二手 AMAT / APPLIED MATERIALS Endura 5500 #9257162 待售
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ID: 9257162
Sputtering system, 6"
Load lock chamber:
LLC Type: Narrow body
Indexer without rotation
Wafer mapping
CH Vent: Slow / Fast vent
No wafer slide out detector
Buffer chamber:
AGILENT / HP / HEWLETT-PACKARD Robot
Upper and lower motors
(2) Gate valves
Cryo pump: 3 Phase
(7) Wafer sensors
Transfer chamber:
AGILENT / HP / HEWLETT-PACKARD Robot
Upper and lower motors
(2) Gate valves
Cryo pump: 3 Phase
(6) Wafer sensors
Chamber A: Pass through
Chamber B: Cool down
Chamber A / B:
Lid type: Clear plastic
Wafer lift
Wafer lift hoop
No TC monitor
Chamber E / F: Orienter degas
Degas lamp module
Wafer lift
Wafer lift hoop
Wafer chuck
Orienter controller PCB
Laser CCD array PCB
No TC
No TC amp
Chamber 1: PVD Wide body
Source assy: 11.3"
Source bracket kit
COH TI Adapter plate
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump, 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic 1/8 poly line set
Chamber 2: PVD Wide body
Source assy, 11.3"
Source bracket kit
Adapter plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber 3 / 4: PVD Wide body
Source assy: 11.3"
Source bracket kit
Adapter plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Convectron gauge
Ar Backside
(3) Gate valves: PVD
Ion gauge
Shutter option
Heater type
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber C: PCII Etch
Resonator
Pedestal lift
MKS Manometer
Convectron gauge
Ion gauge
Turbo pump
Wafer lift
RF Match
No process kit
Chamber 1, 2, 3, 4, C:
Gas panel assy
MFC: STEC 4400
MFC Down steam valve
Manual shut off valve
MFC Control cable
MFC Inter-connect PCB
Sub-module:
CTI-CRYOGENICS 9600 Cryo compressor
(2) Cryo controllers: 3 Phase
NESLAB III Chiller
Vacuum pump
System pump: BOC EDWARDS QDP40
PCII Pump: BOC EDWARDS QDP40 + MB250
System rack: VEM
SBC
SEI
(12) DIO
AI
(2) AO
(3) Opto PCB
(2) AI MUX
Cryo temp / AI MUX
(4) Steppers PCB
TC Gauge PCB
(2) Ion gauges PCB
(4) Invertron gauges PCB
OMS PCB
Hard Disk Drive (HDD)
Floppy Disk Drive (FDD)
(4) HTR Lift drivers, 2-Phase
(6) Robot drives, 5-Phase
RF Rack:
RF / DC Rack
(5) ISO Amp
(4) DC / RF Generator interlocks PCB
DC Power supply
ADVANCED ENERGY MDX-L12 DC Generator
CPS 1001 RF Generator
RFPPLF10A RF Generator
Missing parts:
Metal blades
Laser tubes
Heater type: Clamp
Cryo pump, 3 Phase
Turbo controller
RF / DC Rack
ADVANCED ENERGY MDX-L Series DC Generator
RF Generator, 13.56 MHz / 400 kHz
Power supply:
AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer
DC Power supply: +5 VDC / +24 VDC
DC Power supply: +/-15 VDC / +/-12 VDC
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种用于湿蚀刻的基于半导体的高密度等离子体反应器。该反应器的设计是为了在先进集成电路的生产和工程中提供卓越的均匀性。它提供了广泛的等离子体资源选项,以及最先进的过程控制和监控功能。AKT Endura 5500操作系统旨在减少工艺偏差,同时提高性能和产量。AMAT ENDURA 5500被设计为具有氮化氙(GaN)蚀刻工艺。它具有二极管泵浦脉冲等离子体源模块、过程控制模块和蚀刻模块。脉冲等离子体源是一种高压高效装置,能够对等离子体参数进行精细控制,提高蚀刻性能。工艺控制模块为各种生产要求提供了灵活性。它能够控制多种气体管线和输送阀,以及方便地实时切换多个蚀刻参数,如气压、压板电压、蚀刻时间、压板电压偏置、腔室温度等。蚀刻模块的设计具有灵活性、蚀刻过程的加速度和蚀刻图桉的均匀性。它具有可复制的印版设计,以减少潜在的工艺偏差,同时还支持针对特殊蚀刻工艺的特定印版设计。AKT ENDURA 5500是一种高度可靠的反应堆,维护要求低。它能够实现低缺陷率,同时保持高产品产量。该反应堆设计易于使用,具有直观的用户界面,以及简单、分步的工艺支持。它为工艺工程师和生产人员提供了有关工艺结果的宝贵反馈,从而加快了周期时间并提高了产量。该反应堆还设计用于生产和工程过程参数的长期稳定性和可重复性。总体而言,AMAT Endura 5500是一种用于湿蚀刻的高度先进、可靠、易于使用的高密度等离子体反应器。它旨在提供改进的过程控制、统一的蚀刻模式和提高的产品产量。它可实现更轻松、更快和可重复的过程,同时还为工程师和生产人员提供有关过程结果的宝贵反馈。
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