二手 NOVELLUS CONCEPT 2 Dual Sequel #9092631 待售
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ID: 9092631
晶圆大小: 6"
CVD system, 6"
Software: C2.SEQ_4.92B15
Operating system: QNX4
SECS GEM: Yes
Free cable length: 75 Ft
RF Cable length: 84 Ft
Indexer firmware: 2.0_G
Transfer robot: Brooks Mag 7
Chamber location: Left
Chamber model: C2-CVDD-S SEQX
EPD: Verity dual wavelength
Shower head: Al 6061 8" 16-033931-00
Handling wafer size: 6"
Heater block: No slot Sequel STN 1 pin 19-00154-04
Spindle speed: Standard
Fork assembly: Ceramic anti-deflect
15-101482-00
15-101482-01
15-00700-00
Fork type: Min Contact
15-053394-02
Spindle feed through: Ferro fluidic
Primary process gauge: 10T
Gate & throttle valve: Heated / Internal
02-260348-00
16210-0403QS-002HJR
MFC Type: Brooks GF100
IOC Software version: 4.2
RF Switching option: Yes
RPC (Remote plasma clean): No
HF RF Generator: AE Apex 5513
LF RF Generator: AE PDX 1400
RF Match AE mercury: 3013
Foreline heated: No
2.0 MFC C Open
MFC B N2 (10000 sccm)
MFC A N2O (20000 sccm)
MFC 9 NF3 (5000 sccm)
MFC 8 O2 (20000 sccm)
MFC 7 Open
MFC 6 NH3 (10000 sccm)
MFC 5 Open
MFC 4 Open
MFC 3 Open
MFC 2 N2 (5000 sccm)
MFC 1 SiH4 (1000 sccm)
Chamber location: Rear
Chamber model: C2-CVDD-S SEQX
EPD: Verity dual wavelength
Shower head: Al 6061 8" 16-033931-00
Handling wafer size: 6"
Heater block: No slot Sequel STN 1 pin 19-00154-04
Spindle speed: Standard
Fork assembly: Ceramic anti-deflect
15-101482-00
15-101482-01
15-00700-00
Fork type: Min Contact
15-053394-02
Spindle feed through: Ferro fluidic
Primary process gauge: 10T
Gate & throttle valve: Heated / Internal
02-260348-00
16210-0403QS-002HJR
MFC Type: Brooks GF100
IOC Software version: 4.2
RF Switching option: Yes
RPC (Remote plasma clean): No
HF RF Generator: AE Apex 5513
LF RF Generator: AE PDX 1400
RF Match AE mercury: 3013
Foreline heated: No
2.0 MFC C Open
MFC B N2 (10000 sccm)
MFC A N2O (20000 sccm)
MFC 9 NF3 (5000 sccm)
MFC 8 O2 (20000 sccm)
MFC 7 Open
MFC 6 NH3 (10000 sccm)
MFC 5 Open
MFC 4 Open
MFC 3 Open
MFC 2 N2 (5000 sccm)
MFC 1 SiH4 (1000 sccm)
System main power: 3ϕ 5Wires 208V
System UPS power: 3ϕ 3Wires 120V
SMIF Interface: No
Aligner option: No
Loadlock dry pump model: No
Slit valve insert: No
Slit valve type: SMC L-Motion
TM Dry pump model: No
TM Throttle valve: MKS 253B
TM BARATRON model: MKS
Front monitor: 12" LCD
Chase monitor : LCD
Loadlock BARATRON model: No
Indexer robot type: Indexer II
IOC Version: 4.1
TM Robot type: Mag 7
TM Robot blade: Ceramic
Software revision: 4.80 B22
Signal tower: Yes
Module controller: MC1
Host interface: SECS
Module A: Express
Process A: SiH4 Base
Module B: Express
Process B: SiH4 Base
System and DLCM:
MC1 (P166 64M) System
DLCM Module controller
MSSD (2 Sequel configuration) power rack
Upgrade 4 cool station
SiH4 Base oxide process
Signal cables
RF Coaxial cables
MKS 253B throttle valve
651D Throttle valve controller
MAG 7 Transfer robot
Dual arm
Indexer robot
Animatics controller
Standard shuttle assy
Chase PC and table
Generator rack
Process module:
Chamber type: Shrink
Chamber process: SiH4 base
Process clean type: In Situ
Endpoint option: No
Module controller: MC1
Heater block type: Standard
Module dry pump: No
Manometer 1(10T): MKS 627A11TBC
Throttle valve: MKS 253B-15665
Spindle topplate type: Standard
IOC2 option: Ver 4.1
Manometer 2(100T): MKS 627A13TBC
HF Generator: RFG5500
LF Generator: PDX1400
RF Match: AE Mercury 3013
TEOS Delivery cabinet: No
IOC Version: 4.1
Foreline gate heat option: Yes
Foreline gate valve type: HVA
Chamber gas box:
Gas name MFC Size MFC Model
SiH4 1 SLM AERA 7800
N2A 5 SLM AERA 7800
N2B 10 SLM AERA 7800
N20 20 SLM AERA 7800
NH3 10 SLM AERA 7800
O2 20 SLM AERA 7800
C2F6 5 SLM AERA 7800
Module A :
Gas filters
Gas box
HF and LF RF Generators
RF Matching network
Lower spindle assy
Ferrofluidic spindle Assy
Bottom and top plates
10Torr and 1000Torr manometer
Heated type HVA gate and MKS throttle valves
Throttle valve controller
Upgrade MC1 (P166 64M) module controller
Ceramic type spindle fork assy
O-Rings
Metal parts in chamber
Watlow temp controller
Window shappire
Heater ISO box
TC gauge
MFC's
Heater block (OPM)
Shower head
RF and heater feedthru
2000-2001 vintage.
NOVELLUS CONCEPT 2 Dual Sequel是由等离子体化学气相沉积(CVD)系统的领先供应商NOVELLUS Systems, Inc.设计制造的反应堆。该反应堆用于制造亚微米和超微米尺寸的半导体器件,非常适合大批量生产这些部件。该反应堆包括独特的双室设计,利用两个独立的腔室将材料沉积到基板上。Dual Sequel反应堆利用高达10 Torr的腔室压力进行沉积过程,范围从很低到很高的薄膜厚度。它还包括一个用于不断监测沉积过程的探测器单元。为了保持整个晶片的热均匀性,反应堆包括晶片冷却功能,旨在减少因壁温度变化而产生的有害影响。此外,此功能还有助于消除过程中的杂质。Dual Sequel反应堆配有独特的互锁设备,通过共享真空线将工艺室相互连接。这种互锁确保两个会议厅协同工作,从而提供可靠和一致的性能。互锁还有助于调节整个系统的压力,使腔室压力保持在预期范围内。其他特点包括高效气体输送装置,有助于尽量减少加工气体的使用。机器还以特殊的"半开"模式运行,可以通过同时执行一系列过程来加快进程。此外,Dual Sequel也因为像紧急泵工具和安全联锁一样具有先进的安全特性而提供了更高的安全级别。总体而言,CONCEPT 2 Dual Sequel反应堆是一种先进、高通量、可靠的CVD工具,非常适合大批量生产小型半导体元件。其独特的双室设计提供了更高水平的沉积和温度控制,而它的互锁资产允许一个更加统一和高效的过程。它还拥有一系列旨在提高安全性、最大限度地减少工艺气体和提高吞吐量的功能。
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