二手 NOVELLUS CONCEPT 2 Dual Altus 2 #9093691 待售
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ID: 9093691
晶圆大小: 8"
Chamber, 8"
Facility and Interface:
CVD tungsten
Wafer type: SEMI
Wafer cassette type: A198-80MB-47C02 - Fluoroware
DLCM-S Heater manometers: Yes
Altus module locations: Dual, Port 2 and 3
Facilities configuration: Bottom
Remote interconnect cable length: 75 feet
Transfer
Module A Port location: Center
Module B Port locationL Right
Primary user interface: Adjacent user interface
DLCM-S:
Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11
Robot Assy, Mag7, Bisymmetrik arm, DLCM: 02-262359-00
Transfer module to chamber valve (SMC valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit (if ordered as a single altus): Dual Altus ready
Software/Controls:
Module controller type: 02-272554-00 (MC3)
System controller type: 02-267883-00 (MC3)
System software (QNX): 5.1
DLCM-S IOC:
0: Type: IOC, Firmware: 4.1
2: Type: IOC, Firmware: 4.1
3: Type: IOC, Firmware: 4.1
Altus IOC:
0: Type: SIOC, Firmware: 4.30
1: Type: SIOC, Firmware: 4.30
2: Type: SIOC, Firmware: 4.30
3 (MPD): Type: IOC, Firmware: 4.10
Chase UI Kit: 02-117110-00
Process Chamber Configuration:
SHWRHD, 8", Style B: 03-00258-00
Assy, PED, 8" MOER, D.3, Semi: 02-033134-01
Excl ring, 8", 2.0 mm Oh, Semi: 15-032777-00
Indexer plate, HUB: 15-034848-00
Indexer, WF, Excl, Option, 8": 15-00934-02
Spindle assembly: 02-126697-00
Opt endpt det'r, MSTR, Alt-S: 04-120458-00
Throttle valve MKS (Pressure control valve): 27-250285-00
Gate valve: 60-10015-00
Gas Box Configuration:
A Manifold:
1: Aera FC-7800 CD, Ar / 2 SLM
3: Aera FC-7810 CD, H2, 20 SLM
B Manifold:
6: Aera FC 7810 CD, C2F6 / 2 SLM
7: Aera FC 7800 CD, O2 / 2 SLM
D Manifold:
2: Aera FC-7800 CD, SiH4 / 100 SCCM
H Manifold:
D: Aera FC-7810 CD, Ar / 20 SLM
W Manifold:
4: Aera FC-7810 CD, Ar / 20 SLM
5: Aera FC-7800 CD, WF6 / 1 SLM
C Manifold:
8: Aera FC 7810 CD, Ar / 10 SLM
9: Aera FC 7810 CD, H2 / 20 SLM
Baratron:
Altus, CAP Manometer, Heated 100 Torr: 27-10340-00
Altus, CAP Manometer, Heater 10 Torr: 27-10343-00
Altus, Backside, CAP Manometer, Heated 100 Torr: 27-10340-00
DLCM-S, Loadlock, CAP Manometer, Heated 100 Torr: 27-10340-00
DLCM-S, TM, CAP Manometer, Heated 100 Torr: 27-10340-00
Supporting remote units:
(1) Process pump per process chamber: BOC Edwards Ih1000
(1) Pedestal pump per process chamber: BOC Edwards i80
(1) TM Pump per system: BOC Edwards i80
(1) LL Pump per system: BOC Edwards i80.
NOVELLUS CONCEPT 2 Dual Altus 2是为快速高效蚀刻加工而设计的最先进的反应堆设备。专为提供快速响应时间和对蚀刻工艺的优越控制，以提高产量而设计。CONCEPT 2 Dual Altus 2建在一个单一、通用的基板平台上，具有集成的腔室布局，允许处理参数的灵活性和优化。该平台最多可容纳四个蚀刻室，以满足日益复杂的设备需求和应用。NOVELLUS CONCEPT 2 Dual Altus 2提供可配置的等离子体功率、气流、压力和温度控制，以精确控制蚀刻过程。蚀刻工艺可以量身定制以满足特定的客户要求,并且系统对轮廓形状、层厚度、深度和长宽比保持严格控制。CONCEPT 2 Dual Altus 2利用了最新的等离子体蚀刻技术,包括独特的MESA（多蚀刻源辅助）工艺,可实现极高的蚀刻速率和高度各向异性的蚀刻轮廓。内置等离子体源既利用电容耦合，又利用感应耦合，从而提高了工艺灵活性，改善了轮廓控制。该单元还配备了自动等离子体和监控器，能够精确控制蚀刻参数。此外，该工具还配备了统一气体流动的集成气体分配系统以及集成温度控制，以确保对蚀刻工艺的精确温度控制。NOVELLUS CONCEPT 2 Dual Altus 2在满足非常苛刻的吞吐量需求的同时提供了出色的工艺一致性和可重复性。该资产还具有高级诊断功能,以及大量的流程监控选项。该模型经过了广泛的鉴定，以确保在广泛的蚀刻工艺和材料中获得可靠的高质量结果。该设备还具有极高的吞吐量,允许灵活的制造和更短的周期时间以及最小的停机时间。CONCEPT 2 Dual Altus 2提供了先进灵活的蚀刻解决方桉,可以满足各种行业应用程序的需求。
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