二手 AMAT / APPLIED MATERIALS Mirra Ontrak #114141 待售

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AMAT / APPLIED MATERIALS Mirra Ontrak
已售出
ID: 114141
晶圆大小: 8"
优质的: 1999
CMP system, 8" flat Components: Main polisher module: Mirra 3400 Post cleaner module: Ontrack Base box: cassette tub and box Polisher cable cover CMP 5201 controller Operator desk: (2) Monitors: FR 770, TW-LM-004 (2) Extensions MPB700 (2) Multi power Loader (2) Cable boxes Controller monitor desk Specifications: Wafer size: 8" Wafer shape: flat Application: Oxide System: dry in / dry out Process type: all Device type: D-RAM Device geometry: 0.09 microns Consumed process material: Polish slurry: STI Buff slurry: none Platen 1 pad: IC1010 Platen 2 pad: IC1010 Platen 3 pad: IC1010 Pad conditioner: snap on type Pad conditioner head: modified DDF3 head Pad conditioner holder: magnetic snap on / SAESOL Factory interface options: Cleaner type: Ontrack Megasonics: no Robot type: Ontrack side type In situ removal rate monitor: digital Inline metrology: none SECS / GEM interface: yes, high-speed massage storage available Cassette tank: yes Cassette type: none Installation type: through-the-wall Integrated system basic FABS: FABS 212 Platen and head options: Polishing head: (4) Titan I heads Retaining rings: 4 Pad wafer loss sensor: yes Platen temperature control: none Slurry delivery options: Slurry delivery: (3) slurries Slurry flow rate: standard flow Slurry flow monitor: yes Slurry containment bulkhead: single containment Slurry facilities: none Slurry loop line: no Slurry dispense arm: extended rinse arm Slurry leak detector: no DI water: yes High pressure rinse: yes System software: Mirra type: Mirra Ontrack Mirra software: N/A Cleaner type: Ontrack Cleaner software: N/A Fabs type: standard Fabs software: N/A System safety equipment: Red turn-to-release EMO button: standard EMO guard ring: yes Earthquake brackets: none LO to disconnect polisher: N/A Smoke detector: yes Electrical requirements: Line frequency: 50/60Hz Line voltage: 200~230V UPS battery: yes Delta connection: yes Power lamp: green Power connected lamp: no Circuit breaker: 230A AC outlet box: 100V Configurable I/O: no Wide type GFI: 50mA Umbilicals: Polisher to controller cable: 75' Controller to monitor cable: 75' Slurry system interface cable: none Factory hookup: Upper exhaust: standard Lower exhaust: none Upper exhaust connection: 8" Drain manifold: 4-line to facilities Drain adapter: NPT fitting Castors for Mirra system: no Weight distribution plate (skid pad): yes User interface: Gray area: (1) monitor Cleanroom: (1) monitor Class 1 cart for 1 monitor: 1 Class 1 cart for 2 monitors: 0 Class 100 cart for 2 monitors: 0 Stainless carts: 1 PC mouse Printer: none Hard disk backup: no Polisher / Fabs light tower: Polisher tower mounting type: (4) lights Polisher tower number of colors: (4) colors Polisher tower colors sequence: RYGB Cleaner options: OnTrak cleaner: N/A DNS cleaner: N/A Mesa cleaner: yes Manuals: CD ROM: none Standard paper manuals: none Cleanroom paper manuals: none Maintenance options: Spray gun: single Side panel window: none Pad conditioner cover: none Titan head rebuild kit: none Consumables kit: none Calibration box: none Calibration box cable: none English standard unit tool kit: none Slurry flow calibration kit: none Lapping stone: no Robot door lock: N/A Special options: Nylon brush: no EChain Teflon sheet: no Low pressure release water: no Spares: Additional heads: 4 Warehoused 1999 vintage.
AMAT/APPLIED MATERIALS Mirra Ontrak是一种晶圆研磨、研磨和抛光设备,经过技术改造,可实现半导体制造过程的自动化。它为半导体工业生产硅晶片提供高精度、微精度的研磨和抛光,提供晶片变薄、边缘剖面、缺陷去除和表面整理。这台机器旨在实现经济高效和一致的精密操作。它具有全自动操作,设计速度极快、高效且准确。它具有高分辨率、反馈控制的研磨系统,允许用户精确调节进料速率和速度。磨削单元具有灵活的设定点,使用户能够设置广泛的磨削参数,如表面粗糙度、磨削深度和精加工质量。该机器还有一个自动晶圆清洗工具,提供多种清洗选项和基于变分器的研磨和蚀刻资产。此模型可实现高效和经济高效的生产,提供一致的质量和可重复性。AMAT Mirra Ontrak还配备了多项高级功能和配件,如数字压力控制器和触摸仪用户界面。压力控制器的工作原理是确保研磨力保持在允许精确、安全和有效的研磨操作的范围内。触摸图用户界面旨在提供易于理解的研磨和抛光过程概述,为用户从头到尾提供整个过程的全面视图。该设备还得到AMAT全球服务和支持网络的支持,提供必要的支持,以保持生产过程的平稳和高效运行。此外,该系统提供了广泛的定制选项,允许用户根据自己的具体需求和要求对设备进行定制。总体而言,APPLIED MATERIALS Mirra Ontrak为生产半导体晶片提供高效、经济高效的研磨和抛光服务。凭借其自动化的操作和先进的功能,这台机器旨在为用户提供可重复的结果和一致的质量。
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