二手 PERKIN ELMER 4450 #9199550 待售
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ID: 9199550
晶圆大小: 8"
Sputtering system, 8"
Wafer loading: Manual with load lock
Cathode:
(3) Delta shapes
(4) Circle shapes
Sputter method:
RF/DC
Diode / MAGNETRON
Process chamber:
8" Diameter x 12" High stainless steel cylinder with 6"
CF Flange view port and load lock port
28" Diameter stainless steel base plate
11/2" Air operated roughing isolation valve
Air operated gas inlet valve
Air operated vent valve
11/2" Blanked-off leak check port
Removable deposition shields
23" Diameter, 3-position water cooled annular substrate
Table with variable speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
Load lock:
30" x 28" x 8" Stainless steel load lock chamber
Aluminum cover
Chain drive pallet carrier transport
2" Air operated roughing isolation valve
Air operated vent valve
23" Diameter molybdenum annular substrate pallet
Elevator for pallet up and down function
Vacuum systems for process chamber:
(2) Stage cryo pumps
With 1000 l/s pumping speed for air
Includes:
Chevron
Water cooled compressor and lines
Automatic regeneration controller
Plumbing kit, 71/2"
Aluminum air operated gate valve: 6" ASA
Air operated venetian blind throttling valve
Mechanical pump or dry pump for process: 36.7 Cfm
Chamber and load lock
Gas line with MFC
N2
O2
SCCM
Customized
System PC control
Options:
Gas lines with MFC
N2
O2
Customized
Lamp tower alarm with buzzer:
Mechanical pump / Dry pump for process chamber and load lock
Independent mechanical pump / Dry pump for process chamber
Chiller for cooling plates and table
Turbo pump for load lock
Load lock lamp heating function: Up to 200°C
Chamber lamp heating function: Up to 300°C
Plasma etch function
Bias function
Co sputter function
Reactive sputter function
Materials:
AI+W
InSnO
AI2O3
Ag_
Au
C
Cr
Cr/Co
Cr/Au
Cr+Cu
Cr/Si
Cr/SiO
Cr/Si02
Si02
Mo
MoSi2
Mo2Si5
Mc>5Si3
Ni
Ni/Cr
Ni+Ni/Cr
Ni/Fe
Pt
Ti02
SiC
Ti/W
Si02+02
Si+N2(Si3N4)
Si+N2+B4C
Ta
TaC
Ta+Au
TaSi2
Ta+Si02
Zr
Ti02+Cr
Ti+Au
Ti+Au+Ni
Ni/Fe+Cu+Si02
Ti/W+Au
Ti/W+Au+Ta
Ti/W+AI/Si
Ti/W+Ni/Cr+Au
Ti/W+Pt
Al+Ti/W+Ag
W+AI2O3
Zn
Zri02
Basic configuration
Main frame
28" Diameter SST chamber top plate with ports and cathodes:
Configuration 4400 4410 / 4450
Cathode shape Circle Delta
Cathode size 8" Delta
Cathode quantity 1 to 4 1 to 3
Sputter power supply:
4400 4410 / 4450
DC Power 5 kW 5 kW / 10 kW
RF Power 1kW / 2kW 2 KW / 3 kW
Pulse DC Power 5 kW 5 KW / 10 kW
Power distribution box: AC380 V / 208 V / 3 Phase.
PERKIN ELMER 4450是一种高性能溅射设备,设计用于将薄层材料沉积到各种基板上。它利用磁控管或离子轰击沉积技术,制造出金属薄膜、氧化物和其他各种材料的超光滑层。该系统包括两个3英寸直流溅射电极和一个非常适合低温溅射操作的大型真空室。4450的高性能磁控管溅射工艺采用高效和高度可靠的冷却装置,以确保最大性能和运行寿命。通过在高压条件下使用氙气或氮气,机器能够以最佳的沉积速率创造出优越的薄膜性能。该工具还配备了先进的珠子清洗技术,以提高资产部件的使用寿命。该模型需要最少的维护,并提供卓越的真空泵.其低工作温度有助于最小化基板加热,提高覆盖层质量。该设备还包括一个高精度电容厚度监测仪和一个脉冲调节监测仪,以确保优秀的层沉积。这款显示器还允许不同的溅射电流,为用户提供对涂层工艺的理想水平的控制。系统易于使用的界面使用户能够在不同的溅射参数和目标材料之间快速、轻松地进行更改。其低噪声操作使得长时间使用安全可靠。它设计小巧轻巧,便于存储和运输到不同的工作站。PERKIN ELMER 4450是实验室和工业溅射工艺的理想选择。其先进的特性和易于使用的界面,使其成为那些寻求优越层沉积和优越性能的人的理想选择。其先进的冷却系统和低电流仪器使其在低温溅射操作中具有很高的可靠性和效率。
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