二手 NOVELLUS CONCEPT 2 Altus #181297 待售

ID: 181297
晶圆大小: 8"
优质的: 1996
Dual Shrink W-CVD Chemical vapor deposition system, 8" Chamber Location 1 Station Left Loadlock 2 station Process Module 3 station Process Module 4 station Right Loadlock 5 Station Cooling Sation Electrical Requirements AC power Voltage 208 VAC DLCM Configuration Indexer Type: Animatic Controller Brooks Robot Type: Mag7 Host Interface: GEN/SECS Controller Type : P166/64M/QNX4 DLCMS Type: Only Hi Module Interface Type: Arc-net Type IOC : Ver 4.1 TM Manometer 1 torr/ 100mtorr: Tylan General L/L Manometer 100torr: Tylan General L/L Convectron: Not Install Module Door Type: SMC L-Motion Chamber A: Process Option BLKT Clean Option Insuts Clean MOER Ceramic M/A / M/B (Not Used) Throttle Valve Type Tylan General 1ea MFC Type & Size Brooks 5964: Ar (5000Sccm) Ar (10000Sccm) Area FC980C: NH3 (150Sccm) Brooks 5964: Ar (10000Sccm) Ar (20000Sccm) Ar (20000Sccm) H2 (20000Sccm) H2 (20000Sccm) Area FC980C: B2H6, N2 (750Sccm) Brooks 5964: C2F6 (2000Sccm) SAM MC4VLZ24: WF6 (1000Sccm) Brooks 5964: O2 (2000Sccm) SiH4 (1500Sccm) SFC1480FPD: SiH4 (300Sccm) Slip Valve Type: SMC L-Motion Chamber B: Process Option BLKT Clean Option Insuts Clean MOER Ceramic M/A / M/B (Not Used) Throttle Valve Type Tylan General 1ea MFC Type & Size SPEC 7330: Ar (5000Sccm) Ar (5000Sccm) NH3 (1000Sccm) NH3 (1000Sccm) Ar (20000Sccm) Ar (5000Sccm) Ar (15000Sccm) H2 (5000Sccm) H2 (20000Sccm) B2H6, N2 (750Sccm) C2F6 (2000Sccm) WF6 (750Sccm) O2 (2000Sccm) SiH4 (1000Sccm) Slip Valve Type SMC: L-Motion 1996 vintage.
NOVELLUS CONCEPT 2 Altus是一种高度专业化和先进的PVD(物理气相沉积)反应堆设备。常用于将沉积材料的薄膜涂在硅片等大型基板上,用于半导体、光电和微电子器件。CONCEPT 2 Altus系统旨在提供高度的过程控制、一致性和灵活性,以优化过程产量为目标。PVD室由直线电动机驱动,为均匀沉积提供稳定稳定的环境。它还具有可变基板尺寸、可调节的炮位、多个区域和两个沉积物料来源,有助于最大限度地提高工艺的均匀性和吞吐量。该室还具有快速、高精度的机械臂,可快速准确地将物料移动和装载到室中。NOVELLUS CONCEPT 2 Altus机组配备了多种传感器和控制器,可持续监控过程并提供反应均匀性的详细反馈。这样可以确保薄膜达到尽可能高的质量和可重复性。该机还包括可用于实时监测、评估和调整沉积过程的专有软件。CONCEPT 2 Altus工具为用户提供了更好的过程参数控制、更高的准确性和可重复性以及更好的过程稳定性。它是那些希望快速高效地将高质量薄膜应用于大型基板的人的理想资产。优越的性能、可重复性和灵活性相结合,使得NOVELLUS CONCEPT 2 Altus模型成为大容量PVD应用的完美选择。
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