二手 NOVELLUS CONCEPT 2 Altus 2 #9093687 待售
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ID: 9093687
晶圆大小: 8"
Chamber, 8"
Facility and Interface:
Altus module locations: Dual: Port 2 and 3
WTS (backbone) facilities connection configuration: Bottom facilities installation
Remote interconnect cables: 75 feet
Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11
DLCM-S:
ROBOT ASSY, MAG7, BISYMMETRIK ARM, DLCM: 02-262359-00
Transfer module to chamber valve (SMC Valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit: Dual altus ready
Software/Controls:
Module controller type: 02-272554-00, MC3
System controller type: 02-267883-00, MC3
System software (QNX): 5.1
DLCM-S IOC:
0 - IOC - 4.1
2 - IOC - 4.1
3 - IOC - 4.1
Altus IOC:
0 - SIOC - 4.30
1 - SIOC - 4.30
2 - SIOC - 4.30
3 (MPD) - SIOC - 4.10
Chase UI Kit: 02-117110-00
Process Chamber configuration:
SHWRHD, 200 mm, Style B: 03-00258-00
ASSY, PED, 200 mm MOER, D.3, SEMI: 02-033134-01
EXCL RING, 200 mm, 2.0 mm OH SEMI: 15-032777-00
Indexer plate, HUB: 15-034848-00
INDEXCER, WF, EXCL, OPTION, 200 mm: 15-00934-02
Spindle assembly: 02-126697-00
OPT ENDPT DET'R, MSTR, ALT-S: 04-0120458-00
Throttle Valve MKS (Pressure control valve): 27-250285-00
Gate valve, vat: 60-10015-00
Gas box configuration (CESCVD02177B):
Manifold A 1: Aera FC-7800CD, AR/2 SLM
Manifold A 3: Aera FC-7800CD, H2/20 SLM
Manifold B 6: Aera FC-7800CD, C2F6/2 SLM
Manifold B 7: Aera FC-7800CD, O2/2 SLM
Manifold D 2: Aera FC-7800CD, SiH4/100 SCCM
Manifold H D: Aera FC-7800CD, Ar/20 SLM
Manifold W 4: Aera FC-7800CD. AR/20 SLM
Manifold W 5: Aera FC-7800CD, WF6/1 SLM
Manifold C 8: Aera FC-7800CD, Ar/10 SLM
Manifold C 9: Aera FC-7800CD, H2/20 SLM
Baratron:
Altus, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Altus, CAP MANOMETER, HEATED 10 TORR: 27-10343-00
Altus, Backside, CAP MANOMETER< HEATED 100 TORR: 27-10340-00
DLCM-S, LOADLOCK, CAP MANOMETER, HEATER 100 TORR: 27-10340-00
DLCM-S, TM, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Supporting remote units:
(1) Process pump per process chamber: BOC Edwards, IH1000 - x2 for process pump typical
(1) Pedestal pump per process chamber: BOC Edwards, i80 - x2 for pedestal pump typical
(1) TM pump per system: BOC Edwards, i80 - x1 for TM pump typical
(1) LL pump per system, BOC Edwards, i80, x1 for LL pump typical.
NOVELLUS CONCEPT 2 Altus 2是NOVELLUS CONCEPT 2 Reactor平台的双频双源版本。该反应堆由两级平板显示器和模块化控制设备监管，使其效率高，易于管理。它具有两个可分别调节的高频能量源，允许广泛的过程控制。它具有先进的速度控制功能,可实现整个晶圆的精确过程控制和均匀性。该反应器还具有进行精确温度和气流调节的能力，进一步实现了专门薄膜沉积的确切工艺要求。CONCEPT 2 Altus 2反应器是基于传统的感应耦合等离子体过程。它是一个单源的基于II-V的低压平面反应堆，利用自偏来诱导等离子体。系统以两个频率运行；较低的源为13.65 MHz，较高的源为27.3 MHz。双频设置允许对过程进行更多的控制并提高性能。这两种频率设置还允许使用多个气流，从而能够精确控制沉积过程。专用面板安装的监控单元用户友好、高效。通过全过程监控和简化参数处理，对沉积过程进行了严格控制。多加热基板端口在开发过程时允许最大程度的灵活性。它具有内置的安全功能,使操作员能够防止因操作员错误或设备更改而造成的不必要的过程更改。NOVELLUS CONCEPT 2 Altus 2反应堆为用户提供了进行高级研究的可靠高效的机器。它具有灵活、模块化的设计,能够快速原型设计和实验室规模的生产。它的综合控制工具确保按照最严格的规范进行过程。这个最先进的反应堆不断升级，以跟上IC制造业的最新技术和需求。CONCEPT 2 Altus 2反应器是制造各种薄膜结构的可靠高效的工具。
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