二手 AMAT / APPLIED MATERIALS Mirra Ontrak #114141 待售
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ID: 114141
晶圆大小: 8"
优质的: 1999
CMP system, 8" flat
Components:
Main polisher module: Mirra 3400
Post cleaner module: Ontrack
Base box: cassette tub and box
Polisher cable cover
CMP 5201 controller
Operator desk:
(2) Monitors: FR 770, TW-LM-004
(2) Extensions
MPB700
(2) Multi power
Loader
(2) Cable boxes
Controller monitor desk
Specifications:
Wafer size: 8"
Wafer shape: flat
Application: Oxide
System: dry in / dry out
Process type: all
Device type: D-RAM
Device geometry: 0.09 microns
Consumed process material:
Polish slurry: STI
Buff slurry: none
Platen 1 pad: IC1010
Platen 2 pad: IC1010
Platen 3 pad: IC1010
Pad conditioner: snap on type
Pad conditioner head: modified DDF3 head
Pad conditioner holder: magnetic snap on / SAESOL
Factory interface options:
Cleaner type: Ontrack
Megasonics: no
Robot type: Ontrack side type
In situ removal rate monitor: digital
Inline metrology: none
SECS / GEM interface: yes, high-speed massage storage available
Cassette tank: yes
Cassette type: none
Installation type: through-the-wall
Integrated system basic FABS: FABS 212
Platen and head options:
Polishing head: (4) Titan I heads
Retaining rings: 4
Pad wafer loss sensor: yes
Platen temperature control: none
Slurry delivery options:
Slurry delivery: (3) slurries
Slurry flow rate: standard flow
Slurry flow monitor: yes
Slurry containment bulkhead: single containment
Slurry facilities: none
Slurry loop line: no
Slurry dispense arm: extended rinse arm
Slurry leak detector: no
DI water: yes
High pressure rinse: yes
System software:
Mirra type: Mirra Ontrack
Mirra software: N/A
Cleaner type: Ontrack
Cleaner software: N/A
Fabs type: standard
Fabs software: N/A
System safety equipment:
Red turn-to-release EMO button: standard
EMO guard ring: yes
Earthquake brackets: none
LO to disconnect polisher: N/A
Smoke detector: yes
Electrical requirements:
Line frequency: 50/60Hz
Line voltage: 200~230V
UPS battery: yes
Delta connection: yes
Power lamp: green
Power connected lamp: no
Circuit breaker: 230A
AC outlet box: 100V
Configurable I/O: no
Wide type GFI: 50mA
Umbilicals:
Polisher to controller cable: 75'
Controller to monitor cable: 75'
Slurry system interface cable: none
Factory hookup:
Upper exhaust: standard
Lower exhaust: none
Upper exhaust connection: 8"
Drain manifold: 4-line to facilities
Drain adapter: NPT fitting
Castors for Mirra system: no
Weight distribution plate (skid pad): yes
User interface:
Gray area: (1) monitor
Cleanroom: (1) monitor
Class 1 cart for 1 monitor: 1
Class 1 cart for 2 monitors: 0
Class 100 cart for 2 monitors: 0
Stainless carts: 1
PC mouse
Printer: none
Hard disk backup: no
Polisher / Fabs light tower:
Polisher tower mounting type: (4) lights
Polisher tower number of colors: (4) colors
Polisher tower colors sequence: RYGB
Cleaner options:
OnTrak cleaner: N/A
DNS cleaner: N/A
Mesa cleaner: yes
Manuals:
CD ROM: none
Standard paper manuals: none
Cleanroom paper manuals: none
Maintenance options:
Spray gun: single
Side panel window: none
Pad conditioner cover: none
Titan head rebuild kit: none
Consumables kit: none
Calibration box: none
Calibration box cable: none
English standard unit tool kit: none
Slurry flow calibration kit: none
Lapping stone: no
Robot door lock: N/A
Special options:
Nylon brush: no
EChain Teflon sheet: no
Low pressure release water: no
Spares:
Additional heads: 4
Warehoused
1999 vintage.
AMAT/APPLIED MATERIALS Mirra Ontrak是一种晶圆研磨、研磨和抛光设备,经过技术改造,可实现半导体制造过程的自动化。它为半导体工业生产硅晶片提供高精度、微精度的研磨和抛光,提供晶片变薄、边缘剖面、缺陷去除和表面整理。这台机器旨在实现经济高效和一致的精密操作。它具有全自动操作,设计速度极快、高效且准确。它具有高分辨率、反馈控制的研磨系统,允许用户精确调节进料速率和速度。磨削单元具有灵活的设定点,使用户能够设置广泛的磨削参数,如表面粗糙度、磨削深度和精加工质量。该机器还有一个自动晶圆清洗工具,提供多种清洗选项和基于变分器的研磨和蚀刻资产。此模型可实现高效和经济高效的生产,提供一致的质量和可重复性。AMAT Mirra Ontrak还配备了多项高级功能和配件,如数字压力控制器和触摸仪用户界面。压力控制器的工作原理是确保研磨力保持在允许精确、安全和有效的研磨操作的范围内。触摸图用户界面旨在提供易于理解的研磨和抛光过程概述,为用户从头到尾提供整个过程的全面视图。该设备还得到AMAT全球服务和支持网络的支持,提供必要的支持,以保持生产过程的平稳和高效运行。此外,该系统提供了广泛的定制选项,允许用户根据自己的具体需求和要求对设备进行定制。总体而言,APPLIED MATERIALS Mirra Ontrak为生产半导体晶片提供高效、经济高效的研磨和抛光服务。凭借其自动化的操作和先进的功能,这台机器旨在为用户提供可重复的结果和一致的质量。
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