二手 NOVELLUS CONCEPT 2 Dual Altus 2 #9093690 待售
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ID: 9093690
Chamber
Includes:
(1) Process pump per process chamber: BOC Edwards, P/N: ih1000
(1) Pedestal pump per process chamber: BOC Edwards, P/N: i80
(1) TM Pump per system: BOC Edwards, P/N: i80
(1) LL Pump per system: BOC Edwards, P/N: i80
Facility and Interface:
Altus module locations: Dual, Port 2 and 3
Remote interconnect cables; 75 ft
Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11
DLCM-S:
Robot assy, Mag7, Bisymmetrik Arm, DLCM: 02-262359-00
Transfer module to chamber valve (SMC Valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit: Dual Altus ready
Software/Controls:
Modular controller type: 02-272554-00, MC3
System controller type: 02-267883-00, MC3
System software (QNX): 5.1
DLCM-S IOC:
0, IOC, 4.1
2, IOC, 4.1
3, IOC, 4.1
Altus IOC:
0, SIOC, 4.30
1, SIOC, 4.30
2, SIOC, 4.30
3 (MPD), IOC, 4.10
Chase UI Kit: 02-117110-00
Process Chamber Configuration:
SHWRHD, 8", Style B: 03-00258-00
Assy, Ped, 8" Moer, D.3, Semi: 02-033134-01
Excl ring, 8", 2.0 mm Oh, Semi: 15-032777-00
Indexer plate, Hub: 15-034848-00
Indexer, WF, Excl, Option, 8": 15-00934-02
Spindle assembly: 02-126697-00
Opt endpt det'r, Mstr, Alt-s: 04-120458-00
Throttle valve MKS (Pressure control valve): 27-250285-00
Gate valve, vat: 60-10015-00
Gas Box Configuration:
A Manifold:
1: Aera FC-7800CD, AR/2 SLM
3: Aera FC-7810CD, H2/20 SLM
B Manifold:
6: Aera FC-7810CD, C2F6/2 SLM
7: Aera FC-7800CD, O2/2 SLM
D Manifold:
2: Aera FC-7800CD, SiH4/100 SCCM
H Manifold:
D: Aera FC-7810CD, AR/20 SLM
W Manifold:
4: Aera FC-7810CD, Ar/20 SLM
5: Aera FC-7800CD, WF6/1 SLM
C Manifold:
8: Aera FC-7810CD, AR/10 SLM
9: Aera FC-7810CD, H2/20 SLM
Baratron:
Altus, CAP MANOMETER,HEATED 100 TORR: 27-10340-00
Altus, CAP MANOMETER,HEATED 10 TOR: 27-10343-00
Altus, Backside, CAP MANOMETER,HEATED 100 TORR: 27-10340-00
DLCM-S, LOADLOCK, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
DLCM-S, TM, CAP MANOMETER,HEATED 100 TORR: 27-10340-00.
NOVELLUS CONCEPT 2 Dual Altus 2反应堆是一种化学增强的物理气相沉积（CEPVD）反应堆，用于生产大容量半导体器件产品。它基于支持各种动态配置中的不同应用程序的模块化体系结构。反应堆设计有双室，允许在一个室中进行高速率沉积，在另一个室中进行低速率沉积。这使得反应堆能够保持高吞吐量，同时降低消耗性成本。反应堆具有独特的热无与伦比的设计，将晶圆加工室与源腔分离，从而使高速率沉积不受源腔热变化的影响。这种热隔离能够有效的热管理和一致的沉积速率。另外，CONCEPT 2 Dual Altus 2使用了一个分裂沉积室，使得同一室内的不同层能够沉积。这种分室设计使反应堆更容易融入半导体生产线。NOVELLUS CONCEPT 2 Dual Altus 2反应堆采用定制石英管，提供卓越的负载处理、温度均匀性和均匀的沉积速率。它具有先进的晶片温度监测系统（OWTM），以确保可靠的均匀性和计时性能。先进的OWTM能够在纳秒内检测到温度的快速峰值,从而可以控制单个晶片上的热梯度。这有助于通过监视和显示每个晶片的实时温度数据来确保进程始终可靠地运行。CONCEPT 2双Altus 2反应堆的一个主要优点是能够处理多个前体批次。这使得反应堆可以在一个批次中处理具有不同平台进步的晶片。上游气体溷合系统的引入也使得NOVELLUS CONCEPT 2 Dual Altus 2能够实时调整各种工艺参数，如压力、温度和气流，从而使复杂沉积过程得到更精确的控制。总体而言，CONCEPT 2 Dual Altus 2是一种经过验证和可靠的CVD反应堆，具有极好的均匀性和生产率。它具有处理多个前体批次的能力，加上先进的晶圆温度监测系统，使其成为生产大容量半导体器件产品的理想选择。
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