二手 AMAT / APPLIED MATERIALS ENDURA #9235921 待售
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ID: 9235921
晶圆大小: 8"
优质的: 2006
PVD System, 8"
Product wafer
Wafer shape: SNNF
Controller & system AC
Single Bd computer in controller: V452
EMO Function: Turn to release
Emergency off label
EMO Button guard rings
Shunt trip option
Smoke detector
Facility water flow interlock
Robot & monolith:
Buffer robot: HP
Transfer robot: VHP
Transfer robot blade: Original metal
Buffer robot blade: Original metal
Monolith bakeout heater DBI intk
UHV Pump:
Cryo pump: ONBOARD 8F
System monitor:
Monitor 1: Stand alone
Monitor 1: Cable length, 50'
No monitor select switch
Loadlock and cassette:
Loadlock type: Narrow body
Type: Index / Handler
Loadlock vents: Variable speed soft vent
LL Open / Close switch
Generator rack:
2nd Generator rack installed
2nd Generator rack smoke detector
2nd Generator rack water leak detector
Cable length, 1st to 2nd generator rack, 6'
2nd Generator rack water flow intk
Support equipment:
Neslabs
Neslab water resistivity indicator: Resistivity meter
Neslab drain port valve
No BOC heat exchanger on system
Cryo compressors: Water cooled
(2) Cryo compressors
Cryo lines: 3/4" x 50'
Cryopump controller type: 3 Phase controller
Cryopump water fittings
Signal cable length:
Mainframe to system controller, 50'
Mainframe to generator rack, 50'
Mainframe to cryo compressor, 50'
Main AC to system controller / System AC, 50'
System controller / System AC to prim gen rack, 50'
Main AC to prim gen rack, 50'
Main AC to pump frame, 50'
Main AC to neslab heat exchanger, 50'
Miscellaneous:
Water fittings: SST
Ar / N2 Vent manifold
Air fittings, 3/8"
Swagelok water & air fittings
System roughing pumps
EBARA Pump IF smart
Communications interface: GEM / SECE II
Cooldown chamber rough pump options:
EBARA Pump IF smart
System electrical:
Top control AC power feed
Circuit breaker: 343.8 A
Line frequency: 60 Hz
Small main AC power inlet hole
Line voltage: 208 V
2006 vintage.
AMAT/APPLIED MATERIALS ENDURA是一种用于制造半导体零件的高精度反应器。它专为卓越的工艺一致性和卓越的设施吞吐量而设计,能够为各种应用生产最优质的组件。AMAT ENDURA是一种三室PECVD（等离子体增强化学气相沉积）设备，能够产生高质量、均匀的电介质、聚合物和其他薄膜层。通过使用高度先进和通用的反应物浓度，应用材料ENDURA能够在广泛的工艺参数上提供优异的沉积性能。该系统允许建立和维护各种反应堆，从而能够生产各种产品线中具有卓越统一性的精密半导体器件。ENDURA还提供了一些高级功能,例如数字边缘服务器单元和自定义基板旋转功能。这些功能使用户在管理过程参数方面具有更大的灵活性,从而实现了更快的生产率和更高的可靠性。AMAT/APPLIED MATERIALS ENDURA还包括一个直观的图形用户界面，使它易于控制和配置机器。AMAT ENDURA是一种高效的反应堆，可以保持极精确的温度和压力剖面。这样可以确保材料保持在最佳水平，以最大限度地提高薄膜层的均匀性。APPLICED MATERIALS ENDURA还提供了最佳的电气接地工具,确保了与零件的更好的电气连接和卓越的制造效果。为保证物料层的均匀性，设计了一种可精确控制沉积过程基板运动和其他关键参数的ENDURA软件。资产的配置也允许用户为了优化生产而绕过某些流程，直观的用户界面允许快速简单地导航模型。AMAT/APPLIED MATERIALS ENDURA是一款功能强大、先进、精密的PECVD设备。生产均匀优质产品，设施吞吐量优越，是半导体制造的理想工具。该系统包括多种特性和功能,使其成为创建需要卓越一致性和准确性的电光设备、交换机、接收器和其他半导体组件的绝佳选择。
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