二手 AMAT / APPLIED MATERIALS P5000 Mark II #9300021 待售
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ID: 9300021
晶圆大小: 8"
优质的: 1997
CVD Etcher, 8"
Mainframe
Mainframe cables
Chamber A / B / C:
Type: DCVD Universal
Process: SA / Delta / TEOS
Process kit: Plasma C-chuck
Manometer: Dual 20-1000 Torr/MKS
Clean method: RF Clean
Throttle valve: Direct drive dual spring W/C plug
ASTEX AX8200 Ozone generator
Gas box MFC: UNIT MFC
Lamp driver
RF Gen I / II: RFDS 2000-2V/RFPP LF-5
RF Match: Phase IV
Chamber D:
Process: Sputter etcher
Process kit
Manometer: Single Torr/MKS
Clean method: RF Clean
Throttle valve
Turbo pump
Magnet driver
Gas box MFC: UNIT MFC
RF Gen I / II: ENI OEM 12B
RF Match: Phase IV
21-Controller slots
SBC Board type: V21 SYNERGY
Boss ROM version: E4.8
Video board type: VGA
Floppy Disk Drive (FDD), 3.5"
Robot type: Phase III
Auto-load / Unload cassette handler
Silicon-Tin-Oxide (STO) elevator type: 15-Slots
WPS Sensor
I/O Wafer sensor
Loadlock Purge
Loadlock Slow vent
Slit valve type: ZA Slit valve
Hot box version: Version IV
Top / Standard exhaust line
(28) Gas line panels
HAMART-4 Ozone monitor
Mini controller
Chiller
Safety module: (2) EMO Switches
Remote frame
EMO Switch
Expanded VME: (15) Slots
No Monitor rack
CRT Monitor
Light pen
Service monitor rack
Miscellaneous:
No Hard Disk Drive (HDD)
Transformer
Laminar flow hood
No mainframe cover
Load lock chamber:
Robot type: Phase III robot
Robot blade: 8"
Continuous purge
Center finder board
TC Gauge
ATM Switch
Vacuum switch
Vacuum sensor (TC)
System electronics:
(2) TC Gauge boards
+12 VDC Power supply
+15 VDC Power supply
-15 VDC Power supply
Buffer I/O board
AI MUX Board
Optical sensor boards
Chopper driver boards
Pneumatic control PCB
Main DC power supply
VME Controller:
Intelligent interface board
Missing SBC board
SEI Board
Co-processor board
(4) AI/AO / AI/O Boards: (1 AI and 1 AO)
Missing video board (VGA)
(4) Stepper boards
(4) DI/DO / DI/O Boards (7)
System misc:
Remote wiring dist board
System wiring dist board
No I/O Distribution board
Mini controller
Heat exchanger
Process / A / B / D
Mark II TEOS / CVD TEOS / CVD TEOS
RF Generator 1 / RFDS 2000-2V / RFDS 2000-2V / RFDS 2000-2V
O3 Generator / AX-8200 / AX-8200 / AX-8200
LF Generator / RFPP LF-5 / RFPP LF-5 / RFPP LF-5
TC Gauge
Isolation V/V / Cluster type
Interlock:
Coolant flow
Half ATM switch
Lamp module
CVD Lamp driver
Lift assy:
Susceptor lift assy
Wafer lift assy
Gas panel:
Gas panel interface
Expanded gas panel PCB
Standard or expanded module
Air maker
1997 vintage.
AMAT/APPLIED MATERIALS P5000 Mark II反应堆是一种强大的、大规模生产的等离子体蚀刻沉积设备。该系统广泛应用于集成电路的制造,如内存和逻辑芯片,以及显示面板、传感器和其他微电子器件。它利用专有的高密度电感耦合射频供电等离子体源来产生电离气体,该气体与基板反应,从而产生所需的过程结果。AMAT P5000 Mark II反应堆的发动机由真空室、微波发生器、支撑结构和大功率射频发生器组成。大功率射频发电机以13.56 MHz的频率产生高达20万伏的电场。这种高功率场使过程气体电离,提供了能够完成蚀刻过程和沉积的等离子体。发电机还控制沉积速率和温度,从而能够准确控制最终结果。APPLIED MATERIALS P 5000 MARK II反应堆的反应性气体由包括氯气和氮气的化合物组合而成。它们与基板反应产生各种过程,如蚀刻、沉积和钝化。反应堆还能够进行氧气灰化和化学机械抛光(CMP)工艺。P 5000 MARK II反应堆具有众多的安全特性和自动化,以确保高水平的安全。例如,反应堆被安置在一个充满惰性气体的室内,以保护设备和操作员免受潜在危险环境的影响。此外,该装置还包括温度监视器和警报机,如果温度超过一定水平,则关闭工具。总之,P5000 Mark II反应器是一种强大、先进的等离子体蚀刻和沉积资产,对沉积速率和温度提供精确的控制。它专为大批量生产和安全而设计,广泛用于IC和其他电子设备的制造。
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