二手 AMAT / APPLIED MATERIALS Producer III #149570 待售

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ID: 149570
晶圆大小: 12"
优质的: 2002
CVD system, 12" Process: BPSG Wafer shape: SNNF Chamber A: SACVD-TWIN Chamber B: SACVD-TWIN Line voltage: 200 / 208 VAC Line frequency: 60 Hz Phase: 3 phase AC P/N: 0180-01905 EMO switch type: turn to release EMO Smoke detector: no Chamber A: BPSG Controllers: Chamber set interface: yes SPX MUXADIO110: yes Chamber set power supply: yes Chamber set interconnect assembly: yes GP SPX MUXADIO110: yes GP interface BD: yes Other controller: WATLOW temperature controller: yes Heater RF filter: yes EV manifold: yes Thermocouple: yes 5 phase lift driver UDK5214NW oriental motor: yes Heater lift assembly: Heater base: yes Lead screw assembly: yes Motor: yes Heater lift bellows: yes Lift pin assembly: Lift pin assembly: yes Lift ceramic ring: yes Lift pin bellows: yes Remote clean: ASTRONex FI80131 RPS Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes Fore line assembly: Throttle valve: yes Isolation valve: yes Pirani gauge: yes Heating jackets: yes RGA port NW25: yes Fore lines: yes Pressure gauge: MKS 629B13TBC, 1000 torr: yes MKS 627A-12338, 20 torr: yes MKS 51A13TCA2BA640 ATM switch: yes Chamber B: BPSG Controllers: Chamber set interface: yes SPX MUXADIO110: yes Chamber set power supply: yes Chamber set interconnect assembly: yes GP SPX MUXADIO110: yes GP interface BD: yes Other controller: WATLOW temperature controller: yes Heater RF filter: yes EV manifold: yes Thermocouple: yes 5 phase lift driver UDK5214NW oriental motor: yes Heater lift assembly: Heater base: yes Lead screw assembly: yes Motor: yes Heater lift bellows: yes Lift pin assembly: Lift pin assembly: yes Lift ceramic ring: yes Lift pin bellows: yes Remote clean: ASTRONex FI80131 RPS Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes Fore line assembly: Isolation valve: yes RGA port NW25: yes Pressure gauge: MKS 629B13TBC, 1000 torr: yes MKS 627A-12338, 20 torr: yes MKS 51A13TCA2BA640 ATM switch: yes Gas panel and pallet: Mainframe type: Producer III 12" Gas feed (top): yes System cabinet exhaust (top): yes MFC: Celerity UFC 8160 metal digital MFC's: yes LFM: STEC HORIBA LF-A410A-EVD 7.0: yes STEC HORIBA LF-A410A-EVD 1.5: yes STEC HORIBA LF-A310A-EVD 0.5: yes Injection valve: STEC HORIBA: yes Valve: FUJIKIN 5 RA max: yes Filter: MILLIPORE 5 RA: yes MYCROLIS O3 GS line: yes SLD (single line drop): no SLD valve type: FUJIKIN diaphragm: yes Veriflo 10 RA regulator: yes MKS LDMB12PA2CC1 transducer with display: yes Smoke detector photohelic: yes Generic facilities / scrubber interface: yes Facilities interlock indicator: no Interface output (fault): yes Display gas pallet: yes Chamber A gas pallet: SA-BPSG Liquid 1: TEOS 7.0 G, LF410A-EVD Liquid 2: TEOS 0.5 G, LF310A-EVD Liquid 3: TEOS 1.5 G, LF410A-EVD 1: O3 2: O2, 30 slm 3: N2 purge 4: NF3, 5 slm 5: N2, 3 slm 6: AR, 10 slm 7: 8: N2, 30 slm 9: HE, 30 slm 10: N2 purge Chamber B gas pallet: SA-BPSG Liquid 1: TEOS 7.0 G, LF410A-EVD Liquid 2: TEOS 0.5 G, LF310A-EVD Liquid 3: TEOS 1.5 G, LF410A-EVD 1: O3 2: O2, 30 slm 3: N2 purge 4: NF3, 5 slm 5: N2, 3 slm 6: AR, 10 slm 7: 8: N2, 30 slm 9: HE, 30 slm 10: N2 purge System placement: stand alone EV mainfold: yes System controller: Facilities UPS interface: yes MF controllers: Chamber set interface: yes SPX MUXADIO110: yes Maintenance switch: yes MF DC power supply assembly: yes VME rack: 1: SBC 15: serial / video 16, 17: HDD 19, 20: FDD DVD: yes FDD: yes Load locks: Load lock lift assembly: Motor Lead screw assembly Bellows Lid assembly: Wafer sliding sensor Lid cover Fore line assembly: Isolation valve Fore lines LL door assembly: VAT valve assembly Slit valve assembly: slit valve with Kalrez seal Transfer chamber (buffer): Robot type: VHP dual Wafer sensing type: wafer pocket sensor EDWARDS IPX100 pump Isolation valve Pirani gauge RGA port, NW25 Fore lines Slit valve assembly: Slit valve with Kalrez seal Assembly Signal lamp tower: Tower locations: front and rear mounted Lamp colors: red, amber, green blue Number of lamps per tower: (4) Fab interface: standard GEM interface Factory interface: Front end interface: 12" FI 2 load ports Path through: yes Robot type: NEWPORT KENSINGTON POD 1 and 2 Facility: mainframe gas lines MF N2 regulation: regulated 80 PSI Remote systems: HX 300 W/C heat exchanger: yes HX 300 chiller for ozonator: yes System monitors: Monitor type: VGA with light pen, through the wall 2002 vintage.
AMAT/APPLIED MATERIALS Producer III是为半导体工艺研发而设计的反应堆设备。AMAT Producer III提供高质量的处理结果,同时提供卓越的过程控制。它设计为易于设置和维护,允许用户在进程之间快速过渡。APPLIED MATERIALS PRODUCER III是一个高精度的系统,提供了一系列的能力,使其适合于从外延到纳米技术的应用。特点包括温度范围大、精确压力控制、多级泵送以及使用实时数据采集。该装置提供高温沉积和蚀刻处理,温度可达1100 °C。这使得它适合于生产化合物半导体,如氮化​​氙(GaN)和砷化铝氙(AlGaAs)。Producer III包括一个石英晶体微平衡(QCM)来监测膜厚度,精度为0.2nm。这有助于精确沉积厚度在纳米范围内的薄膜。AMAT/APPLIED MATERIALS Producer III还提供了一系列先进的过程控制功能,包括实时监测过程参数如温度、压力和总气流的能力。该机器包括一个放热调节器,用于监测每个级别的温度,以确保生产得到优化。这有助于确保每个流程周期的重复和稳定性能。AMAT Producer III的热能力也非常适合环境压力干蚀刻。这涉及使用射频功率在高温下去除材料,从而实现精确的蚀刻轮廓和轮廓,而不会出现蚀刻不足的情况。该设备提供了多种工艺选择,包括能够在受控大气中退火特性,以及执行选择性区域蚀刻处理。APPLIED MATERIALS PRODUCER III是一个强大的工具,它提供了一系列的过程功能,允许用户探索广泛的应用程序,而无需投资于多个沉积和蚀刻系统。它非常适合研究和半导体级处理应用,因为它具有高精度、重复性和快速周转时间。
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