二手 AMAT / APPLIED MATERIALS Endura 5500 #9257162 待售

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ID: 9257162
Sputtering system, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Orienter degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orienter controller PCB Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit COH TI Adapter plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump, 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1, 2, 3, 4, C: Gas panel assy MFC: STEC 4400 MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: CTI-CRYOGENICS 9600 Cryo compressor (2) Cryo controllers: 3 Phase NESLAB III Chiller Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI MUX Cryo temp / AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauges PCB (4) Invertron gauges PCB OMS PCB Hard Disk Drive (HDD) Floppy Disk Drive (FDD) (4) HTR Lift drivers, 2-Phase (6) Robot drives, 5-Phase RF Rack: RF / DC Rack (5) ISO Amp (4) DC / RF Generator interlocks PCB DC Power supply ADVANCED ENERGY MDX-L12 DC Generator CPS 1001 RF Generator RFPPLF10A RF Generator Missing parts: Metal blades Laser tubes Heater type: Clamp Cryo pump, 3 Phase Turbo controller RF / DC Rack ADVANCED ENERGY MDX-L Series DC Generator RF Generator, 13.56 MHz / 400 kHz Power supply: AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种用于湿蚀刻的基于半导体的高密度等离子体反应器。该反应器的设计是为了在先进集成电路的生产和工程中提供卓越的均匀性。它提供了广泛的等离子体资源选项,以及最先进的过程控制和监控功能。AKT Endura 5500操作系统旨在减少工艺偏差,同时提高性能和产量。AMAT ENDURA 5500被设计为具有氮化氙(GaN)蚀刻工艺。它具有二极管泵浦脉冲等离子体源模块、过程控制模块和蚀刻模块。脉冲等离子体源是一种高压高效装置,能够对等离子体参数进行精细控制,提高蚀刻性能。工艺控制模块为各种生产要求提供了灵活性。它能够控制多种气体管线和输送阀,以及方便地实时切换多个蚀刻参数,如气压、压板电压、蚀刻时间、压板电压偏置、腔室温度等。蚀刻模块的设计具有灵活性、蚀刻过程的加速度和蚀刻图桉的均匀性。它具有可复制的印版设计,以减少潜在的工艺偏差,同时还支持针对特殊蚀刻工艺的特定印版设计。AKT ENDURA 5500是一种高度可靠的反应堆,维护要求低。它能够实现低缺陷率,同时保持高产品产量。该反应堆设计易于使用,具有直观的用户界面,以及简单、分步的工艺支持。它为工艺工程师和生产人员提供了有关工艺结果的宝贵反馈,从而加快了周期时间并提高了产量。该反应堆还设计用于生产和工程过程参数的长期稳定性和可重复性。总体而言,AMAT Endura 5500是一种用于湿蚀刻的高度先进、可靠、易于使用的高密度等离子体反应器。它旨在提供改进的过程控制、统一的蚀刻模式和提高的产品产量。它可实现更轻松、更快和可重复的过程,同时还为工程师和生产人员提供有关过程结果的宝贵反馈。
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