二手 AMAT / APPLIED MATERIALS Endura CL #293752937 待售
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ID: 293752937
晶圆大小: 12"
优质的: 2001
System, 12"
Chamber E/F: STD Degas
Chamber D: PC-XT
Chamber 1: IMP
Chamber 2/3: TxZ
(2) Scanners
Generator rack
Distribution rack
AC Rack
Monitor missing
Front monitor
Flex controller: VME Type
(2) PODs
Light curtain: FABS Type(JAPAN)
Signal tower: 3 Colors
Aligner type: Single axis stand alone
Passthrough: Dummy 12-Slot
Missing parts:
KENSINGTON Robot
Robot controller 1/2
FI HDD/FDD
CD ROM
FI CPU Board
(2) Degas Chambers (E/F)
Chamber type: STD Heater Type
Cryo pump missing
Chambers A&B:
Chamber A: Passthrough
Chamber B: Cooldown
Lid type: Clear Lid
Buffer and transfer:
Robot type: VHP Robot
(12) Slit V/V Assemblies
(12) Slit V/V Doors
Missing parts:
Cryo Pump
SBC452 Board
P-III CPU Board
Buffer Interlock Board
FE HDD
RT HDD
FE/RT FDD
VHP Robot cover
Chamber 1:
Process type: Vectra IMP
IMP Adaptor
Weldment type: STD
Controller tower type: CL STD Type
Lid hoist type: Gas spring type
Heater type: B101
Gate V/V type: 3 Position
Shitter option: CL STD Type
Missing parts:
Coil match
Bias match
Cryo pump
Coil matching box: 2 MHz
Bias matching box
Shutter driver
Wafer lift driver
Bias pedestal RF power cable
Ion/Convectron gauge controller
Pedestal driver
Chamber 2:
Process Type: TxZ
Gas box type: TFTE DLI Type
Gas delivery & exhaust: TFTE Type
TurboVac 361C Pump
Heater type: TxZ STD
Turbo isolation valve: Angle valve
Baratron gauge: 2T/1000Torr
MFC: (5) STEC
Missing parts:
Throttle valve
MFC and valve for purge module
Chamber feedthrough
DI/O Board
TDMAT Bottle
Purge module bracket
Lid CVGGF
Chamber 3:
Process Type: TxZ
Gas box type: TFTE DLI Type
Gas delivery & exhaust: TFTE Type
TurboVac 361C Pump
Purge module: BOT/EDGE/BS
Baratron gauge 2T/1000Torr
MFC: (5) STEC
Missing parts:
Throttle valve
MFC and valve for purge module
Chamber feedthrough
TxZ Heater & Lift pin
Purge module bracket
Chamber D:
Process Type: PC-XT
Resonator type: Fan resonator
Controller tower type: CL STD Type
TurboVac 1000C Pump
Gate V/V Type: 2Pos
Bias match option: 13.56 MHz
MFC: (2) STEC
Missing parts:
Analog board
Bias matching box
Pedestal RF Power
Pedestal lift assembly
Lift/Pedestal driver
RGA Manual valve
PC-XT Pedestal
DI Max Cooler: DI Max
Chiller: Steelhead 1
Compressor missing
Racks:
Distribution rack
(2) Generator racks
AC Rack
Accessories:
TDMAT auto re-fill gas cabinet
Abatement device 1/2
UPS
Umbilical cable
Pump frame
System earthquake prevention belt brackets
INFICON RGA Accessories
AC Rack DI/O board missing
IMP CDX-1250 Bias generator missing
Power supply:
Chamber 1:
Dual Pinnacle 10 kW+6 kW
HFV-8000 5 kW
Chamber 2, 3:
COMDEL CLX-2500
Chamber D:
ENI GMW-25A 2 MHz
ENI GHW-12A 123.56 MHz
Missing pumps:
SWLL
Degas
RPC
2001 vintage.
AMAT/APPLIED MATERIALS Endura CL是一种扩散系统的高性能晶圆加工反应器。这种专用设备用于从半导体晶圆表面沉积、蚀刻和剥离薄层材料。其化学-机械抛光(CMP)能力使得特征和表面即使在纳米级也能均匀平面化。AMAT Endura CL反应堆标配Chroma 1400晶圆进给器和SpeedTec EBR-2000电源,这两者都有助于确保沉积和图样的均匀。反应堆还设有120 kV E-gun、自动气体处理和喷射设备以及实时温度测量和管理系统,允许处理晶片时的精度和重复性。此外,该设备还内置了容错程序,可帮助实时预测和纠正处理错误。APPLICED MATERIALS Endura CL反应器专为金属化应用而设计,其高功率沉积能力每小时最多可处理50个晶圆。该反应堆具有三真空环境和超高真空(UHV)室,可消除宇宙辐射、感应电流和粒子污染。这种严密的真空环境允许对反应条件进行更大程度的控制,从而产生精确操纵、一致的薄膜外观和均匀性。Endura CL反应堆的紧凑设计使其能够轻松融入洁净室环境。其低维持性的催化化学气相沉积(CVD)工艺允许以快速和可重复的方式均匀沉积介电和金属化膜。反应堆还具有多种不同的特定于工艺的配置,允许各种各样的晶圆加工应用。AMAT/APPLIED MATERIALS Endura CL反应堆有AMAT典型的客户服务和维护计划作为后盾,确保机器获得必要的支持和技术专业知识以保持其高效运行。这种高性能的半导体设备是那些希望从晶圆表面沉积、蚀刻和剥离薄层材料的人必不可少的工具。其先进的特性使得特征和表面即使在纳米级也能均匀平面化。
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