二手 MRC / TEL / TOKYO ELECTRON Eclipse Mark IV #9288402 待售
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ID: 9288402
晶圆大小: 4"-6"
PVD System, 4"-6"
Controller upgraded
Power supply: 10 kW
(3) PVD chambers
(1) Etch chamber
Ultra high vacuum system
Atmospheric wafer handler
Electronics and control system
Wafer standard: SEMI
Wafer handling: Standard wafer handling of fragile wafers
Chamber 1:
ICP
Power supply: RF Generator
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Backplane: Non-contact single zone
Chamber 2:
Titanium Nitride (Ti/TiN)
Process kit type: TiN (RMX-10)
Target type: Solder Bnd
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 3
T/S Spacing, 2.5"
Ar Entry: Door injection
Regas type: N2/1000 sccm
Shield type: (2) Shields
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 3:
Aluminium (AlCu)
Process kit type: Al (SPA-10)
Target type: Single piece
Cathode type: SPA-10
Power supply: 20 kW
Tap setting: 2
T/S Spacing, 2.0"
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 4:
Molybdenum (Mo)
Process kit type: Mo (RMX-10)
Target type: Solder bond
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 2
T/S Spacing, 2.5"
Ar Entry: Door injection
Shield type: (2) Shield s
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Standard chamber configuration:
8F Cryo pump
MKS Mass flow controllers
RGA Valve set: V4 Conflat
(3) Position gate valves
Non-contact backplane heaters
Frontplane: S/F Vent
Pod shields
Mainframe options:
Wafer holders with ceramic latches
Edge exclusion: 1.5 mm
Laminar blowers
Filters
SECS/GEM Communication
Wafer mapping control
Clamp rings:
Full face
Stainless steel
Facilities options:
Line frequency: 208 V
Line voltage: 60 Hz
Power rack cable length: 30 ft
Cryo compressor lines: 30 ft
Bottom feed utility lines
Other options:
Manuals
OEM Controller
Alignment tools
System shields: ICP, Ti, AICu, Mo
(5) Clamp ring wafer holder assemblies
Bell jar assemble.
MRC/TEL/TOKYO ELECTRON Eclipse Mark IV是一种用于材料科学的全自动溅射设备。设计用于薄膜沉积、表面改性和纳米结构制造等原位应用。该系统配备了先进的溅射枪，可以精确控制薄膜的沉积速率、轮廓和厚度。它还能够有多个加工截面，允许不同材料在基板的不同区域平行沉积。MRC Eclipse Mark IV利用大功率RF/DC电源，频率范围为0至13.56 MHz。该装置的可用功率范围为1至1,500 W。多个溅射区允许沉积在基板的不同部分，每个区域的通量不同。溅射枪利用圆柱形磁控管源，并配有防撞罩，防止离子在源周围堆积。负载锁定单元用于基板传输，可快速处理大型基板。该机采用精密可编程逻辑控制器（PLC）进行编程，以控制溅射枪的运动和操作。PLC可以编程为优化过程控制，为用户提供了一个快速获取所需薄膜特性的高效平台。此外，该工具还具有一个带粗加工的真空室和一个涡轮分子泵，可实现超高真空和易于操作。TEL Eclipse Mark IV也拥有先进的硬件和先进的监控系统。这些系统能够实时监测沉积过程的压力、温度和功率。这允许精确控制沉积参数，以提供可重复的过程和可靠的薄膜。该资产还具有触摸屏用户界面,可直观操作和控制模型。总体而言，Eclipse Mark IV是一种最先进的溅射设备，专为各种薄膜沉积应用而设计。它拥有高度精确的运动控制系统、先进的监控系统和人性化的界面，非常适合薄膜材料的研发。
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