二手 VEECO / EMCORE K465i #9012796 待售
看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。
单击可缩放
已售出
ID: 9012796
优质的: 2010
MOCVD system
GaN
Max temp 1250C degree set point
8 PSU
DRT (bow, real temp) (2) Real temp
8 x MO lines
NH3, SiH4
(2) MO concentration control
(2) Ebara process pump
Automated loading chamber
Nexus control system
H2 + NH3 gas monitor
N2+NH3 POU purifiers
(2) Johson Matthey V-480 H2 Pd cell purifiers
(2) hygrometers
(6) water cooled MO baths
Fully automated metal-organic chemical vapor deposition (MOCVD) system designed for the production of high-brightness light-emitting diodes
Can accommodate up to (45) 2" substrates (or 1x8") in one process
Uses FlowFlange technology designed to create a uniform alkyl and hydride flow across all wafers
Temperature uniformity by (3) separate heating zones controlled by RealTemp200 systems and additional pyrometer
Wafer curvature is monitored by dedicated deflectometer
Fully robotized carrier handling tool allows for continuous operation
All manuals and schematics for reactor from original Veeco purchase
(3) brand-new wafer carriers/susceptors
K465i growth chamber and Uniform Flow Flange assembly
Rotary Robot Arm Transfer assembly (robot, end effector, robot chamber, buffer chamber, gate valves, controller, etc.)
Laminar flowhood wafer loading platform
Complete gas panel (NH3/N2/H2, MO source lines, SiH4 source line), injector block
Ferrofludic turbodisc rotation assembly
Turbodisc controller
(2 sets) Veeco K465 heater assembly and filaments (1 installed in chamber, 1 full set as a spare)
(2) Ebara ESA-25D process pumps
Load lock pump
(2) high-capacity particle filter assemblies.
(2) particle filter elements
Reactor pressure throttle valve
(8) DC power supplies for filaments
Eurotherm controllers
Reactor control CPU, Servo CPU, (2) PC monitors, keyboard and mouse
(2) RealTemp 200 Modeling System with dedicated CPU
(1) DRT-210 Real-Time Monitoring System with spare CPU
(4) Lauda Model 215 bubbler baths
(2) Lauda Model 235 bubbler baths
(2) Lytron Heat Exchangers for reactor
Growth chamber baratron gauge
(2) – Piezocons
Flow Flange Lift Cart
H2 Pd purifier cabinet model: HP 200/400 V-Purge
NH3 Purifier - Aeronex 10M
N2 Purifier - Aeronex 10M
Hygrometer Assy 2-channel Panametrics
CM4 Gas monitor
Spare Baratron (pressure manometer) and MFC
(3) spare Eurotherm controllers
(2 cases, 1 partial) MassVac filter elements
2010 vintage.
VEECO/EMCORE K465i中电流电子束(EB)晶圆技术反应器是一种用于制造薄膜的半导体和显示工业的最先进的设备。它采用了溷合光刻、电子束(EB)光刻技术和蒸发技术。该反应堆设有电子源、束能量供应、蒸发源和无掩蔽光刻级。VEECO K465i设计用于处理高达600 mA的高电流过程。这项高端技术使工程师能够在一个生产步骤中实现多个基板上的阵列设计和薄膜增长的均匀性。它还能处理多种材料,如电子沉积材料、金属和多晶膜。EMCORE K465i配备了直流(DC)过滤技术,可防止电弧产生,从而提高了过程的一致性。K465i中的电子源是基于枪的电子发射器,由可编程的恒压电源供电。这样可确保功率一致且无输出波纹。VEECO/EMCORE K465i EB晶片技术反应器还提供真空密封结构,包括防止内部部件受到污染的门。此外,反应堆还配备了自动装卸系统,并配有预先装有晶片的托盘,以便高效运行。VEECO K465i EB晶片技术反应器还有一个内置的温度控制单元,确保过程温度均匀。这样可以防止处理结果的任何退化以及热失控的发生。它还提供了一个可靠的控制器机器和直观的用户界面,允许快速和容易调整参数。总之,EMCORE K465i中电流电子束(EB)晶圆技术反应器是制造薄膜的先进可靠工具。它提供了先进的过滤技术、高度可靠的电子源和温度控制资产,使其成为生产薄膜电路等材料的理想介质电流晶圆技术反应器。
还没有评论