二手 PERKIN ELMER 4450 #9199550 待售

製造商
PERKIN ELMER
模型
4450
ID: 9199550
晶圆大小: 8"
Sputtering system, 8" Wafer loading: Manual with load lock Cathode: (3) Delta shapes (4) Circle shapes Sputter method: RF/DC Diode / MAGNETRON Process chamber: 8" Diameter x 12" High stainless steel cylinder with 6" CF Flange view port and load lock port 28" Diameter stainless steel base plate 11/2" Air operated roughing isolation valve Air operated gas inlet valve Air operated vent valve 11/2" Blanked-off leak check port Removable deposition shields 23" Diameter, 3-position water cooled annular substrate Table with variable speed motorized table drive Full circle shutter and vane shutter Chain drive pallet carrier transport Heavy duty electric hoist Load lock: 30" x 28" x 8" Stainless steel load lock chamber Aluminum cover Chain drive pallet carrier transport 2" Air operated roughing isolation valve Air operated vent valve 23" Diameter molybdenum annular substrate pallet Elevator for pallet up and down function Vacuum systems for process chamber: (2) Stage cryo pumps With 1000 l/s pumping speed for air Includes: Chevron Water cooled compressor and lines Automatic regeneration controller Plumbing kit, 71/2" Aluminum air operated gate valve: 6" ASA Air operated venetian blind throttling valve Mechanical pump or dry pump for process: 36.7 Cfm Chamber and load lock Gas line with MFC N2 O2 SCCM Customized System PC control Options: Gas lines with MFC N2 O2 Customized Lamp tower alarm with buzzer: Mechanical pump / Dry pump for process chamber and load lock Independent mechanical pump / Dry pump for process chamber Chiller for cooling plates and table Turbo pump for load lock Load lock lamp heating function: Up to 200°C Chamber lamp heating function: Up to 300°C Plasma etch function Bias function Co sputter function Reactive sputter function Materials: AI+W InSnO AI2O3 Ag_ Au C Cr Cr/Co Cr/Au Cr+Cu Cr/Si Cr/SiO Cr/Si02 Si02 Mo MoSi2 Mo2Si5 Mc>5Si3 Ni Ni/Cr Ni+Ni/Cr Ni/Fe Pt Ti02 SiC Ti/W Si02+02 Si+N2(Si3N4) Si+N2+B4C Ta TaC Ta+Au TaSi2 Ta+Si02 Zr Ti02+Cr Ti+Au Ti+Au+Ni Ni/Fe+Cu+Si02 Ti/W+Au Ti/W+Au+Ta Ti/W+AI/Si Ti/W+Ni/Cr+Au Ti/W+Pt Al+Ti/W+Ag W+AI2O3 Zn Zri02 Basic configuration Main frame 28" Diameter SST chamber top plate with ports and cathodes: Configuration 4400 4410 / 4450 Cathode shape Circle Delta Cathode size 8" Delta Cathode quantity 1 to 4 1 to 3 Sputter power supply: 4400 4410 / 4450 DC Power 5 kW 5 kW / 10 kW RF Power 1kW / 2kW 2 KW / 3 kW Pulse DC Power 5 kW 5 KW / 10 kW Power distribution box: AC380 V / 208 V / 3 Phase.
PERKIN ELMER 4450是一种高性能溅射设备,设计用于将薄层材料沉积到各种基板上。它利用磁控管或离子轰击沉积技术,制造出金属薄膜、氧化物和其他各种材料的超光滑层。该系统包括两个3英寸直流溅射电极和一个非常适合低温溅射操作的大型真空室。4450的高性能磁控管溅射工艺采用高效和高度可靠的冷却装置,以确保最大性能和运行寿命。通过在高压条件下使用氙气或氮气,机器能够以最佳的沉积速率创造出优越的薄膜性能。该工具还配备了先进的珠子清洗技术,以提高资产部件的使用寿命。该模型需要最少的维护,并提供卓越的真空泵.其低工作温度有助于最小化基板加热,提高覆盖层质量。该设备还包括一个高精度电容厚度监测仪和一个脉冲调节监测仪,以确保优秀的层沉积。这款显示器还允许不同的溅射电流,为用户提供对涂层工艺的理想水平的控制。系统易于使用的界面使用户能够在不同的溅射参数和目标材料之间快速、轻松地进行更改。其低噪声操作使得长时间使用安全可靠。它设计小巧轻巧,便于存储和运输到不同的工作站。PERKIN ELMER 4450是实验室和工业溅射工艺的理想选择。其先进的特性和易于使用的界面,使其成为那些寻求优越层沉积和优越性能的人的理想选择。其先进的冷却系统和低电流仪器使其在低温溅射操作中具有很高的可靠性和效率。
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