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ID: 9013303
晶圆大小: 8"
TEOS PECVD system, 8"
System Overview:
Technology DCVD
Platform Type PRODUCER SE
Wafer Size 200MM (8 INCH)
Wafer Shape SNNF
Position A (XY) PE TEOS TWIN
Position B (XY) PE TEOS TWIN
Position C (XY) PE TEOS TWIN
Position A Process (09) TEOS
Position B Process TEOS
Position C Process TEOS
System Software:
System software Latest qualified version V3.4_12
GP Latest qualified version P 133
Factory Interface System 5.4 FI, Options:
Number of Loadports Number of Loadports 2
Metrology Unit Nano Nanometrics
Light Towers 4 COLOR CONFIGURABLE LIGHT TOWER YES
MainFrame Options:
Rear MF Light Tower RAGB No NO
Remote Options, System Monitors:
First Local Monitor STAND ALONE, 15 Inch
Second Local Monitor TTW WITH KEYBOARD, 15 inch
Remote Options, Heat Exchanger:
System Heat Exchanger Qty ONE Steelhead 1
AMAT HX Hoses and Manifolds NO YES
Pumps:
Transfer chamber Customer supply, MUST meet GT SSPS Specifications!
Chamber A Roughing pump Customer supply, MUST meet GT SSPS Specifications!
Chamber B Roughing pump Customer supply, MUST meet GT SSPS Specifications!
Chamber C Roughing pump Customer supply, MUST meet GT SSPS Specifications!
Customer Fab Options:
System Power Mainframe 208V 300A 208V 3 Phase, 4 Wire 300A
Customer EMO Interface 24V AC
ChA-B-C, (XY) PE TEOS TWIN:
(2) Robot Blades Aluminum
RF Generator 1
RF Generator 2
(2) Heater HA-12 TIGHT RF MESH WITH CLAMP TYPE 2
(2) Rf Filter Rev ? RF filter
Foreline TV 2 1/2-inch heated throttle valve
Foreline ISO 2 1/2-inch heated ISO valve
RPS Astron EX RPS
ChA, (XY) PE TEOS TWIN, Gas Box Options:
Gas Pallet Type TEOS ONLY
ChA-B-C, (XY) PE TEOS TWIN, Gas Box Configuration, Gas Section:
Line 1 Empty
Line 2 Empty
Line 3 O2- 5SLM
Line 4 N2 Purge
Line 5 Ar- 5SLM
Line 6 NF3- 3SLM
Line 7 Empty
Line 8 Empty
Line 9 He- 5SLM
Line 10 Liquid Purge
Line 11 Empty
Line 12 Empty
Line 13 Empty
Line 14 Liquid Pos 1 TEOS- 4.0 g/min
ChA, (XY) PE TEOS TWIN, Process Abatement:
Abatement TCS
ChA, (XY) PE TEOS TWIN, Process Kit, TEOS:
(2) Gas Box Gas Box - Bypass 0040-53927
(2) Blocker UHD Blocker,200mm Producer 0021-09914
(2) Faceplate,TEOS Faceplate,200mm Producer 0021-01813
2000 vintage.
AMAT/APPLIED MATERIALS Producer S是一种以效能和性能闻名的先进反应堆。用于在基材上沉积多种材料，制造各种产品。它通常用作PECVD（等离子增强化学气相沉积）反应器，是半导体工业中使用最广泛的工具之一。AMAT PRODUCERS利用独特的设计将等离子体均匀地分配到沉积室中，从而产生高质量和均匀的涂层。利用先进的湍流设备，产生最佳的工艺均匀性和可重复性。该设计确保每个生产步骤都针对微型元件和集成电路设备的生产进行了优化。该系统配备了各种先进的功能，以最大限度地提高效率，减少完成一个周期所需的时间。这包括一个双腔室设计，它可以在所需的过程之间自动切换，从而使反应堆运行更快，中断更少。此外,自动快门装置有助于保持整个机器的统一工艺条件.APPLIED MATERIALS PRODUCER-S的设计精度和无与伦比的精度。它为用户提供验证和确认最佳工艺条件所需的工具。这是通过各种可以实时监控的诊断来实现的。所有相关参数都可以在整个生产过程中进行监控，允许操作员在过程出现问题时快速介入。反应堆也被设计成易于维护。其先进的功能保证了它的寿命和性能。除了这些创新功能外，该工具还提供多种安全功能，为其操作员提供安心。一旦遵循了所有安全准则,用户就可以利用资产的强大设计,并确保他们能够运行多个进程而不会出现任何问题。PRODUCer-S是一个非常先进和可靠的反应堆，提供无与伦比的多功能性和性能。APPLIED MATERIALS Producer S凭借其高效的设计和先进的特点，是任何希望以绝对精确的精度生产高品质产品的人的绝佳选择。
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