二手 AMAT / APPLIED MATERIALS Producer III #149570 待售
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ID: 149570
晶圆大小: 12"
优质的: 2002
CVD system, 12"
Process: BPSG
Wafer shape: SNNF
Chamber A: SACVD-TWIN
Chamber B: SACVD-TWIN
Line voltage: 200 / 208 VAC
Line frequency: 60 Hz
Phase: 3 phase
AC P/N: 0180-01905
EMO switch type: turn to release EMO
Smoke detector: no
Chamber A: BPSG
Controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Chamber set power supply: yes
Chamber set interconnect assembly: yes
GP SPX MUXADIO110: yes
GP interface BD: yes
Other controller:
WATLOW temperature controller: yes
Heater RF filter: yes
EV manifold: yes
Thermocouple: yes
5 phase lift driver UDK5214NW oriental motor: yes
Heater lift assembly:
Heater base: yes
Lead screw assembly: yes
Motor: yes
Heater lift bellows: yes
Lift pin assembly:
Lift pin assembly: yes
Lift ceramic ring: yes
Lift pin bellows: yes
Remote clean: ASTRONex FI80131 RPS
Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes
Fore line assembly:
Throttle valve: yes
Isolation valve: yes
Pirani gauge: yes
Heating jackets: yes
RGA port NW25: yes
Fore lines: yes
Pressure gauge:
MKS 629B13TBC, 1000 torr: yes
MKS 627A-12338, 20 torr: yes
MKS 51A13TCA2BA640 ATM switch: yes
Chamber B: BPSG
Controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Chamber set power supply: yes
Chamber set interconnect assembly: yes
GP SPX MUXADIO110: yes
GP interface BD: yes
Other controller:
WATLOW temperature controller: yes
Heater RF filter: yes
EV manifold: yes
Thermocouple: yes
5 phase lift driver UDK5214NW oriental motor: yes
Heater lift assembly:
Heater base: yes
Lead screw assembly: yes
Motor: yes
Heater lift bellows: yes
Lift pin assembly:
Lift pin assembly: yes
Lift ceramic ring: yes
Lift pin bellows: yes
Remote clean: ASTRONex FI80131 RPS
Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes
Fore line assembly:
Isolation valve: yes
RGA port NW25: yes
Pressure gauge:
MKS 629B13TBC, 1000 torr: yes
MKS 627A-12338, 20 torr: yes
MKS 51A13TCA2BA640 ATM switch: yes
Gas panel and pallet:
Mainframe type: Producer III 12"
Gas feed (top): yes
System cabinet exhaust (top): yes
MFC: Celerity UFC 8160 metal digital MFC's: yes
LFM:
STEC HORIBA LF-A410A-EVD 7.0: yes
STEC HORIBA LF-A410A-EVD 1.5: yes
STEC HORIBA LF-A310A-EVD 0.5: yes
Injection valve: STEC HORIBA: yes
Valve: FUJIKIN 5 RA max: yes
Filter:
MILLIPORE 5 RA: yes
MYCROLIS O3 GS line: yes
SLD (single line drop): no
SLD valve type: FUJIKIN diaphragm: yes
Veriflo 10 RA regulator: yes
MKS LDMB12PA2CC1 transducer with display: yes
Smoke detector photohelic: yes
Generic facilities / scrubber interface: yes
Facilities interlock indicator: no
Interface output (fault): yes
Display gas pallet: yes
Chamber A gas pallet: SA-BPSG
Liquid 1: TEOS 7.0 G, LF410A-EVD
Liquid 2: TEOS 0.5 G, LF310A-EVD
Liquid 3: TEOS 1.5 G, LF410A-EVD
1: O3
2: O2, 30 slm
3: N2 purge
4: NF3, 5 slm
5: N2, 3 slm
6: AR, 10 slm
7:
8: N2, 30 slm
9: HE, 30 slm
10: N2 purge
Chamber B gas pallet: SA-BPSG
Liquid 1: TEOS 7.0 G, LF410A-EVD
Liquid 2: TEOS 0.5 G, LF310A-EVD
Liquid 3: TEOS 1.5 G, LF410A-EVD
1: O3
2: O2, 30 slm
3: N2 purge
4: NF3, 5 slm
5: N2, 3 slm
6: AR, 10 slm
7:
8: N2, 30 slm
9: HE, 30 slm
10: N2 purge
System placement: stand alone
EV mainfold: yes
System controller:
Facilities UPS interface: yes
MF controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Maintenance switch: yes
MF DC power supply assembly: yes
VME rack:
1: SBC
15: serial / video
16, 17: HDD
19, 20: FDD
DVD: yes
FDD: yes
Load locks:
Load lock lift assembly:
Motor
Lead screw assembly
Bellows
Lid assembly:
Wafer sliding sensor
Lid cover
Fore line assembly:
Isolation valve
Fore lines
LL door assembly: VAT valve assembly
Slit valve assembly: slit valve with Kalrez seal
Transfer chamber (buffer):
Robot type: VHP dual
Wafer sensing type: wafer pocket sensor
EDWARDS IPX100 pump
Isolation valve
Pirani gauge
RGA port, NW25
Fore lines
Slit valve assembly:
Slit valve with Kalrez seal
Assembly
Signal lamp tower:
Tower locations: front and rear mounted
Lamp colors: red, amber, green blue
Number of lamps per tower: (4)
Fab interface: standard GEM interface
Factory interface:
Front end interface: 12" FI 2 load ports
Path through: yes
Robot type: NEWPORT KENSINGTON POD 1 and 2
Facility: mainframe gas lines
MF N2 regulation: regulated 80 PSI
Remote systems:
HX 300 W/C heat exchanger: yes
HX 300 chiller for ozonator: yes
System monitors:
Monitor type: VGA with light pen, through the wall
2002 vintage.
AMAT/APPLIED MATERIALS Producer III是为半导体工艺研发而设计的反应堆设备。AMAT Producer III提供高质量的处理结果,同时提供卓越的过程控制。它设计为易于设置和维护,允许用户在进程之间快速过渡。APPLIED MATERIALS PRODUCER III是一个高精度的系统,提供了一系列的能力,使其适合于从外延到纳米技术的应用。特点包括温度范围大、精确压力控制、多级泵送以及使用实时数据采集。该装置提供高温沉积和蚀刻处理,温度可达1100 °C。这使得它适合于生产化合物半导体,如氮化氙(GaN)和砷化铝氙(AlGaAs)。Producer III包括一个石英晶体微平衡(QCM)来监测膜厚度,精度为0.2nm。这有助于精确沉积厚度在纳米范围内的薄膜。AMAT/APPLIED MATERIALS Producer III还提供了一系列先进的过程控制功能,包括实时监测过程参数如温度、压力和总气流的能力。该机器包括一个放热调节器,用于监测每个级别的温度,以确保生产得到优化。这有助于确保每个流程周期的重复和稳定性能。AMAT Producer III的热能力也非常适合环境压力干蚀刻。这涉及使用射频功率在高温下去除材料,从而实现精确的蚀刻轮廓和轮廓,而不会出现蚀刻不足的情况。该设备提供了多种工艺选择,包括能够在受控大气中退火特性,以及执行选择性区域蚀刻处理。APPLIED MATERIALS PRODUCER III是一个强大的工具,它提供了一系列的过程功能,允许用户探索广泛的应用程序,而无需投资于多个沉积和蚀刻系统。它非常适合研究和半导体级处理应用,因为它具有高精度、重复性和快速周转时间。
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