: PCII
Chamber process: Oxide etch
Single manometer
Lid type: Resonator
EDWARDS iL600N Chamber pump
Manometer 1: 100 m Torr
COMDEL CPS 1001S RF Generator / DC Supply
LEYBOLD Turbovac 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA iL70 Pump
RFPP LF10A RF Generator / DC Supply
RF Match: 13.56 MHz
COMDEL CPS-1001S
RFPP LF-10A
Module:
AMAT / APPLIED MATERIALS System controller
(2) AMAT / APPLIED MATERIALS Generator racks
AMAT / APPLIED MATERIALS Main AC box
NESLAB
AMAT / APPLIED MATERIALS Heat exchanger
CTI-CRYOGENICS 9600 Compressor
CTI-CRYOGENICS 3P Motor controller
EDWARDS iL600N Pump
Controllers:
Slot / Top rack board
1 / SBC Board
2 / Videl board
3 / OMS Board
4 / Digital input / Output board 1
5 / Digital input / Output board 2
6 / Digital input / Output board 3
7 / Digital input / Output board 4
8 / Digital input / Output board 5
9 / Digital input / Output board 6
10 / SEI Board
13 / Digital input / Output board 7 (Option)
14 / AO Board 1 (Option)
15 / Stepper board 1
18 / Stepper board 2
19 / AI Board
20 / AO Board 2
21 / AO Board 3
22 / Hard Disk Drive (HDD)
23 / Grounding JAC
24 / Convectron board
25 / Convectron board
26 / Convectron board
27 / Convectron board
28 / TC
29 / TC
30 / ION Gauge board 1
31 / ION Gauge board 2
32 / Spare
33 / Digital input / Output board 8
34 / Digital input / Output board 9
35 / Digital input / Output board 10
37 / Digital input / Output board 12
39 / Digital input / Output board 14
40 / Floppy disk
42 / Cryo temp
43 / AI Mux
44 / AI Mux
45 / AI Mux
47 / Opto detect board 1
48 / Opto detect board 2
49 / Opto detect board 3
Power supply: 200 VAC, 60 Hz, 3 Phase, 343 A, 150 kVA
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种创新的自动化化学气相沉积(CVD)薄膜涂层反应器,设计用于先进的半导体、太阳能、光电等应用。AKT Endura 5500反应堆具有5500升的工艺室容积和热墙反应堆设计,得益于广泛的主动冷却设备,提供了高热效率和可靠性。该反应器基于AKT专利的热墙工艺,为各种薄膜材料提供了最佳生长条件。AMAT ENDURA 5500利用专利衬里,允许晶片直接装入腔室,而不会将外部产生的粒子引入工艺。这些衬里被设计用来最小化或消除由于现场拥挤而造成的晶片的口袋和变薄。此外,随附的洗涤器条在腔内保持最高的工艺纯度。此外,APPLIED MATERIALS ENDURA 5500还包括一个板载测量室,用于优化过程控制和提供最佳薄膜属性。AKT ENDURA 5500采用创新的均匀喷射器激发系统和专利的多点激发模式,消除阴影效应,在较大的晶圆尺寸上实现均匀,为高效均匀的薄膜生长提供均匀等离子体。反应堆的热墙设计为先进材料创造了理想的工作环境,即使在高温下也能产生优越的薄膜特性。机动化载波加载和端站机器人设计为支持大容量吞吐量。全自动单元提供了一个锁载室,一个人机界面(HMI),用于简化控制,温度控制和操作过程中的实时监控。综上所述,AMAT Endura 5500是一种可靠高效的CVD反应堆,设计用于工艺流体控制和生产。这款热壁机采用5500升工艺室和外部洗涤器衬里,非常适合种植薄膜材料,创造出最佳的薄膜特性。均匀喷射器励磁工具、多点励磁模式和机动载波载荷能力为射频薄膜沉积提供了高效可靠的资产。
还没有评论