二手 AMAT / APPLIED MATERIALS NAR 1800 Twin #9243193 待售
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ID: 9243193
Vertical inline sputtering system
Substrate carrier:
Substrate dimensions: 730 x 920 mm
Carrier dimensions:
Approximate 1840 mm length
Approximate 2527 mm height
Carrier loading capacity: (4) Substrates
Carrier material: Ti / Al
Glass breakage rate within vacuum area:
Glass thickness:
< 0.5 mm: 0.3%
≥ 0.5 mm: 0.1%
Vacuum measuring equipment:
Pirani vacuum meter:
Range: 10³ hPa to 1x10^-3 hPa
Ionization gauge:
Range: 10^-2 hPa to 1x10^-9 hPa
Capacitance vacuum meter sensor head:
Range: 10^-2 hPa to 10^-4 hPa
Pumps:
SHIMADZU TPH1503 Turbo-molecular pump
Rough vacuum pump SP630 plus WSU-2001
Sputter cathodes:
Type: Rotary cathode & water cooled
Material of backing tube: Stainless steel
Magnetic field: Static magnet array
Target: sprayed onto backing tube
Target length: 2150 mm
Planar cathode:
Type: DC Magnetron
Material of backing plate: Titanium with water cooling channels
ITO / MO BP
Al (2) BP
Magnetic field: Move mag
Target fixing: Bonding
Target length: 2100 mm
(2) 300 x 265 x 9 mm³ (Two end pcs)
1500 x 265 x 7 mm³ (Middle part segmented in pcs)
Heater system:
Heating chamber equipped with resistance heater which emits IR radiation
Mode of operation: PID Regulation
Heater set point capability: 650°C
Shielding:
Shielding material: Stainless steel
High sticking coefficient to prevent particle generation
Machine control system:
Programmable logic controller with decentralized IO’s
Digital & analog controls:
Pumps
Valves
Power supplies
Interlocks for water and compressed air
Error messages
Operating system: Windows
Cooling water:
Pressure: 5/7 Bar absolute
Maximum back pressure: Open drain
Water inlet temperature range: 18-25°C
Temperature level within: ± 2°C (for TMP’s only)
Hardness of water: 6-8°dH (Equivalent 107-143 ppm CaCO3)
Electric conductivity: 100 - 200 μS/cm
pH-Value: 8 - 10
Foreign particles size: Maximum 100 μm
Foreign particles concentration: Maximum 10/cm³
Dissolved Cl: Maximum 20 mg/l
Dissolved CO2: Maximum 15 mg/l
Compressed air:
Pressure: 6/8 Bar absolute
Sputter gases:
Argon
Oxygen
Nitrogen
Argon / Oxygen
Purity of sputter gas: 99.999 %
Venting gas: Nitrogen or dry compressed air
Dew point: ≤ -30°C
Pressure maximum: 1.5 Bar absolute
Ambient requirements:
Temperature at machine & machine control room: 20-30°C
Relative humidity: ≤ 60 %
Machine SiO2 / ITO Track consumption values:
Power: 760 kVA / 1000 A
Machine metal track consumption values:
Power: 1000 kVA / 1500 A
Electric power: 400 V ±10 %, 50/60 Hz, 3 Phase, 5 wires (3 AC, N, PE).
AMAT/APPLIED MATERIALS NAR 1800 Twin是一种溅射设备,设计用于将材料薄膜涂覆或沉积到基板上。它是一个两室系统,意味着它有两个独立的真空室,可用于在一个操作周期内溅射不同的材料。设备是为无人值守操作而设置的,允许用户设置参数并让机器无人值守,直到所需的薄膜沉积完毕。它以高真空、直流电、平面磁控管溅射技术为基础,可配合双阴极运行。这样可以在整个基板上实现高沉积速率和优异的均匀性。该工具还可以与负载锁对接,以自动处理基板。资产能够沉积铝、不锈钢、钛、铜、钨、铬等材料。它还能够在一个操作周期内沉积多层,从而形成多层薄膜,还能在曲面上产生凹凸结构。在操作规格上,该车型的真空室容积为4升,底压为2x10-7 torr,阴极配置为两个单面平面磁控管,功率高达每磁控管2000瓦。该设备还可以容纳直径不超过200毫米的基板,基板加热范围从室温到600C不等。AMAT NAR 1800 Twin是一种安全可靠的溅射系统,具有优异的性能和均匀性。
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