二手 AMAT / APPLIED MATERIALS Producer III #9091079 待售

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ID: 9091079
SACVD System, 8" (2) Twin chambers, RPC clean Platform: Split SACVD: TEOS, TEB, TEPO process SiO2, PSG, BPSG RPC Chamber Clean: MKS ASTRON-2L 4 color signal tower: (Red-Yellow-Green-Blue) Mainframe Seriplex BD: 0090-00475 Rev-P1 MF Interface BD: 0100-00752 Rev-003 Cassette Loader: PRI Robot: Front End Manual Type 200mm: ATM407B-1-S Brooks Auto PRI Robot Controller: ESC-200-OTF-110: CTL-27900 Filter Assy: MAC10ULPA 11057002 Load-Lock Chamber: Index Motor Driver: 5-Phase UDK5128NW2 Left Loadlock: 6 Slot / 200mm Right Loadlock: 6 Slot / 200mm Left LL Pressure Gauge: 901P-41-0030 Right LL Pressure Gauge: 901P-41-0030 Pumping Line Pressure Gauge: EDWARD APG-L-NW15 Cassette Door Left: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Cassette Door Right: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Wafer Position Sensor: Keyence PS-55 Buffer Chamber: VHP Robot: VHP Dual Blade Type 200mm VHP Robot Driver: 0190-02472 Rev-001 IPX-100 Pump: missing Purge/Vent MFC: FC-2902 5000 sccm Pressure Gauge: 275 Mini-Convectron Granville-Phillips Chamber A: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35652 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35653 Chamber B: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35650 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35762 VME Controller: #1 SBC BD V452 0090-76133 Rev A #2 Radisys BD Radisys AMAT P133 0660-01857 #3 Unused - #4 Unused - #5 MEI-2 BD 0190-00387 A010-008 Rev 5 #6 Unused - #7 MEI-1 BD 0190-00387 A010-008 Rev 5 #8 Unused - #9 I/O Expansion BD 0090-76040 NT Hard Disk Seagate ST34520N CD-ROM Use NT Floppy Disk 3.5" Legacy Hard Disk 0190-00405 Legacy Floppy Disk 3.5" SCSI FD235HF C700-U 193077C7-00 VME P2 Distribution BD 0100-00430 Loadlock Left Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Loadlock Right Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Active Wafer Sensor Keyence PZ2-41 Latest Software Version B3512 Currently de-installed.
AMAT/APPLIED MATERIALS Producer III是用于半导体生产和采购的先进生产反应堆。其先进的特性使其成为最可靠、最高效的生产反应堆之一。AMAT Producer III包括射频驱动器、频率发生器、高压电源、激光扫描仪和低压电源。所有这些组件协同工作以优化生产过程,提高可重复性和生产率。射频传动通过各种工艺步骤实现高沉积速率,而频率发生器控制提供给反应堆的电压和功率。激光扫描仪调节沉积在晶圆上的材料量。应用材料生产商III为材料沉积提供均匀性,并提供动态调整的有源流量控制系统,以保持晶圆上正确的材料水平。该系统还确保沉积和蚀刻过程是可重复的。生产者III还包括压力监测系统,它允许更好的过程控制和提高产品质量。AMAT/APPLIED MATERIALS Producer III也设计用于高通量生产和高温工艺。它的敏感器有特殊的设计,减少污染,并允许快速热身时间。磁感器还允许晶圆上的材料更大的均匀性。AMAT Producer III非常适合生产各种材料,无论是单片晶片、复合半导体,甚至是先进材料。它可以用多种气体操作,从氢气到四氟化物不等。它还设计为与所有类型的半导体产品兼容,因此生产商知道他们将能够处理客户需要的任何材料。APPLIED MATERIALS Producer III符合所有行业标准,为用户提供了更高的可靠性和一流的性能。它包括一整套安全功能,可以保护操作员并确保任何过程尽可能高效。其功能还使制造商能够满足其所有生产要求。生产者III是一个高度可靠和高效的生产反应堆,将为用户提供生产精度和可重复性,以满足他们的需求。凭借其加工各种材料的能力和灵活多变的设计,一定能满足各类半导体制造商的需求。在寻找达到最高性能和可靠性水平的生产反应堆时,AMAT/APPLICED MATERIALS PRODUCER III是理想的选择。
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