二手 LEYBOLD HERAEUS Z550MS #31347 待售

Sputtering system Load lock system Mechanical component: Frame with liner Vacuum chamber with sight glass Chamber lid with bores for mounting cathodes High vacuum valve NW 150 with throttle position Electrical component: Rack cabinet, 19" Switchboard including fuses and connections Pumping system with turbo molecular pump and vacuum gauge control Vacuum gauge controller IM 110 D Ionization vacuum gauge D40B Rotary vane pump: (2) Stages Pumping speed 40 m³/h Flow control: (2) Gases complete with sensor Control valve Control rack Digital indication Backing plate Substrate load lock: Load lock including high vacuum valve Electro pneumatically operated Load lock Pumping system Vacuum gauge controller DC Sputtering equipment: DC Power supply type: SSV 3.5 Power: 3.5 kW Maximum voltage: 600 V Cathode selector switch (4) High rate cathodes PK 150: Complete with magnets and insulators without target material Substrate carrier: Made of Aluminium, insulated for RF bias and RF etching Infrared heating station Shutter Special aperture diaphragms Sputtering timer (4) Targets: 1st Target: Pt 2nd Target: Pd 3rd target: NiCr RF Equipment: RF Generator: RF Sputtering / RF Etching IS 2.5 Process switch RF Etching and RF Bias in process module Control system upgraded Manuals 1987 vintage.