二手 AMAT / APPLIED MATERIALS NAR 1800 Twin #9243193 待售

ID: 9243193
Vertical inline sputtering system Substrate carrier: Substrate dimensions: 730 x 920 mm Carrier dimensions: Approximate 1840 mm length Approximate 2527 mm height Carrier loading capacity: (4) Substrates Carrier material: Ti / Al Glass breakage rate within vacuum area: Glass thickness: < 0.5 mm: 0.3% ≥ 0.5 mm: 0.1% Vacuum measuring equipment: Pirani vacuum meter: Range: 10³ hPa to 1x10^-3 hPa Ionization gauge: Range: 10^-2 hPa to 1x10^-9 hPa Capacitance vacuum meter sensor head: Range: 10^-2 hPa to 10^-4 hPa Pumps: SHIMADZU TPH1503 Turbo-molecular pump Rough vacuum pump SP630 plus WSU-2001 Sputter cathodes: Type: Rotary cathode & water cooled Material of backing tube: Stainless steel Magnetic field: Static magnet array Target: sprayed onto backing tube Target length: 2150 mm Planar cathode: Type: DC Magnetron Material of backing plate: Titanium with water cooling channels ITO / MO BP Al (2) BP Magnetic field: Move mag Target fixing: Bonding Target length: 2100 mm (2) 300 x 265 x 9 mm³ (Two end pcs) 1500 x 265 x 7 mm³ (Middle part segmented in pcs) Heater system: Heating chamber equipped with resistance heater which emits IR radiation Mode of operation: PID Regulation Heater set point capability: 650°C Shielding: Shielding material: Stainless steel High sticking coefficient to prevent particle generation Machine control system: Programmable logic controller with decentralized IO’s Digital & analog controls: Pumps Valves Power supplies Interlocks for water and compressed air Error messages Operating system: Windows Cooling water: Pressure: 5/7 Bar absolute Maximum back pressure: Open drain Water inlet temperature range: 18-25°C Temperature level within: ± 2°C (for TMP’s only) Hardness of water: 6-8°dH (Equivalent 107-143 ppm CaCO3) Electric conductivity: 100 - 200 μS/cm pH-Value: 8 - 10 Foreign particles size: Maximum 100 μm Foreign particles concentration: Maximum 10/cm³ Dissolved Cl: Maximum 20 mg/l Dissolved CO2: Maximum 15 mg/l Compressed air: Pressure: 6/8 Bar absolute Sputter gases: Argon Oxygen Nitrogen Argon / Oxygen Purity of sputter gas: 99.999 % Venting gas: Nitrogen or dry compressed air Dew point: ≤ -30°C Pressure maximum: 1.5 Bar absolute Ambient requirements: Temperature at machine & machine control room: 20-30°C Relative humidity: ≤ 60 % Machine SiO2 / ITO Track consumption values: Power: 760 kVA / 1000 A Machine metal track consumption values: Power: 1000 kVA / 1500 A Electric power: 400 V ±10 %, 50/60 Hz, 3 Phase, 5 wires (3 AC, N, PE).
AMAT/APPLIED MATERIALS NAR 1800 Twin是一种溅射设备,设计用于将材料薄膜涂覆或沉积到基板上。它是一个两室系统,意味着它有两个独立的真空室,可用于在一个操作周期内溅射不同的材料。设备是为无人值守操作而设置的,允许用户设置参数并让机器无人值守,直到所需的薄膜沉积完毕。它以高真空、直流电、平面磁控管溅射技术为基础,可配合双阴极运行。这样可以在整个基板上实现高沉积速率和优异的均匀性。该工具还可以与负载锁对接,以自动处理基板。资产能够沉积铝、不锈钢、钛、铜、钨、铬等材料。它还能够在一个操作周期内沉积多层,从而形成多层薄膜,还能在曲面上产生凹凸结构。在操作规格上,该车型的真空室容积为4升,底压为2x10-7 torr,阴极配置为两个单面平面磁控管,功率高达每磁控管2000瓦。该设备还可以容纳直径不超过200毫米的基板,基板加热范围从室温到600C不等。AMAT NAR 1800 Twin是一种安全可靠的溅射系统,具有优异的性能和均匀性。
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