二手 AMAT / APPLIED MATERIALS Producer S #9003816 待售
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ID: 9003816
System, 12"
Chamber A Twin BPSG
Chamber B Twin BPSG
Chamber C Twin BPSG
Wafer shape: SNNF
SMIF interface: no
Chamber A:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Chamber B:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Chamber C:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Electrical requirements:
Line Frequency: 60 Hz
Line Voltage: 200/208 V
Line Amperage: 240 A
Facility ups interface : Yes
System monitor:
1st Monitor: Through the wall
2nd Monitor: Standalone
3rd Monitor: None
Mainframe:
Mainframe Type: Shrinkage
Robot Type: VHP dual
Loadlock Cassette: Manual 2 cassette
SMIF: No
SMIF Robot: NA
Ozone generator:
Chamber A: AX8400
Chamber B: AX8406B
Chamber C: AX8406B
Dry pumps:
Chamber A: -
Chamber B: -
Chamber C: -
Loadlock: IPX100
VME rack:
SBC: Yes
VGA: Yes
MEI #1: Yes
MEI #2: Yes
I/O EXPAN.: Yes
Monitor Select: Yes
Floppy: Yes
HDD: Yes
Gas delivery:
MFC Type: STEC 410A (LFM), Unit C8161
Valves: Fujikin 5 Ra max
Filters: Millipore
Transducers: MKS without display
Regulators: Parker
Single Line Drop (SLD): No
SLD Gas Lines Feed: Top feed
System Cabinet Exhaust: Top
Gas pallet configuration:
CH.A SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
CH.B SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
CH.C SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
Includes:
(2) Ceramic Heater
(2) Ceramic Heater
(2) Ceramic Heater
Buffer Chamber, Chamber A
EFEM
(3) Cermic Liner, NF3 Gas Line
(1) Signal Cable, Exhase flange, Photo helic
Monitor Panel
(2) RPS Ass'y
(2) RPS Ass'y
(2) RPS Ass'y
Load Lock Pump
(6) AL Pumping Ring, Ceramic Pumping Ring
Monitor
Monitor
Chamber B
Chamber C
Temp Controller
(6) AL Shower Head, AL Blocker Plate
(6) AL Lid Ass'y
(6) Ceramic Pumping Ring
(3) AL Lid Block
(6) Top Ceramic Ring
Ch C Foreline, Mux Controller
Producer M,RF AC
O3 Cabinet
AC Rack
A-Chamber Cover
B-Chamber Cover
2001 vintage.
AMAT/APPLIED MATERIALS Producer S是一种工业级化学气相沉积（CVD）反应器。它设计用于将高性能薄膜沉积在直径可达200毫米的晶片/基板上。它由一个封闭的腔室和一系列前体在非热大气压力等离子体中反应的工艺源组成。这种等离子体由射频-ADT（大气直流电）技术产生，通过将前体分解成较小的碎片来增强表面相互作用，这些碎片可以更均匀地分布在晶圆表面。等离子体对于提供均匀的工艺温度也是必不可少的，这对于高质量的薄膜沉积在CVD中是必不可少的。工艺源还包括高频卤素灯和石英加热元件，以确保室内温度分布均匀。均匀的温度分布保证了薄膜生产的可靠性和可重复性。这在需要高膜质量的半导体和纳米技术应用等领域尤为重要。AMAT PRODUCERS除了具有均匀的温度和可靠且可复制的薄膜沉积外，还有其他优点。例如，等离子体的热源可以在不中断过程的情况下改变，允许高通量，对晶圆的热影响最小。它还具有长达30分钟的快速循环时间、30个晶圆的高晶圆加载能力以及低拥有成本。最后,APPLIED MATERIALS PRODUCER-S配备了直观的图形用户界面（GUI）,使其易于操作和维护。该GUI还采用高效配方进行了优化，以在各种应用领域取得成功，并建立了真空水平和沉积率等硬件和工艺参数的监控系统。
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