二手 AMAT / APPLIED MATERIALS Endura 5500 #9241831 待售

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AMAT / APPLIED MATERIALS Endura 5500
已售出
ID: 9241831
晶圆大小: 6"
优质的: 2000
System, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Oreintor degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orientor controller PCB Laser tub missing Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit Coh ti adaptor plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Cryo pump: 3 Phase Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1,2,3,4 & C: Gas panel assy MFC: (STEC 4400) MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: Cryo compressor: CTI 9600 & 8500 (2) Cryo controllers: 3 Phase Chiller: NESLAB III Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC Video SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI Mux Cryo temp /AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauge PCB (4) Invertron gauge PCB OMS PCB Hard disk FD Disk (4) 2-Phase HTR lift drivers (6) 5-Phase robot drives RF Rack: RF/DC Rack Turbo controller (5) ISO AMP (4) DC/RF Generator interlocks PCB DC Power supply DC Generator: Model ADVANCE ENERGY MDX-L series RF Generator CPS 1001 RF Generator RFPPLF10A AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种气体必需的原位蚀刻反应器,用于半导体加工和模具应用。它旨在利用惰性气体或反应性气体以及优化的基板到天线设计,为蚀刻应用提供最佳的均匀性和可靠性。AKT Endura 5500的特点是具有双基底能力的反应堆,同时具有下腔和上腔。下室针对高速蚀刻和沉积过程进行了优化,而上室为需要更精确控制的蚀刻和沉积过程提供了更大的工艺窗口。AMAT ENDURA 5500配备了低噪声、低功率、主动冷却的等离子体,为各种蚀刻和沉积过程提供了可靠的操作。内置的动态压力控制允许调节射频功率,以保持最佳的过程均匀性和可靠性。APPLICED MATERIALS Endura 5500利用超声波变频技术,保证基板的均匀加热,聚合物等有机材料的均匀蚀刻。APPLIED MATERIALS ENDURA 5500反应堆的宽带能力使用户能够最大限度地提高其工具的吞吐量和利用率,同时优化其性能。AMAT/APPLIED MATERIALS/AKT ENDURA 5500还具有多种先进的工艺监测系统,包括光发射光谱、热成像和光学显微镜分析。使用AKT ENDURA 5500,用户可以实时监控关键流程参数,并根据需要进行调整,从而实现更好的流程控制和优化。该系统易于使用、精度高,为直接控制和监控所有主要工艺参数提供了广泛的可编程性。为了安全可靠的操作,AMAT Endura 5500还包括内置安全系统,配有安全联锁和防护硬件,以保护操作员和设备免受意外危险。它包括各种运动和热控制系统,允许用户根据自己的特定需求进行配置。Endura 5500还提供了一个自动化的维护系统,以确保它保持在最佳状态,并为最佳蚀刻和沉积操作做好准备。
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