二手 NOVELLUS CONCEPT 2 Altus #9095522 待售

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ID: 9095522
晶圆大小: 8"
Chemical vapor deposition (CVD) system, 8" Process: Shrink DLCM Non-shrink process modules SSD Module: Dual chamber Wafer type: Notch SECS/GEM Software: No Standard chamber Mainframe options: System controller: MC3 Signal tower: No AC Power rack: Standard Interconnect cables: No DLCM User interface: Adjacent to system Transfer robot type: BROOKS MTR 5 Paddle type: Standard Shuttle type: Standard Cassette type: No Indexer type: Type II Cool station: No SMIF loader type: No Manometer: Standard 100 Torr Facilities configuration: Either Control system: QNX4 Pump electrical interface: No Missing parts: Animatics type Leak check shutoff valve Process module A: Altus Controller type: MC3 IOC Version: 3.02 Gate and throttle valve: Internal, non-heated Process manometer: 100 Torr non-heated Heater pedestals: D-Type Shower heads: Yes MOER Rings: No Spindle assy seal type: Ferrofluidic X-Y Centering station: Yes Viewport window: Sapphire RF Match: Trazar Chamber process: Tungsten plug fill Full face coverage Module location: Center port Standard footprint Facility connections: Rear of chamber Module location: Center port (default) Missing parts: RF High frequency generator Endpoint detector Gas box: Standard 10 channel MFC Type: BROOKS 5964 MFC Size and location Channel Gas Flow (SLM) 1 Argon 2 SLM 2 Sih4 50 sccm 3 Hydrogen 20 SLM 4 Argon 20 SLM 5 Wf6 Missing 6 C2F6 2 SLM 7 Oxygen S SLM 8 Argon 10 SLM 9 Hydrogen 20 SLM 10 Nitrogen 10 SLM Process module B: Altus Gate and throttle valve: Internal, non-heated Process manometer: 100 Torr non-heated Heater pedestals: D-Type Shower heads: Yes MOER Rings: No Spindle assy seal type: Ferrofluidic X-Y Centering station: Yes Viewport window: Sapphire RF Match: Trazar Chamber process: Tungsten plug fill MOER Rings Sequel process module A center port Standard footprint RF Generator: No Optical endpoint detector: Yes Facility connections: Rear of chamber Module location: Right port Missing parts: RF High frequency generator Controller type Gas box: Standard 10 channel 10 Gas, missing 9 gas sticks MFC Size and location Channel Gas Flow (SLM) 5 Wf6 750 sccm (1-10) Missing.
NOVELLUS CONCEPT 2 Altus(C2A)是一种高性能反应器,设计用于半导体行业的等离子体蚀刻、沉积和溅射应用。该设备采用高功率与大电极面积相结合的立式磁性专利技术,实现了优越的工艺稳定性。C2A反应堆由30千瓦高频发电机提供动力,使其能够处理比标准反应堆吞吐量更快的大面积基板。反应堆还具有先进的自动调谐系统,使其能够快速准确地优化每个加工晶片的等离子体工艺参数。该C2A具有独特的垂直磁场,能够产生比标准反应堆更高的等离子体温度和更低的密度。这种较高的能量等离子体能够提高蚀刻速率和提高均匀性。该C2A还利用可调节的上部静电屏蔽防止等离子体污染和浮动卡盘来维持一个一致的基板温度。该C2A还具有多个腔室,以提高处理灵活性。这允许用户同时或按顺序执行多个进程。C2A先进的气体管理单元保证了气流的均匀性和总气体控制。这样可以确保过程参数保持一致,而不管基板的大小或处理的基板的数量如何。C2A还配备了先进的控制机器,允许用户实时监控、调整和优化流程参数。此工具利用高级用户界面方便操作和软件,使用户能够为不同的基材和应用程序创建和存储流程配方。CONCEPT 2 Altus(C2A)是一种高度可靠、先进的反应堆,设计用于等离子体蚀刻、沉积和溅射场的半导体加工。其30千瓦HF发电机、可调上静电屏蔽、浮动卡盘确保了优越的工艺稳定性,而其垂直磁性技术、可调气体管理资产、优越的控制模式则保证了优越的性能。C2A是任何半导体加工设施的理想选择。
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