二手 AMAT / APPLIED MATERIALS Producer GT #9265758 待售

ID: 9265758
晶圆大小: 12"
优质的: 2006
CVD System, 12" EFEM Transfer module AC Rack NPP Rack WIP Delivery type: OHT Pre-alignment and centering: Single axis aligner Wafer pass thru and storage: 7 Slots wafer pass thru KAWASAKI 3NS510B Atmospheric robots (4) Load ports E84 Sensors and cables OMRON With RF Light curtain Carrier ID host interface Light towers UPS Interface Chamber process: HARP USG Process chamber type: Chamber A, B and C Twin: HT-ACL Local center finder Robot blade and type: FX Dual deck ceramic Chamber A, B and C: Frequency: Single APEX 3000 RF Generator Heater: HA12 Dual zone heater Single source with RF cap Manometer: 10 / 100 Torr / 70 Trip Clean type (RPS): Single (NPR804L) No NDTR endpoint No DPA Foreline, 2" ISO: MKS 99D0654 TV: MKS 683B-26033 Monitors: Stand alone TTW With keyboard Gas delivery - APF GP: MFC: UNIT 125 GF 125 No regulated gas panel Gas feed: Bottom Gas panel cabinet exhaust: Bottom exhaust No interlock indicator No transducers No display gas pallet No liquid source Gas pallet configuration: Chamber A: Gas / Size / Model AR / 4000 / Unit 125 O2 / 15000 / Unit 125 C3H6 / 3000 / GF 125 HE / 5000 / Unit 125 N2 / 10000 / Unit 125 C3H6 / 3000 / Unit 125 O2 / 10000 / Unit 125 AR / 10000 / Unit 125 NF3 / 5000 / Unit 125 Chamber B and C: Gas / Size / Model AR / 4000 / Unit 125 O2 / 15000 / Unit 125 C3H6 / 3000 / Unit 125 HE / 5000 / Unit 125 N2 / 10000 / Unit 125 C3H6 / 3000 / Unit 125 O2 / 10000 / Unit 125 AR / 10000 / Unit 125 NF3 / 5000 / Unit 125 Missing parts: A1 RF Signal cable L/L EUROTHERM controller (2) PIRANI Gauges Chamber C: (2) Heaters (2) L/L Lift LM guides Upper L/L foreline (3) Chamber AC box kits Mainframe box Driver box kit Power supply: 208 V, 50/60 Hz 2006 vintage.
AMAT(应用材料)AMAT/APPLIED MATERIALS PRODUCER GT是一种高温化学气相沉积(CVD)反应器,旨在满足半导体工业的需求。该反应器可实现氧化、氮化和碳化等多种过程。AMAT Producer GT提供单一晶片配置或批处理配置,旨在实现长期稳定性和可靠性。反应堆采用经过验证的强制流动气体输送设备,能够在反应堆室内产生均匀的温度和浓度分布。这确保了一致的薄膜质量和非常均匀的掺杂轮廓。该反应堆配有坚固的风冷加热器和最先进的温度控制系统,以提高工艺的均匀性。反应器中的加热元件使用有源水套,以确保晶圆表面的温度均匀性。这样可以防止晶片过热并确保更均匀的沉积。反应堆由不锈钢构成,设有真空室、分批板、气体输送单元和感应发生器。该反应器采用高容量涡旋泵进行高真空和快速控制,循环压力水平。腔室用石英或石墨绝缘,以减少热负荷损失。应用材料生产商GT利用高容量、低功率射频发电机和射频输电机进行可靠可靠的等离子体发电。温度控制工具的精度和精确度很高,能够在很大的流量、温度和压力范围内实现高质量、均匀的沉积速率。该反应堆包括各种材料和应用的广泛工艺配方,以及对流动路线和阀门选择的定制。它还提供了一个可选的配方库和计算机控制包,用于操作多个反应堆的套件。综上所述,Producer GT是一种高度可靠和高效的CVD反应器,旨在提供一致的薄膜质量和均匀的掺杂轮廓。其坚固的风冷加热器和优越的温度控制资产确保了均匀的薄膜性能和性能,而其广泛的工艺配方使其能够用于通用应用。
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