二手 NOVELLUS CONCEPT 2 Altus 2 #9093685 待售
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ID: 9093685
晶圆大小: 8"
优质的: 1999
Chamber, 8"
Facility and Interface:
Altus module locations: Dual: Port 2 and 3
WTS (backbone) facilities connection configuration: Bottom facilities installation
Remote interconnect cables: 75 feet
DLCM-S:
ROBOT ASSY, MAG7, BISYMMETRIK ARM, DLCM: 02-262359-00
Transfer module to chamber valve (SMC Valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit: Dual altus ready
Software/Controls:
Module controller type: MC2
System software (QNX): MC2
DLCM-S IOC:
0 - IOC - 4.1
2 - IOC - 4.1
3 - IOC - 4.1
Altus IOC:
0 - SIOC - 4.30
1 - SIOC - 4.30
2 - SIOC - 4.30
3 (MPD) - SIOC - 4.10
Process Chamber configuration:
SHWRHD, 200 mm, Style B: 03-00258-00
ASSY, PED, 200 mm MOER, D.3, SEMI: 02-033134-01
EXCL RING, 200 mm, 2.0 mm OH SEMI: 15-032777-00
Indexer plate, HUB: 15-034848-00
INDEXCER, WF, EXCL, OPTION, 200 mm: 15-00934-02
Spindle assembly: 02-126697-00
OPT ENDPT DET'R, MSTR, ALT-S: 04-0120458-00
Throttle Valve MKS (Pressure control valve): 27-250285-00
Gate valve, vat: 60-10015-00
Gas box configuration (CESCVD02177B):
Manifold A 1: Aera FC-7800CD, AR/2 SLM
Manifold A 3: Aera FC-7800CD, H2/20 SLM
Manifold B 6: Aera FC-7800CD, C2F6/2 SLM
Manifold B 7: Aera FC-7800CD, O2/2 SLM
Manifold D 2: Aera FC-7800CD, SiH4/100 SCCM
Manifold H D: Aera FC-7800CD, Ar/20 SLM
Manifold W 4: Aera FC-7800CD. AR/20 SLM
Manifold W 5: Aera FC-7800CD, WF6/1 SLM
Manifold C 8: Aera FC-7800CD, Ar/10 SLM
Manifold C 9: Aera FC-7800CD, H2/20 SLM
Baratron:
Altus, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Altus, CAP MANOMETER, HEATED 10 TORR: 27-10343-00
Altus, Backside, CAP MANOMETER< HEATED 100 TORR: 27-10340-00
DLCM-S, LOADLOCK, CAP MANOMETER, HEATER 100 TORR: 27-10340-00
DLCM-S, TM, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Supporting remote units:
(1) Process pump per process chamber: BOC Edwards, IH1000 - x2 for process pump typical
(1) Pedestal pump per process chamber: BOC Edwards, i80 - x2 for pedestal pump typical
(1) TM pump per system: BOC Edwards, i80 - x1 for TM pump typical
(1) LL pump per system, BOC Edwards, i80, x1 for LL pump typical
1999 vintage.
NOVELLUS Concept 2, Altus 2是一种化学气相沉积（CVD）反应器，或称腔室，旨在将高纯度材料的薄膜沉积到基板表面。Altus 2能够在300°C至650°C的高温下沉积多种材料，如外延硅、多硅、氧化物、氮化物和碳化物。NOVELLUS CONCEPT 2 Altus 2由模块底座、集成电路的加工室、门组件、电源、气体歧管和其他各种部件组成。CONCEPT 2 Altus 2反应器由一个圆柱形的不锈钢室组成，其中放置了基板。腔壁采用316L不锈钢制成，厚度为4.8毫米。壁朝向腔室底部向内逐渐变细，从而能够有效地分配热量。基板搁置在铝热块之上，加热到所需温度。源气体通过输送系统引入腔室的上部（最大距离为8英寸）。NOVELLUS CONCEPT 2 Altus 2反应堆可以以直流模式（直流电）或射频模式（射频）操作。在直流模式下，基板保持在低电压电位，允许沉积材料的连续膜的形成，而射频模式在膜层中形成金属颗粒。电源提供高达400 A的电流（DC模式）,并且可以调整以改变沉积速率。CONCEPT 2 Altus 2具有内置的基于力的流量控制（FBFC）系统,可精确输送过程气体,而气体溷合比二极管阵列探测器（GM-RAD）则可持续监控沉积环境。反应堆的运行参数可以利用内置控制系统进行调整，使得在要沉积的材料的不同配方之间进行切换成为可能。NOVELLUS CONCEPT 2 Altus 2还有一条额外的三条气体歧管线，能够同时向腔室引入多达三种反应气体。最后，CONCEPT 2 Altus 2是一种高度通用、高效的CVD反应器，能够在高度受控的操作条件下将高纯度材料薄膜沉积到基板上。它具有多种设计和安全功能,使它的使用既可靠又经济高效。
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