二手 KURT J. LESKER PVD 75 #9241893 待售
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ID: 9241893
Thin film sputtering system
PVD Process chamber:
D-Shaped 304 SS, 24" high x 14" wide
Volume: 75 liters
Large access & replaceable view port
O-Ring sealed
Front access door
Flexible process ports
304L Stainless steel with 6061 aluminium hinged door
Vacuum pumping:
CTI-8F 1500 Cryopump
Compressor
3-Position pneumatic isolation gate valve
Touchscreen controller / PC Control
Oil-sealed mechanical rough pump: 5.7 CFM
Fore line valve
Dry roughing pump
Fore line trap
Mist eliminator
Roughing valve
Vacuum gauging:
Wide range vacuum gauge (Ion gauge & Pirani)
Mounting / Connection hardware
Adapters
Cabinet & framework:
Closed system support frame
Power distribution
Leveling pads
Cabinet construction carbon steel
Gray powder coat finish
Water manifold includes:
System components: Water distribution
Critical components: Interlocked flow switches
Shut off valves
NPT Connection, 1"
TEK-TEMP Recirculating water chiller, 6 gpm, 10000 Btu, 60 PSI
Sputtering source:
(3) MAGNETRON Sputtering source flange assemblies
(4) MAGNETRON Sputter cathodes
O-Ring sealed compression fittings: Source-to-substrate distance
Pneumatic driven deposition source shutter
Power supply:
KJLC 600 W RF Power supply with automatic matching network & control panel
(2) ADVANCED ENERGY DC Power supplies, 1.5 kW
Rack mount kits & connection cables
Top mounted custom substrate:
Single substrate, 12"
20 rpm
Stainless steel substrate holder:
Diameter: ¼"
High substrates: ¼"
Substrate heating & control:
Temperature: 350°C
Quartz Lamp / Resistive element
Process gas inlet / Upstream pressure control:
(2) MKS 1179 Flow controllers
MKS Baratron 626A Pressure transducer, 100 mTorr
Vent & purge pressure regulators
Film thickness monitor and optional control:
Quartz Crystal thickness monitor with single crystal head
Manual system control:
Touch screen controller: Button pump down & vent
Valves & shutter assemblies
Manual front panel control of power supplies
Switches
Full automatic process control
Graphical User Interface (GUI):
Vacuum screen display: Valve position & pump status
Vacuum status
Deposition screen:
Indicate shutter position
Deposition source status
Source material & target life log
Gas screen:
Mass flow controller modes
Indicate gas valve status
Display of pressure control settings & values
Motion screen display & input:
Speed & velocity profiles
PID Control parameters
Cooling screen: Water flow switch interlock status
Heating screen: Heater set points & control parameters
Turbo pump pressure (CDE): 5 x 10^-7 Torr
Power distribution:
Single service drop: 208 VAC, 30 A, 1 Phase
Component wiring: Centralized power distribution panel
EMO Protection
Safety interlocks
Power supply: 208 VAC, 3 Phase, 60 A.
KJL KURT J. LESKER PVD 75是物理气相沉积（PVD）产物家族中的溅射设备。PVD 75提供多种沉积、蚀刻和氧化应用。它设计用于处理直径不超过12英寸的大型基板。溅射系统的模块化设计使其能够轻松、经济高效地适应应用。KURT J. LESKER PVD 75具有七度统一倾斜角,为高性能应用提供了灵活性。KJL的Esactron等离子体清洗技术的使用确保了晶圆和基板的精确处理，从而产生高产率。该装置的自动化过程控制机器可实现快速和可重复的生产过程。PVD 75还包括用于均匀性控制的高精度热成像工具。热成像资产能够对沉积过程进行表征和优化。该模型还提供了一个可选的可变压力特征，可以更好地控制沉积过程。KURT J. LESKER PVD 75具有坚固的真空室、真空泵和排气设备，均针对过程重复性进行了优化。真空室采用钛铝陶瓷复合结构，最大程度地提高了性能和可靠性。该系统还包括一个真空气体排气适配器，允许手动排气的腔室。PVD 75专为在1,000类洁净室环境中运行而设计。该单元包括一系列用户友好的功能，包括触摸屏操作员界面、直观的用户菜单和流程配方选择。该机还兼容了一系列TCP/IP联网协议，允许多个KURT J. LESKER PVD 75单元的远程操作。总体而言，KJL PVD 75是一种先进的溅射工具，旨在满足最苛刻的沉积和蚀刻应用的需求。资产的模块化设计提供了灵活性和成本效益,而其自动化的过程控制模型则确保了精确和可重复的生产过程。该设备还提供坚固的真空室、泵和排气系统，以及一系列用户友好的功能，便于操作和控制。
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