二手 NOVELLUS CONCEPT 2 Dual Sequel #9092631 待售

ID: 9092631
晶圆大小: 6"
CVD system, 6" Software: C2.SEQ_4.92B15 Operating system: QNX4 SECS GEM: Yes Free cable length: 75 Ft RF Cable length: 84 Ft Indexer firmware: 2.0_G Transfer robot: Brooks Mag 7 Chamber location: Left Chamber model: C2-CVDD-S SEQX EPD: Verity dual wavelength Shower head: Al 6061 8" 16-033931-00  Handling wafer size: 6" Heater block: No slot Sequel STN 1 pin 19-00154-04 Spindle speed: Standard Fork assembly: Ceramic anti-deflect 15-101482-00 15-101482-01 15-00700-00 Fork type: Min Contact 15-053394-02 Spindle feed through: Ferro fluidic Primary process gauge: 10T Gate & throttle valve: Heated / Internal 02-260348-00 16210-0403QS-002HJR MFC Type: Brooks GF100 IOC Software version: 4.2 RF Switching option: Yes RPC (Remote plasma clean): No    HF RF Generator: AE Apex 5513 LF RF Generator: AE PDX 1400 RF Match AE mercury: 3013 Foreline heated: No 2.0  MFC C Open MFC B N2 (10000 sccm) MFC A N2O (20000 sccm) MFC 9 NF3 (5000 sccm) MFC 8 O2 (20000 sccm) MFC 7 Open MFC 6 NH3 (10000 sccm) MFC 5 Open MFC 4 Open MFC 3 Open MFC 2 N2 (5000 sccm) MFC 1 SiH4 (1000 sccm) Chamber location: Rear Chamber model: C2-CVDD-S SEQX EPD: Verity dual wavelength Shower head: Al 6061 8" 16-033931-00  Handling wafer size: 6" Heater block: No slot Sequel STN 1 pin 19-00154-04 Spindle speed: Standard Fork assembly: Ceramic anti-deflect 15-101482-00 15-101482-01 15-00700-00 Fork type: Min Contact 15-053394-02 Spindle feed through: Ferro fluidic Primary process gauge: 10T Gate & throttle valve: Heated / Internal 02-260348-00 16210-0403QS-002HJR MFC Type: Brooks GF100 IOC Software version: 4.2 RF Switching option: Yes RPC (Remote plasma clean): No    HF RF Generator: AE Apex 5513 LF RF Generator: AE PDX 1400 RF Match AE mercury: 3013 Foreline heated: No 2.0 MFC C Open MFC B N2 (10000 sccm) MFC A N2O (20000 sccm) MFC 9 NF3 (5000 sccm) MFC 8 O2 (20000 sccm) MFC 7 Open MFC 6 NH3 (10000 sccm) MFC 5 Open MFC 4 Open MFC 3 Open MFC 2 N2 (5000 sccm) MFC 1 SiH4 (1000 sccm) System main power: 3ϕ 5Wires 208V System UPS power: 3ϕ 3Wires 120V SMIF Interface: No Aligner option: No Loadlock dry pump model: No Slit valve insert: No Slit valve type: SMC L-Motion TM Dry pump model: No TM Throttle valve: MKS 253B TM BARATRON model: MKS Front monitor: 12" LCD Chase monitor : LCD Loadlock BARATRON model: No Indexer robot type: Indexer II IOC Version: 4.1 TM Robot type: Mag 7 TM Robot blade: Ceramic Software revision: 4.80 B22 Signal tower: Yes Module controller: MC1 Host interface: SECS Module A: Express Process A: SiH4 Base Module B: Express Process B: SiH4 Base System and DLCM: MC1 (P166 64M) System DLCM Module controller MSSD (2 Sequel configuration) power rack Upgrade 4 cool station SiH4 Base oxide process Signal cables RF Coaxial cables MKS 253B throttle valve 651D Throttle valve controller MAG 7 Transfer robot Dual arm Indexer robot Animatics controller Standard shuttle assy Chase PC and table Generator rack Process module: Chamber type: Shrink Chamber process: SiH4 base Process clean type: In Situ Endpoint option: No Module controller: MC1 Heater block type: Standard Module dry pump: No Manometer 1(10T): MKS 627A11TBC Throttle valve: MKS 253B-15665 Spindle topplate type: Standard IOC2 option: Ver 4.1 Manometer 2(100T): MKS 627A13TBC HF Generator: RFG5500 LF Generator: PDX1400 RF Match: AE Mercury 3013 TEOS Delivery cabinet: No IOC Version: 4.1 Foreline gate heat option: Yes Foreline gate valve type: HVA Chamber gas box: Gas name MFC Size MFC Model SiH4 1 SLM AERA 7800 N2A 5 SLM AERA 7800 N2B 10 SLM AERA 7800 N20 20 SLM AERA 7800 NH3 10 SLM AERA 7800 O2 20 SLM AERA 7800 C2F6 5 SLM AERA 7800 Module A : Gas filters Gas box HF and LF RF Generators RF Matching network Lower spindle assy Ferrofluidic spindle Assy Bottom and top plates 10Torr and 1000Torr manometer Heated type HVA gate and MKS throttle valves Throttle valve controller Upgrade MC1 (P166 64M) module controller Ceramic type spindle fork assy O-Rings Metal parts in chamber Watlow temp controller Window shappire Heater ISO box TC gauge MFC's Heater block (OPM) Shower head RF and heater feedthru 2000-2001 vintage.
NOVELLUS CONCEPT 2 Dual Sequel是由等离子体化学气相沉积(CVD)系统的领先供应商NOVELLUS Systems, Inc.设计制造的反应堆。该反应堆用于制造亚微米和超微米尺寸的半导体器件,非常适合大批量生产这些部件。该反应堆包括独特的双室设计,利用两个独立的腔室将材料沉积到基板上。Dual Sequel反应堆利用高达10 Torr的腔室压力进行沉积过程,范围从很低到很高的薄膜厚度。它还包括一个用于不断监测沉积过程的探测器单元。为了保持整个晶片的热均匀性,反应堆包括晶片冷却功能,旨在减少因壁温度变化而产生的有害影响。此外,此功能还有助于消除过程中的杂质。Dual Sequel反应堆配有独特的互锁设备,通过共享真空线将工艺室相互连接。这种互锁确保两个会议厅协同工作,从而提供可靠和一致的性能。互锁还有助于调节整个系统的压力,使腔室压力保持在预期范围内。其他特点包括高效气体输送装置,有助于尽量减少加工气体的使用。机器还以特殊的"半开"模式运行,可以通过同时执行一系列过程来加快进程。此外,Dual Sequel也因为像紧急泵工具和安全联锁一样具有先进的安全特性而提供了更高的安全级别。总体而言,CONCEPT 2 Dual Sequel反应堆是一种先进、高通量、可靠的CVD工具,非常适合大批量生产小型半导体元件。其独特的双室设计提供了更高水平的沉积和温度控制,而它的互锁资产允许一个更加统一和高效的过程。它还拥有一系列旨在提高安全性、最大限度地减少工艺气体和提高吞吐量的功能。
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