二手 LAM RESEARCH Sabre 3D #9269753 待售
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ID: 9269753
Plating system, 12"
Process: RDL
Operating system: Windows XP
Footprint:
Front end and back end robot
Wafer aligner
CDM for APT module
CDM for XMM module
PPT Module (2/4)
Plate A duet (1/2)
Bath module 1
Plate A flow distribution (1/2)
PMA Bath configuration: AANN
CE System settings:
Pod loader with buttons and lights-PS
Notch wafer, 12"
Standard polarity
Signal tower
EIOC Support
Advanced FA GEM and data server
HSMS Host connection
SEMI E84 Automated material handling system
Wafer history
Proteus configuration
Facilities chemical interface
Single arm front end robot
Dual arm back end robot
Real time clock timestamp source
Wafer aligner
CWS Wafer size detection
Single clamshell lift controller
CE Module front end settings:
IOC Type: Ethernet based IOC
(25) Wafers per cassette
SEMI E84 Automated cassette transfer
Active wafer centering
CA Event mode
(3) Load ports
Traverser (slide axis) vacuum robot
Ethernet pod loader communication
Extended fix loader command mode
With pod present sensor
Standard fix loader hardware
With pod present sensor
Default AMHS setting
Serial Port RFID communication
PPT2 AWC Enabled checking firmware
Robot pod loader map source
Pod loader, 13"
CE Module CDM for APT module:
ADM Process delivery: DI Process
CE Module CDM for XMM module:
PCDM Module type: SRD Configuration module
CE Module PPT module 2:
Notch wafer, 13"
Post treatment PPT module
PPT Tank type: ADM Process DI
Super cell configuration: SRD
Valve position sensors
DI Flow meter
CE Module PPT module 4:
Notch wafer, 13"
Post treatment PPT module type
Super cell configuration: SRD
Active Wafer Detection (AWD)
Valve position sensors
DI flow meters
N2 Dry
CE Module plate A duet 1 and 2:
Notch wafer, 13"
Cup and contact rinse
Separate Anode Chamber (SAC): Cascade
Serial plating power supply control
Single power supply
Cell flow meters: 5 to 50 Liters
88 I/O EIOC
Valve position sensors
SAC Flow meter
Standard SAC pump
CE Module bath module 1:
Chemical Monitoring System (CMS)
Enhanced CMS command set
Copper chemical package
Multi species dosing algorithm
(5) Species
Separate Anode Chamber (SAC): Cascade
Chemistry tray container bottles
(3) Organic dosing containers
NESLAB Heater chiller
VMS Facility request channel 1
Pump organic dose delivery
Dose pump flow switch
88 I/O EIOC
Central recirculation pump
Renner recirculation pump
Bath module 1
CE Module plate-A flow distribution 1 and 2:
FDM Flow meter: 0 to 80 LPM
Independent FDM pump
Central recirculation pump
No PMB Bath
2017 vintage.
LAM RESEARCH Sabre 3D是一种高速直写电子束光刻设备,能够产生尺寸小至30纳米的三维结构。它使用了一种独特的、正在申请专利的无场电子束源,使其在速度、分辨率和模式保真度方面具有无与伦比的性能。佩刀3 D系统由真空室、电动级和晶圆架、电子束源、成像单元和控制计算机组成。真空室创造出高真空的气氛(~ 10-9 torr),这是电子束不受阻碍地向晶片传播所必需的。电动级将样品晶片放置在腔室中,晶片支架将晶片固定到位。电子束在无场电子柱中生成并加速,使场散射和偏转最小化。光束通过电光成像机,将图样成像到晶圆上。该工具还包括一台控制计算机,该计算机对成像资产和晶圆级提供必要的信号处理和控制,并链接到设备特定的模式生成器。这允许用户定义所需的模式并将它们输入到模型中。用户可以使用控制计算机上直观的图形用户界面轻松操作和校准设备。LAM RESEARCH Sabre 3D系统能够在任何材料(包括半导体级材料)制成的晶片上成像非常高分辨率的图样。它还具有高达15 keV的聚焦电子束能量和高达100nA的束电流,模式写入速度高达175晶圆/小时。这允许创建特征大小小至30 nm的三维结构。Sabre 3D单元是研发新材料和制造工艺的宝贵工具,特别是那些涉及纳米级结构的材料和制造工艺。这台机器提供了经济高效、高性能的解决方桉,以应对原子精确制造带来的挑战。它是需要极致精度和速度的研究人员和制造商的理想选择。
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