二手 DNS / DAINIPPON AS-2000 #293791064 待售

CMP System, 8" Double side wafer scrubbing: Pad type bush Wafer speed: 0~20 RPM Brush speed: 0~1,000 RPM Chemical pressure: 0~2 kg / cm² Process time: 60 WPH Dry time: <20 Sec Transfer time: <20 Sec / Chamber Interlock Leak sensor Loader: Front loading Wafer wetting bath Wafer wetting nozzle Roll brush clean module (DBC): Mechanical clean method Brush rotation direction : CW, CCW DiW and chemical flow meter SC-1 Applied chemical Chemical supply accuracy: ±5% ml Brush rotation speed accuracy: ± 2% RPM Wafer rotation speed accuracy: ± 2%RPM Brush rotation speed accuracy: ± 2%RPM Wafer rotation speed accuracy: ± 2%RPM Roll brush clean module (TBC): Mechanical Clean Method Wafer speed: 1500 RPM DiW and chemical flow meter DHF Applied chemical Chemical supply accuracy: ±5% ml Brush rotation speed accuracy: ± 2% RPM Wafer rotation speed accuracy: ± 2% RPM No mega sonic nozzle Dry task module (DTC): Wafer speed: 0~3000 RPM DiW Nozzle Wafer rotation speed: 2-Step speed Wafer rotation speed accuracy: ± 2% RPM N2 Temperature: 100°C Unloader: Front side unloading Wafer map scan Power supply: 208 V, 3.0 kVA, Single phase 1999 vintage.