二手 MATTSON EpiPro 3000 #9003702 待售

製造商
MATTSON
模型
EpiPro 3000
ID: 9003702
Reactors Dual station Chamber: 94" x 50" x 62" R2 Reactor chamber: 94" x 50" x 62" Electrical console AC Power module Remote interface module UPS Module Pillar vacuum tube oscillator RF generators, 125 kW Generator pump module: (Pillar only) (2) Bell jars RF Coils assy and quartz Heat exchanger: Water to water Gas inlet requirements: Gas / Inlet pressure / Tubing diameter x wall thickness N2 / 50-100 PSIG (1) / 3/8" x 0.035" H2 / 50-80 PSIG (2) / 3/8" x 0.035" HCL / 15 PSIG Regulated (3) / 1/4" x 0.035" Dopants / 35 PSIG Regulated / 1/4" x 0.035" SiCl4 / 20 PSIG Regulated / 3/8" x 0.035" SiHCl3 / 20 PSIG Regulated / 3/8" x 0.035" SiH2Cl2 / 7 PSIG Minimum / 3/8" x 0.035" Pneumatic Air/N2 / 90-100 PSIG Regulated / 3/8" x 0.035" N2 (Vacuum seal) / 80-100 PSIG (3) / 1/4" x 0.035"(1) Gas purity: H2: Greater than 99.95% minimum assay Oxygen content must be less than 2 ppm Water content must be less than 2 ppm HCl: Greater than 99.99% (semiconductor grade) Silicon sources – Greater than 100 ohm/cm intrinsic Dopants: Greater than 99.99% H2 free basis Maximum gas flows and volumes: System / H2 / N2 / H2 / N2 Mainstream / 300 / 70 (2) / 300 / 70 High flow bypass (Fixed) / 200 / 100 (1) / 200 / 100 (1) SiCl4 / SiHCl3 Carrier / 30 / - / - / - Dopants dilution / 30 / - / - / - RF Coil / Lower reactor purges / 30 / 10 / 30 / 10 Gas panel purges (Fixed) / 12 / 4 / - / - Rotation purges (Fixed) / 10 / 2 / 10 / 2 Total N2/H2 flows / 612 / 186 / 540 / 182 (1) N2 flow rate during pre-post purge Quartz cleaning facility: Pedestal / 30-0R-281 / 4 1/2" diameter x 12" long Support rod / 30-0R-139 / 1" diameter x 5" long Coil cover / 30-0Z-000 / 25" diameter x 2" thick Insulator, high Side / 30-0Z-857 / 3" diameter x 6" long Insulator, bottom / 30-0Z-766 / 4 1/2" diameter x 1/4" thick Insulator, top / 30-0Z-791 / 4 1/2" diameter x 1/4" thick Insulator, high side / 30-0Z-793 / 5" x 4" Insulator, middle / 30-0Z-794 / 5" x 4" Inject tube / 30-0Z-758 / 1/2" diameter x 11" long Tube cover / 30-0Z-1037 / 1/2" diameter x 9" long Rod, fiber optic / 30-0Z-1037 / 1/4" diameter x 13" Power requirements: RF Generator: 480 VAC, 400 A, 3-Phase, +GND Water system: 480 VAC, 30 A, 3-Phase, +GND Electrical service: 10 KVA at 200-240 VAC, 50 amps, 50/60 Hz, single phase, 3 wire (6 ga) plus ground.
MATTSON EpiPro 3000是为大面积外延和沉积而设计的先进半导体沉积反应器。该反应堆提供可靠的生产,降低拥有成本。它具有高达500毫米晶圆的高温和高精度操作功能,可提供可重复的工艺一致性,同时大大降低了拥有成本。EpiPro 3000利用先进的设计和功能来确保每个半导体沉积过程的可重复性和准确性。它具有低振动无碰撞气源,允许真正统一的处理结果。晶片级由超精确的运动控制设备驱动,提供最大的稳定性和可重复性。通过采用高效金属陶瓷包覆绝缘材料,优化了该反应堆的高温运行。专利封闭式电极驱动系统消除了振动和漂移补偿的需要,确保了精确的电极正时和最大的稳定性。MATTSON EpiPro 3000提供了多种性能增强功能,如可编程配方管理、现场分析和监控以及分布式联网。这些功能为用户提供了对每个沉积过程更大的控制和更高的准确性。反应堆的用户友好性因其集成控制单元而得到进一步增强,该单元需要最少的操作员干预。此外,EpiPro 3000还提供了一整套环保功能,例如气体清除和洗涤器。这确保了反应堆符合区域安全标准。该反应堆的建造考虑到安全性和可靠性,并配备了有效的预防性维护机器,以最大限度地提高运行时间和过程稳定性。MATTSON EpiPro 3000是一种先进、高性能的沉积反应器,具有卓越的工艺重复性和准确性。其低拥有成本和用户友好的设计使其成为涉及大面积半导体沉积工艺的广泛应用的理想选择。
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