二手 AMAT / APPLIED MATERIALS Endura 5500 #9241831 待售
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ID: 9241831
晶圆大小: 6"
优质的: 2000
System, 6"
Load lock chamber:
LLC Type: Narrow body
Indexer without rotation
Wafer mapping
CH Vent: Slow / Fast vent
No wafer slide out detector
Buffer chamber:
Robot unit: HP
Blade type: Metal
Upper & lower motor
(2) Gate valves
Cryo pump: 3 Phase
(7) Wafer sensors
Transfer chamber:
Robot unit: HP
Blade type: Metal
Upper & lower motor
(2) Gate valves
Cryo pump: 3 Phase
(6) Wafer sensors
Chamber A: Pass through
Chamber B: Cool down
Chamber A / B:
Lid type: Clear plastic
Wafer lift
Wafer lift hoop
No TC monitor
Chamber E / F: Oreintor degas
Degas lamp module
Wafer lift
Wafer lift hoop
Wafer chuck
Orientor controller PCB
Laser tub missing
Laser CCD array PCB
No TC
No TC amp
Chamber 1: PVD Wide body
Source assy: 11.3"
Source bracket kit
Coh ti adaptor plate
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic 1/8 poly line set
Chamber 2: PVD Wide body
Source assy, 11.3"
Source bracket kit
Adaptor plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber 3 / 4: PVD Wide body
Source assy: 11.3"
Source bracket kit
Adaptor plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Convectron gauge
Ar Backside
(3) Gate valves: PVD
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber C: PCII Etch
Resonator
Pedestal lift
MKS Manometer
Convectron gauge
Ion gauge
Turbo pump
Wafer lift
RF Match
No process kit
Chamber 1,2,3,4 & C:
Gas panel assy
MFC: (STEC 4400)
MFC Down steam valve
Manual shut off valve
MFC Control cable
MFC Inter-connect PCB
Sub-module:
Cryo compressor: CTI 9600 & 8500
(2) Cryo controllers: 3 Phase
Chiller: NESLAB III
Vacuum pump
System pump: BOC EDWARDS QDP40
PCII Pump: BOC EDWARDS QDP40 + MB250
System rack: VEM
SBC
Video
SEI
(12) DIO
AI
(2) AO
(3) Opto PCB
(2) AI Mux
Cryo temp /AI MUX
(4) Steppers PCB
TC Gauge PCB
(2) Ion gauge PCB
(4) Invertron gauge PCB
OMS PCB
Hard disk
FD Disk
(4) 2-Phase HTR lift drivers
(6) 5-Phase robot drives
RF Rack:
RF/DC Rack
Turbo controller
(5) ISO AMP
(4) DC/RF Generator interlocks PCB
DC Power supply
DC Generator: Model ADVANCE ENERGY MDX-L series
RF Generator CPS 1001
RF Generator RFPPLF10A
AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer
DC Power supply: +5 VDC / +24 VDC
DC Power supply: +/-15 VDC / +/-12 VDC
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种气体必需的原位蚀刻反应器,用于半导体加工和模具应用。它旨在利用惰性气体或反应性气体以及优化的基板到天线设计,为蚀刻应用提供最佳的均匀性和可靠性。AKT Endura 5500的特点是具有双基底能力的反应堆,同时具有下腔和上腔。下室针对高速蚀刻和沉积过程进行了优化,而上室为需要更精确控制的蚀刻和沉积过程提供了更大的工艺窗口。AMAT ENDURA 5500配备了低噪声、低功率、主动冷却的等离子体,为各种蚀刻和沉积过程提供了可靠的操作。内置的动态压力控制允许调节射频功率,以保持最佳的过程均匀性和可靠性。APPLICED MATERIALS Endura 5500利用超声波变频技术,保证基板的均匀加热,聚合物等有机材料的均匀蚀刻。APPLIED MATERIALS ENDURA 5500反应堆的宽带能力使用户能够最大限度地提高其工具的吞吐量和利用率,同时优化其性能。AMAT/APPLIED MATERIALS/AKT ENDURA 5500还具有多种先进的工艺监测系统,包括光发射光谱、热成像和光学显微镜分析。使用AKT ENDURA 5500,用户可以实时监控关键流程参数,并根据需要进行调整,从而实现更好的流程控制和优化。该系统易于使用、精度高,为直接控制和监控所有主要工艺参数提供了广泛的可编程性。为了安全可靠的操作,AMAT Endura 5500还包括内置安全系统,配有安全联锁和防护硬件,以保护操作员和设备免受意外危险。它包括各种运动和热控制系统,允许用户根据自己的特定需求进行配置。Endura 5500还提供了一个自动化的维护系统,以确保它保持在最佳状态,并为最佳蚀刻和沉积操作做好准备。
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