二手 NOVELLUS CONCEPT 2 Altus #9095522 待售
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已售出
ID: 9095522
晶圆大小: 8"
Chemical vapor deposition (CVD) system, 8"
Process: Shrink DLCM
Non-shrink process modules
SSD Module: Dual chamber
Wafer type: Notch
SECS/GEM Software: No
Standard chamber
Mainframe options:
System controller: MC3
Signal tower: No
AC Power rack: Standard
Interconnect cables: No
DLCM
User interface: Adjacent to system
Transfer robot type: BROOKS MTR 5
Paddle type: Standard
Shuttle type: Standard
Cassette type: No
Indexer type: Type II
Cool station: No
SMIF loader type: No
Manometer: Standard 100 Torr
Facilities configuration: Either
Control system: QNX4
Pump electrical interface: No
Missing parts:
Animatics type
Leak check shutoff valve
Process module A: Altus
Controller type: MC3
IOC Version: 3.02
Gate and throttle valve: Internal, non-heated
Process manometer: 100 Torr non-heated
Heater pedestals: D-Type
Shower heads: Yes
MOER Rings: No
Spindle assy seal type: Ferrofluidic
X-Y Centering station: Yes
Viewport window: Sapphire
RF Match: Trazar
Chamber process: Tungsten plug fill
Full face coverage
Module location: Center port
Standard footprint
Facility connections: Rear of chamber
Module location: Center port (default)
Missing parts:
RF High frequency generator
Endpoint detector
Gas box: Standard 10 channel
MFC Type: BROOKS 5964
MFC Size and location
Channel Gas Flow (SLM)
1 Argon 2 SLM
2 Sih4 50 sccm
3 Hydrogen 20 SLM
4 Argon 20 SLM
5 Wf6 Missing
6 C2F6 2 SLM
7 Oxygen S SLM
8 Argon 10 SLM
9 Hydrogen 20 SLM
10 Nitrogen 10 SLM
Process module B: Altus
Gate and throttle valve: Internal, non-heated
Process manometer: 100 Torr non-heated
Heater pedestals: D-Type
Shower heads: Yes
MOER Rings: No
Spindle assy seal type: Ferrofluidic
X-Y Centering station: Yes
Viewport window: Sapphire
RF Match: Trazar
Chamber process: Tungsten plug fill
MOER Rings
Sequel process module A center port
Standard footprint
RF Generator: No
Optical endpoint detector: Yes
Facility connections: Rear of chamber
Module location: Right port
Missing parts:
RF High frequency generator
Controller type
Gas box: Standard 10 channel
10 Gas, missing 9 gas sticks
MFC Size and location
Channel Gas Flow (SLM)
5 Wf6 750 sccm
(1-10) Missing.
NOVELLUS CONCEPT 2 Altus(C2A)是一种高性能反应器,设计用于半导体行业的等离子体蚀刻、沉积和溅射应用。该设备采用高功率与大电极面积相结合的立式磁性专利技术,实现了优越的工艺稳定性。C2A反应堆由30千瓦高频发电机提供动力,使其能够处理比标准反应堆吞吐量更快的大面积基板。反应堆还具有先进的自动调谐系统,使其能够快速准确地优化每个加工晶片的等离子体工艺参数。该C2A具有独特的垂直磁场,能够产生比标准反应堆更高的等离子体温度和更低的密度。这种较高的能量等离子体能够提高蚀刻速率和提高均匀性。该C2A还利用可调节的上部静电屏蔽防止等离子体污染和浮动卡盘来维持一个一致的基板温度。该C2A还具有多个腔室,以提高处理灵活性。这允许用户同时或按顺序执行多个进程。C2A先进的气体管理单元保证了气流的均匀性和总气体控制。这样可以确保过程参数保持一致,而不管基板的大小或处理的基板的数量如何。C2A还配备了先进的控制机器,允许用户实时监控、调整和优化流程参数。此工具利用高级用户界面方便操作和软件,使用户能够为不同的基材和应用程序创建和存储流程配方。CONCEPT 2 Altus(C2A)是一种高度可靠、先进的反应堆,设计用于等离子体蚀刻、沉积和溅射场的半导体加工。其30千瓦HF发电机、可调上静电屏蔽、浮动卡盘确保了优越的工艺稳定性,而其垂直磁性技术、可调气体管理资产、优越的控制模式则保证了优越的性能。C2A是任何半导体加工设施的理想选择。
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