二手 AMAT / APPLIED MATERIALS Smartweb SL-3L/800 #293745938 待售

ID: 293745938
优质的: 2018
Roll to roll coating system (2) Chillers Roughing pump system Process and rewinding module Media supply Electrical cabinet Cooling Heating Trolley Cathode colling Control PC Console table Scrubber Coatings: Materials / Mode Metals: Copper, Gold, Silver, Aluminium, Molybdenum, Titanium / DC Alloys: Ni/Cr 80/20 / DC Dielectrics: ITO, AI:ZnO / DC SiOx, AI2O3, TiO2 /MF ZnO / DC, MF System cooling water: Inlet pressure: 4 to 6 bar Outlet pressure: Pressure-less, Open drain Consumption: Maximum 50 m³/h Average consumption: Approximate 26 m³/h Temperature (Inlet): Minimum 18°C, Maximum 22°C Temperature rise: Maximum 6°C Carbonate hardness: <6 to 8° pH value: 8.5 to 10 particle size: Maximum 100 μm Particle concentration: Maximum 10 parts/cm³ CO2-content: Maximum 15 mg/l CI-content: Maximum 20 mg/l Cathode cooling circuit: Filling quantity: Approximate 1100 Liters Carbonate hardness: <7° pH value: 8.0 to 9 Particle size: <5 µm Solved oxygen: Maximum 5 mg/l Resistivity at + 25°C: >2 x 103 Ohm cm Compressed air: Pressure: 6 to 7 bar Average consumption: Approximate 1 m³/h Particle size: Maximum 5 µm Particle concentration: Maximum 5 mg/m³ Oil-content: Maximum 5 mg/m³ Dew point: 2°C Gases: Argon, Nitrogen, Oxygen, Argon/Oxygen 80/20 Pressure: 1, 2 bar Purity: 99.995 Gas tubing: Stainless steel, Coupling Winding: Web speed: 0.5 to 20.0 m/min + 0.1% of nominal speed at the motor shaft Unwind / Rewind: 60 to 600 N Tension measuring rollers with analog load cell Vacuum: Ultimate pressure: <8 x 10^-7 mbar in sputtering compartments of process modules Pump down time to ultimate pressure: 24 Hours Pressure during sputtering: 1 to 9 x 10^-3 mbar Pump down time to 6 x 10^-6 mbar: <60 minutes Measured at a pressure: < 2x10^-3 mbar Gas separation factor between sputter compartments and sputtering compartments: >100: 1, only for maximum substrate thickness loaded Electrical Services: Voltage: 400 V +10/-10% 50 Hz, 3 Phase, TN-network with loadable PEN for 60 Hz Connected load: 320 kVA Average consumption: Approximate 240 kW Short circuit current: Maximum 50 kA Process coating: Magnetron sputtering coating technology One coated side Substrate width: Maximum 820 mm Coating area web width reduced: 10 mm Coating width: Minimum: 300 mm, Maximum: 600 mm Environment: Temperature: Minimum 15°C, Maximum 35°C Humidity: Maximum 90% at 20°C, Maximum 50% at 35°C Maximum altitude of installation site: 1000 m above sea level 2018 vintage.
AMAT Smartweb SL-3L/800反应堆是为先进半导体制造工艺设计的尖端薄膜沉积设备。这个先进的工具结合了创新技术,以实现高水平的胶片均匀性、过程控制和生产率。SL-3L/800反应堆是APPLIED MATERIALS Smartweb系列的一部分,以其在制造集成电路和其他电子器件方面的卓越性能和可靠性着称。SL-3L/800反应堆的核心是其先进的腔室设计,能够精确控制沉积过程。反应堆配有多区温度控制系统,允许对底物表面的膜性能进行优化。该特性保证了薄膜厚度的均匀性和一致性,对半导体器件的性能和可靠性至关重要。SL-3L/800反应器采用高通量结构,使薄膜能够沉积在大批量的基板上。这种能力大大提高了半导体制造业务的生产率和成本效益。该反应堆的设计可容纳各种基材尺寸、形状和材料,在生产过程中提供灵活性和多功能性。SL-3L/800反应堆的一个主要特点是其先进的气体分配装置,它确保了对燃气流的精确控制和室内的溷合。这一特性增强了沉积膜的均匀性和纯度,有助于半导体器件的整体质量。反应堆还配备了精密的压力控制机,使工艺条件稳定,薄膜性能得到改善。SL-3L/800反应堆与AMAT/APPLIED MATERIALS专有的Smartweb软件平台集成,提供全面的过程监控能力。该软件允许实时流程优化、故障检测和数据分析,从而确保了高流程重复性和产量。Smartweb平台还能够对反应堆进行远程监测和控制,促进运行效率和减少停机时间。在沉积能力方面,SL-3L/800反应堆支撑着广泛的薄膜材料,包括电介质、金属和半导体。该反应器能够沉积具有精确厚度和成分控制的薄膜,对制造先进的半导体器件至关重要。无论是前端生产还是后端生产,SL-3L/800反应堆都提供了前沿半导体制造工艺所需的灵活性和性能。最后,AMAT Smartweb SL-3L/800反应器是一种先进的薄膜沉积工具,它结合了半导体制造的精度、生产率和可靠性。凭借其先进的腔室设计、高吞吐量能力和集成的软件平台,SL-3L/800反应堆为制造下一代电子设备提供了卓越的性能。该反应堆代表了半导体行业的一项关键技术进步,使制造商能够满足不断变化的市场趋势和应用的需求。
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