二手 AMAT / APPLIED MATERIALS P5000 Mark II #9300021 待售

ID: 9300021
晶圆大小: 8"
优质的: 1997
CVD Etcher, 8" Mainframe Mainframe cables Chamber A / B / C: Type: DCVD Universal Process: SA / Delta / TEOS Process kit: Plasma C-chuck Manometer: Dual 20-1000 Torr/MKS Clean method: RF Clean Throttle valve: Direct drive dual spring W/C plug ASTEX AX8200 Ozone generator Gas box MFC: UNIT MFC Lamp driver RF Gen I / II: RFDS 2000-2V/RFPP LF-5 RF Match: Phase IV Chamber D: Process: Sputter etcher Process kit Manometer: Single Torr/MKS Clean method: RF Clean Throttle valve Turbo pump Magnet driver Gas box MFC: UNIT MFC RF Gen I / II: ENI OEM 12B RF Match: Phase IV 21-Controller slots SBC Board type: V21 SYNERGY Boss ROM version: E4.8 Video board type: VGA Floppy Disk Drive (FDD), 3.5" Robot type: Phase III Auto-load / Unload cassette handler Silicon-Tin-Oxide (STO) elevator type: 15-Slots WPS Sensor I/O Wafer sensor Loadlock Purge Loadlock Slow vent Slit valve type: ZA Slit valve Hot box version: Version IV Top / Standard exhaust line (28) Gas line panels HAMART-4 Ozone monitor Mini controller Chiller Safety module: (2) EMO Switches Remote frame EMO Switch Expanded VME: (15) Slots No Monitor rack CRT Monitor Light pen Service monitor rack Miscellaneous: No Hard Disk Drive (HDD) Transformer Laminar flow hood No mainframe cover Load lock chamber: Robot type: Phase III robot Robot blade: 8" Continuous purge Center finder board TC Gauge ATM Switch Vacuum switch Vacuum sensor (TC) System electronics: (2) TC Gauge boards +12 VDC Power supply +15 VDC Power supply -15 VDC Power supply Buffer I/O board AI MUX Board Optical sensor boards Chopper driver boards Pneumatic control PCB Main DC power supply VME Controller: Intelligent interface board Missing SBC board SEI Board Co-processor board (4) AI/AO / AI/O Boards: (1 AI and 1 AO) Missing video board (VGA) (4) Stepper boards (4) DI/DO / DI/O Boards (7) System misc: Remote wiring dist board System wiring dist board No I/O Distribution board Mini controller Heat exchanger Process / A / B / D Mark II TEOS / CVD TEOS / CVD TEOS RF Generator 1 / RFDS 2000-2V / RFDS 2000-2V / RFDS 2000-2V O3 Generator / AX-8200 / AX-8200 / AX-8200 LF Generator / RFPP LF-5 / RFPP LF-5 / RFPP LF-5 TC Gauge Isolation V/V / Cluster type Interlock: Coolant flow Half ATM switch Lamp module CVD Lamp driver Lift assy: Susceptor lift assy Wafer lift assy Gas panel: Gas panel interface Expanded gas panel PCB Standard or expanded module Air maker 1997 vintage.
AMAT/APPLIED MATERIALS P5000 Mark II反应堆是一种强大的、大规模生产的等离子体蚀刻沉积设备。该系统广泛应用于集成电路的制造,如内存和逻辑芯片,以及显示面板、传感器和其他微电子器件。它利用专有的高密度电感耦合射频供电等离子体源来产生电离气体,该气体与基板反应,从而产生所需的过程结果。AMAT P5000 Mark II反应堆的发动机由真空室、微波发生器、支撑结构和大功率射频发生器组成。大功率射频发电机以13.56 MHz的频率产生高达20万伏的电场。这种高功率场使过程气体电离,提供了能够完成蚀刻过程和沉积的等离子体。发电机还控制沉积速率和温度,从而能够准确控制最终结果。APPLIED MATERIALS P 5000 MARK II反应堆的反应性气体由包括氯气和氮气的化合物组合而成。它们与基板反应产生各种过程,如蚀刻、沉积和钝化。反应堆还能够进行氧气灰化和化学机械抛光(CMP)工艺。P 5000 MARK II反应堆具有众多的安全特性和自动化,以确保高水平的安全。例如,反应堆被安置在一个充满惰性气体的室内,以保护设备和操作员免受潜在危险环境的影响。此外,该装置还包括温度监视器和警报机,如果温度超过一定水平,则关闭工具。总之,P5000 Mark II反应器是一种强大、先进的等离子体蚀刻和沉积资产,对沉积速率和温度提供精确的控制。它专为大批量生产和安全而设计,广泛用于IC和其他电子设备的制造。
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