二手 CPA / KURDEX 9900 #9116667 待售
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ID: 9116667
Sputtering system
Entry / Exit load lock:
CPA Chamber
CPA Load lock valve
Load lock chamber, 13.125”
Single pallet operation
Substrate, 12” x 12”
SST Pallet, 15.5”x14”
GP-303 Ion gauge controller
Pallet sensors
Load / Unload station
Process chamber:
CTI CT-8 Cryo pump
VAT Hivac valve
MKS Throttling valve
CTI 8500 Compressor
GP-303 Ion gauge controller
(2) Gas system with VCR gas lines
(2) NUPRO Isolation valves
(2) MKS MFCs for Ar, O2
Chain drive transport system
(2) AE Pinnacle+, 10kw dc power supplies
(1) CPA Process chamber:
(2) CPA 4.75”x15” DC magnetron
Assemblies:
(2) Sets of target shielding
Control system:
Opto-22 PLC, monitor
Manual & auto control modes
Recipe control
I/O Wiring
Ul Approved power box with EMO
CPA Optical pallet sensing system
With controller & sensors
Process parameter control ranges:
Sputtering pressure: 5 - 30 Microns
Conveyor speed: 0.1 - 80 cm.min.
D.C Deposition power level: 100 - 9000 watts
R.F Deposition power level: 50 - 3000 watts
R.F Sputter clean power level: 15 - 1000 watts
Substrate heating: Ambient to 350°C
Uniformity performance:
Etch: ±10%
Deposition:
R.F Magnetron ±10%
D.C Magnetron ±5%
Vacuum performance:
Ultimate pressure
2 x 10(-7) in 16 hrs
5 x 10(-7) in 30 minutes
Rate of rise: 1 x 10(-4) 6 minutes
Vacuum tight: Less than 5 x 10(-10) standard atmosphere cc helium/second
Utility requirements:
4-Wire delta or 5 wire wye
Water temperature: 50 - 75°F (10-24°C)
Air: 70 to 100 PSIG (6 to 8 ATU) filtered, 1 CFM
Sputtering gas: Typically 5 PSIG (1.3 ATU) Argon
Options:
Sputter etch
CPA Etch table assy
AE Matching network
RF Switching assy
AE RF generator
Sputter area mod, 24"
RGA:
LEYBOLD Transpector
Installed with isolation valve
Substrate heater:
Process chamber
Heater assy
Contoller
Wiring
Power: 208 V, 50/60 Hz, 3 Phase, 100 A.
CPA/KURDEX 9900是为可靠的高性能真空沉积过程而设计的溅射沉积设备。该系统能够提供高质量、均匀的薄膜材料,并在众多行业中得到应用。CPA 9900为工作室提供了多个选项。它具有适合于溅射沉积和气相沉积过程的双腔室。其中一个腔室可配置冷冻泵,用于高真空或超高真空环境。KURDEX 9900溅射单元包括四柱式磁控管。此配置允许用户快速为其应用程序选择最合适的源配置。此外,这台机器还提供了基板旋转台的变频控制,以及对多种溅射配方进行编程的设施。9900工具采用磁场辅助溅射,以确保与时间无关的沉积速率。结果是一种更均匀、更清洁、更厚的薄膜,可以满足苛刻的应用。该资产还可以容纳多目标溅射配置,允许用户在一次运行中存入不同的成分。该型号还配备了带背衬泵的涡轮泵,具有卓越的真空性能。涡轮泵可以与腔室分开安装,让腔室无忧维护。此外,CPA/KURDEX 9900还有一个燃气箱,装有受管制的高纯度气体。这种气箱允许用户控制气体,如氙气、氮气、氧气和氢气。除了CPA 9900提供的众多功能和选项外,设备人性化,操作方便学习。该系统还带有一个直观的图形用户界面(GUI),它简化了操作,使编程溅射作业更加容易。KURDEX 9900是那些需要可靠和用户友好的溅射装置的人的绝佳选择。这台机器具有多种配置选项、易于操作、强大的性能和出色的性能,适合广泛的溅射应用。
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