二手 CPA / KURDEX 9900 #9116667 待售

製造商
CPA / KURDEX
模型
9900
ID: 9116667
Sputtering system Entry / Exit load lock: CPA Chamber CPA Load lock valve Load lock chamber, 13.125” Single pallet operation Substrate, 12” x 12” SST Pallet, 15.5”x14” GP-303 Ion gauge controller Pallet sensors Load / Unload station Process chamber: CTI CT-8 Cryo pump VAT Hivac valve MKS Throttling valve CTI 8500 Compressor GP-303 Ion gauge controller (2) Gas system with VCR gas lines (2) NUPRO Isolation valves (2) MKS MFCs for Ar, O2 Chain drive transport system (2) AE Pinnacle+, 10kw dc power supplies (1) CPA Process chamber: (2) CPA 4.75”x15” DC magnetron Assemblies: (2) Sets of target shielding Control system: Opto-22 PLC, monitor Manual & auto control modes Recipe control I/O Wiring Ul Approved power box with EMO CPA Optical pallet sensing system With controller & sensors Process parameter control ranges: Sputtering pressure: 5 - 30 Microns Conveyor speed: 0.1 - 80 cm.min. D.C Deposition power level: 100 - 9000 watts R.F Deposition power level: 50 - 3000 watts R.F Sputter clean power level: 15 - 1000 watts Substrate heating: Ambient to 350°C Uniformity performance: Etch: ±10% Deposition: R.F Magnetron ±10% D.C Magnetron ±5% Vacuum performance: Ultimate pressure 2 x 10(-7) in 16 hrs 5 x 10(-7) in 30 minutes Rate of rise: 1 x 10(-4) 6 minutes Vacuum tight: Less than 5 x 10(-10) standard atmosphere cc helium/second Utility requirements: 4-Wire delta or 5 wire wye Water temperature: 50 - 75°F (10-24°C) Air: 70 to 100 PSIG (6 to 8 ATU) filtered, 1 CFM Sputtering gas: Typically 5 PSIG (1.3 ATU) Argon Options: Sputter etch CPA Etch table assy AE Matching network RF Switching assy AE RF generator Sputter area mod, 24" RGA: LEYBOLD Transpector Installed with isolation valve Substrate heater: Process chamber Heater assy Contoller Wiring Power: 208 V, 50/60 Hz, 3 Phase, 100 A.
CPA/KURDEX 9900是为可靠的高性能真空沉积过程而设计的溅射沉积设备。该系统能够提供高质量、均匀的薄膜材料,并在众多行业中得到应用。CPA 9900为工作室提供了多个选项。它具有适合于溅射沉积和气相沉积过程的双腔室。其中一个腔室可配置冷冻泵,用于高真空或超高真空环境。KURDEX 9900溅射单元包括四柱式磁控管。此配置允许用户快速为其应用程序选择最合适的源配置。此外,这台机器还提供了基板旋转台的变频控制,以及对多种溅射配方进行编程的设施。9900工具采用磁场辅助溅射,以确保与时间无关的沉积速率。结果是一种更均匀、更清洁、更厚的薄膜,可以满足苛刻的应用。该资产还可以容纳多目标溅射配置,允许用户在一次运行中存入不同的成分。该型号还配备了带背衬泵的涡轮泵,具有卓越的真空性能。涡轮泵可以与腔室分开安装,让腔室无忧维护。此外,CPA/KURDEX 9900还有一个燃气箱,装有受管制的高纯度气体。这种气箱允许用户控制气体,如氙气、氮气、氧气和氢气。除了CPA 9900提供的众多功能和选项外,设备人性化,操作方便学习。该系统还带有一个直观的图形用户界面(GUI),它简化了操作,使编程溅射作业更加容易。KURDEX 9900是那些需要可靠和用户友好的溅射装置的人的绝佳选择。这台机器具有多种配置选项、易于操作、强大的性能和出色的性能,适合广泛的溅射应用。
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