二手 VEECO / EMCORE K465i #9012796 待售

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製造商
VEECO / EMCORE
模型
K465i
ID: 9012796
优质的: 2010
MOCVD system GaN Max temp 1250C degree set point 8 PSU DRT (bow, real temp) (2) Real temp 8 x MO lines NH3, SiH4 (2) MO concentration control (2) Ebara process pump Automated loading chamber Nexus control system H2 + NH3 gas monitor N2+NH3 POU purifiers (2) Johson Matthey V-480 H2 Pd cell purifiers (2) hygrometers (6) water cooled MO baths Fully automated metal-organic chemical vapor deposition (MOCVD) system designed for the production of high-brightness light-emitting diodes Can accommodate up to (45) 2" substrates (or 1x8") in one process Uses FlowFlange technology designed to create a uniform alkyl and hydride flow across all wafers Temperature uniformity by (3) separate heating zones controlled by RealTemp200 systems and additional pyrometer Wafer curvature is monitored by dedicated deflectometer Fully robotized carrier handling tool allows for continuous operation All manuals and schematics for reactor from original Veeco purchase (3) brand-new wafer carriers/susceptors K465i growth chamber and Uniform Flow Flange assembly Rotary Robot Arm Transfer assembly (robot, end effector, robot chamber, buffer chamber, gate valves, controller, etc.) Laminar flowhood wafer loading platform Complete gas panel (NH3/N2/H2, MO source lines, SiH4 source line), injector block Ferrofludic turbodisc rotation assembly Turbodisc controller (2 sets) Veeco K465 heater assembly and filaments (1 installed in chamber, 1 full set as a spare) (2) Ebara ESA-25D process pumps Load lock pump (2) high-capacity particle filter assemblies. (2) particle filter elements Reactor pressure throttle valve (8) DC power supplies for filaments Eurotherm controllers Reactor control CPU, Servo CPU, (2) PC monitors, keyboard and mouse (2) RealTemp 200 Modeling System with dedicated CPU (1) DRT-210 Real-Time Monitoring System with spare CPU (4) Lauda Model 215 bubbler baths (2) Lauda Model 235 bubbler baths (2) Lytron Heat Exchangers for reactor Growth chamber baratron gauge (2) – Piezocons Flow Flange Lift Cart H2 Pd purifier cabinet model: HP 200/400 V-Purge NH3 Purifier - Aeronex 10M N2 Purifier - Aeronex 10M Hygrometer Assy 2-channel Panametrics CM4 Gas monitor Spare Baratron (pressure manometer) and MFC (3) spare Eurotherm controllers (2 cases, 1 partial) MassVac filter elements 2010 vintage.
VEECO/EMCORE K465i中电流电子束(EB)晶圆技术反应器是一种用于制造薄膜的半导体和显示工业的最先进的设备。它采用了溷合光刻、电子束(EB)光刻技术和蒸发技术。该反应堆设有电子源、束能量供应、蒸发源和无掩蔽光刻级。VEECO K465i设计用于处理高达600 mA的高电流过程。这项高端技术使工程师能够在一个生产步骤中实现多个基板上的阵列设计和薄膜增长的均匀性。它还能处理多种材料,如电子沉积材料、金属和多晶膜。EMCORE K465i配备了直流(DC)过滤技术,可防止电弧产生,从而提高了过程的一致性。K465i中的电子源是基于枪的电子发射器,由可编程的恒压电源供电。这样可确保功率一致且无输出波纹。VEECO/EMCORE K465i EB晶片技术反应器还提供真空密封结构,包括防止内部部件受到污染的门。此外,反应堆还配备了自动装卸系统,并配有预先装有晶片的托盘,以便高效运行。VEECO K465i EB晶片技术反应器还有一个内置的温度控制单元,确保过程温度均匀。这样可以防止处理结果的任何退化以及热失控的发生。它还提供了一个可靠的控制器机器和直观的用户界面,允许快速和容易调整参数。总之,EMCORE K465i中电流电子束(EB)晶圆技术反应器是制造薄膜的先进可靠工具。它提供了先进的过滤技术、高度可靠的电子源和温度控制资产,使其成为生产薄膜电路等材料的理想介质电流晶圆技术反应器。
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