二手 AMAT / APPLIED MATERIALS P5000 MxP+ #185395 待售
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ID: 185395
晶圆大小: 8"
优质的: 1994
Oxide etch system, 8"
(2) Chambers
Software Revision SBC Board Version V21
Mainframe cables Standard / Extended (length) STD
Chamber Location A / B / C / D: A/B
Safety Module
EMO Switch(2): Present
UPS & Power Vaccine
Remote Frame
Pump Control Interface: Present
Circuit Breaker: Present
EMO Switch: Present
Expanded VME
Monitor Rack
CRT Monitor: Absent
Light Pen: Absent
Service Monitor Rack: Absent
Miscellaneous
Harddisk: Present
Floppy Disk: Present
Transformer: Present
Gas Panel standard / Extended: Expanded
Laminar Flow Hood
Mainframe cover: Absent
Loadlock Chamber
Robot Type Phase III Robot: Phase III Type
Robot Blade: 8 Inch Blade
WPS: Installed
TC Gauge: Installed
ATM Switch: Installed
Vacuum Switch: Installed
Blade Chuck Vent Kit: Absent
Vacuum Sensor(TC): Installed
Storage Elv. Slots 8 or 29: 29
Wafer IO Sensor Present or Not: OK
Electronics (BD)
System Electronics
TC guage boards(2): Installed
+12 Vdc powersupply: Installed
+15 Vdc powersupply: Installed
-15 Vdc powersupply: Installed
Buffer I/O board: Installed
AI Mux board(1): Installed
Optical sensor boards(*2ea): Installed
Chopper driver boards (*4ea): Installed
Pneumatic Control PCB: Installed
Main DC Power Supply: Installed
ESC Controller Board: Installed
Chamber A
CVD: OXIDE
Chamber Type: MXP+
RF Match Box 0100-30686
Nv Module cesc: Yes
Epd controller: Yes
Gate valve: Yes
Cap manometer 1: Mks 1Torr
TC Gauge: Yes
Isolation V/V: STD
Throttle V/V Type: STD
Slit V/V: STD
Turbo pump: SEIKOSEIKI STP301CVB
Turbo pump Controller: YES
Chamber B:
CVD: OXIDE
Chamber Type: MXP+
RF Match Box 0100-30686
Nv Module cesc: Yes
Epd controller: Yes
Gate valve: Yes
Cap manometer 1: Mks 1Torr
TC Gauge: Yes
Isolation V/V: STD
Throttle V/V Type: STD
Slit V/V: STD
Endpoint module: Monocromator
Turbo pump: SEIKOSEIKI STP301CVB
Turbo pump Controller: YES
Gas Interface PCB: Gas Panel Interface/Expanded Gas Panel PCB
Solenoide V/V Module: STD/Expanded
Air V/V: FUJIKIN
Gas box A,B
MFC UNIT - 8160: CHF3 100SCCM
MFC UNIT - 8160: AR 200SCCM
MFC UNIT - 8160: CF 50SCCM
MFC UNIT - 8160: O2 10SCCM
MFC UNIT - 8160: N2 100SCCM.
AMAT/APPLIED MATERIALS P5000 MxP+是一种多用途可用化学气相沉积(CVD)设备,设计用于研发先进的材料结构和装置。该系统适用于多种研发应用,如复合半导体、纳米材料、超晶格器件、单壁碳纳米管、纳米线等二维层状材料。AMAT P5000 MxP+包括两个带有真空控制单元和专用数据采集模块的腔室。该腔室的设计能够在广泛的温度和压力设置范围内提供卓越的质量和一致的性能。APPLIED MATERIALS P5000 MxP+采用低调和符合人体工程学的设计,具有直观的用户界面,可轻松高效地进行设置。本机的CVD过程是基于反应气体分子在压力和温度下向基板冒泡的原理。将底物加热到预定温度,反应气体带入腔室。然后将几种气体的受控溷合物注入反应室内,为表面反应提供受控的化学环境。实时监控CVD过程,使用自动化工具控制腔内气体速率、温度和压力。P5000 MxP+包括一个先进的CVD温度控制资产,以提供高退火膜具有出色的厚度均匀性。它还配备了多路复用能力,允许CVD进程在8个并行路径中进行优化。双腔室设计增加了灵活性,使模型能够同时进行CVD沉积、氧化物去除和其他处理。为了确保可靠和可重复的沉积过程,AMAT/APPLIED MATERIALS P5000 MxP+具有内置安全功能的监控设备,如超压保护、温度传感器持续时间控制和反应室温度警报。该系统还能够持续监测样品,检测任何质量变化,并相应调整操作参数。AMAT P5000 MxP+是用于先进材料研发的强大可靠的CVD单元。它在研发应用程序中提供卓越的性能、灵活性和准确性。这台机器提供了先进的CVD温度控制工具、多路复用功能以及可靠的监控功能,确保了稳定可靠的沉积过程。
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