二手 AMAT / APPLIED MATERIALS Producer GT #9265758 待售
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ID: 9265758
晶圆大小: 12"
优质的: 2006
CVD System, 12"
EFEM
Transfer module
AC Rack
NPP Rack
WIP Delivery type: OHT
Pre-alignment and centering: Single axis aligner
Wafer pass thru and storage: 7 Slots wafer pass thru
KAWASAKI 3NS510B Atmospheric robots
(4) Load ports
E84 Sensors and cables
OMRON With RF
Light curtain
Carrier ID host interface
Light towers
UPS Interface
Chamber process: HARP USG
Process chamber type:
Chamber A, B and C Twin: HT-ACL
Local center finder
Robot blade and type: FX Dual deck ceramic
Chamber A, B and C:
Frequency: Single
APEX 3000 RF Generator
Heater: HA12 Dual zone heater
Single source with RF cap
Manometer: 10 / 100 Torr / 70 Trip
Clean type (RPS): Single (NPR804L)
No NDTR endpoint
No DPA
Foreline, 2"
ISO: MKS 99D0654
TV: MKS 683B-26033
Monitors:
Stand alone
TTW With keyboard
Gas delivery - APF GP:
MFC:
UNIT 125
GF 125
No regulated gas panel
Gas feed: Bottom
Gas panel cabinet exhaust: Bottom exhaust
No interlock indicator
No transducers
No display gas pallet
No liquid source
Gas pallet configuration:
Chamber A:
Gas / Size / Model
AR / 4000 / Unit 125
O2 / 15000 / Unit 125
C3H6 / 3000 / GF 125
HE / 5000 / Unit 125
N2 / 10000 / Unit 125
C3H6 / 3000 / Unit 125
O2 / 10000 / Unit 125
AR / 10000 / Unit 125
NF3 / 5000 / Unit 125
Chamber B and C:
Gas / Size / Model
AR / 4000 / Unit 125
O2 / 15000 / Unit 125
C3H6 / 3000 / Unit 125
HE / 5000 / Unit 125
N2 / 10000 / Unit 125
C3H6 / 3000 / Unit 125
O2 / 10000 / Unit 125
AR / 10000 / Unit 125
NF3 / 5000 / Unit 125
Missing parts:
A1 RF Signal cable
L/L EUROTHERM controller
(2) PIRANI Gauges
Chamber C: (2) Heaters
(2) L/L Lift LM guides
Upper L/L foreline
(3) Chamber AC box kits
Mainframe box
Driver box kit
Power supply: 208 V, 50/60 Hz
2006 vintage.
AMAT(应用材料)AMAT/APPLIED MATERIALS PRODUCER GT是一种高温化学气相沉积(CVD)反应器,旨在满足半导体工业的需求。该反应器可实现氧化、氮化和碳化等多种过程。AMAT Producer GT提供单一晶片配置或批处理配置,旨在实现长期稳定性和可靠性。反应堆采用经过验证的强制流动气体输送设备,能够在反应堆室内产生均匀的温度和浓度分布。这确保了一致的薄膜质量和非常均匀的掺杂轮廓。该反应堆配有坚固的风冷加热器和最先进的温度控制系统,以提高工艺的均匀性。反应器中的加热元件使用有源水套,以确保晶圆表面的温度均匀性。这样可以防止晶片过热并确保更均匀的沉积。反应堆由不锈钢构成,设有真空室、分批板、气体输送单元和感应发生器。该反应器采用高容量涡旋泵进行高真空和快速控制,循环压力水平。腔室用石英或石墨绝缘,以减少热负荷损失。应用材料生产商GT利用高容量、低功率射频发电机和射频输电机进行可靠可靠的等离子体发电。温度控制工具的精度和精确度很高,能够在很大的流量、温度和压力范围内实现高质量、均匀的沉积速率。该反应堆包括各种材料和应用的广泛工艺配方,以及对流动路线和阀门选择的定制。它还提供了一个可选的配方库和计算机控制包,用于操作多个反应堆的套件。综上所述,Producer GT是一种高度可靠和高效的CVD反应器,旨在提供一致的薄膜质量和均匀的掺杂轮廓。其坚固的风冷加热器和优越的温度控制资产确保了均匀的薄膜性能和性能,而其广泛的工艺配方使其能够用于通用应用。
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