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ID: 9049994
Stepper with DNS tracks Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01 Comment : Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.48 X-Tilt [%/field] : -1.08 Symmetrical error [%] : -0.14 Logfile : LI/LISU/waf.1225 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90 Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.21 If corrected with gradient filter : 0.48 If corrected for tilt and with gradientfilter : 0.07 ############################################################################ ############################################################################ Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02 Comment : Annular Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Annular Numerical Aperture : 0.57 Sigma Outer : 0.750 Inner : 0.450 Illumination mode name : annular Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.90 X-Tilt [%/field] : -1.75 Symmetrical error [%] : -0.37 Logfile : LI/LISU/waf.1224 Overall Average of Ratio : 1.00 Standard Deviation : 0.01 Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65 Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.42 If corrected with gradient filter : 0.81 If corrected for tilt and with gradientfilter : 0.08 ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38 Uniformity Measurement Comment : Image Field Size [mm] x : 26.0 y : 3.0 Diameter : 40.0 Steps x : 11 y : 3 Measurement Type : Pulse Mode Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Apply REMA Window : Yes Load Reticle : N Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Result Uniformity [%] : 0.61 Logfile : LI/LIUM/waf.1443 Tilt X [%/field] : -0.91 Y [%/field] : -0.03 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93 Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38 Estimated Uniformity from measured data [%] If corrected for actual tilts : 0.37 If corrected with gradient filter : 0.45 If corrected for tilts and with gradientfilter : 0.26 Total Nr of Laserpulses since Installation [* 10^6] : 12454.98 Symmetric Uniformity Value [%] : 0.12 ############################################################################ ############################################################################ Scanning Dose Accuracy & Repeatability Test Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19 Comment : Scanning : Y Scan Direction : Forwards Scan Type Settings : All scans SingleScan Die size [mm] X : 2.000 Y : 5.000 Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000 Rema Mode : Die Number of Repeats for each dose: : 100 Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Dose Control Mode : High Performance Dose Control Logfile : LI/LISA/waf.149 Result Table +----------+-----------------------------------------+-------+--------+--------+ | | Recorded Exposure Energy Dose | | | | | +----------+--------+----------+----------+ | | | | Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum | | [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] | +==========+==========+========+==========+==========+=======+========+========+ | 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 | | 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 | | 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 | | 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 | | 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 | | 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 | | 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 | | 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 | +----------+----------+--------+----------+----------+-------+--------+--------+ Max. Repeatability [%] : 0.24 Min. Repeatability [%] : 0.09 Max. Accuracy [%] : 2.07 Min. Accuracy [%] : 0.93 Max. Sum [%] : 2.31 Min. Sum [%] : 1.02 ############################################################################ ############################################################################ ============================================================================== Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27 Exposure conditions: Exposure date and time : Sun Aug 19 11:46:56 2012 Machine ID : XXXX Reticle ID : 45441782A019 Reticle Alignment : TTL Align Lens type : 79 Temperature [degC]: 22.00 Pressure [mbar]: 1023.25 Illumination Mode : Conventional Blade ID : Not Applicable Numerical Aperture : 0.57 Sigma Inner : Not Applicable Sigma Outer : 0.75 Lens ID : 0105624A Focus Step [um]: 0.12 Focus Offset [um]: -0.90 Number of wafers : 2 Comments: 'Exposure': MPM 'Modelling': Data File Name: XXXX_MPM8_081912 ============================================================================== Uncorrected values: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Focus range [nm] | 148 | 20 | | Raw astigmatism [nm] | 106 | 6 | +----------------------------------------------------------+ Correctables: +-------------------------------------------+ | Image offset [um] | 0.049 | | Image tilt in x (Ry) [urad] | 0.195 | | Element 1 height [um] | 0.722 | | | | | RS linear wedge [urad] | -0.546 | | RS quadratic wedge [nm/cm2] | -3.749 | +-------------------------------------------+ Result after corrections: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Image plane deviation [nm] | 151 | 16 | | Astigmatism [nm] | 106 | 7 | +----------------------------------------------------------+ determined on 91 field positions. ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42 Focus Reproducibility Measurements Position : Wafer Position X [mm] : 0.00 Y [mm] : 0.00 Number of measurements : 100 Output Data Type : Full Configuration Reference Branch : Y Fine p : Y q : Y Window Height [nm] Coarse : 250 Fine : 250 Tilt [urad] Rx : 100 Ry : 100 Absolute results +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 | | Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 | | Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 | | Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 | | Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 | +---------+------------+------------+------------+------------+ Relative results (to average) +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 | | Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 | | Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 | +---------+------------+------------+------------+------------+ Termination Status terminated : Normally error count : 0 Measured data (Absolute) +------------+------------+------------+------------+ | Z | Rx | Ry | TotZ | | [um] | [urad] | [urad] | [um] | +============+============+============+============+ | -9.7655 | -40.5165 | -36.9648 | -10.5074 | | -9.7800 | -39.5127 | -37.1097 | -10.5173 | | -9.7769 | -39.7916 | -38.9125 | -10.5394 | | -9.7790 | -40.3539 | -38.2437 | -10.5364 | | -9.7785 | -39.5528 | -38.7713 | -10.5377 | | -9.7649 | -40.4179 | -37.2816 | -10.5102 | | -9.7732 | -42.0147 | -36.8241 | -10.5229 | | -9.7821 | -39.0658 | -38.4235 | -10.5336 | | -9.7652 | -39.7742 | -37.5021 | -10.5093 | | -9.7684 | -39.3748 | -37.6588 | -10.5119 | | -9.7652 | -39.5564 | -36.9409 | -10.5006 | | -9.7634 | -40.8306 | -37.7038 | -10.5169 | | -9.7515 | -40.6355 | -37.3565 | -10.4992 | | -9.7603 | -40.2630 | -37.1124 | -10.5025 | | -9.7786 | -39.3249 | -37.7339 | -10.5227 | | -9.7643 | -40.6762 | -37.9644 | -10.5202 | | -9.7675 | -40.4179 | -37.3377 | -10.5136 | | -9.7776 | -38.8425 | -38.0860 | -10.5232 | | -9.7718 | -40.2938 | -37.3000 | -10.5166 | | -9.7681 | -40.0046 | -38.3063 | -10.5241 | | -9.7748 | -39.3195 | -36.3055 | -10.5004 | | -9.7667 | -40.5930 | -38.2534 | -10.5258 | | -9.7868 | -39.8798 | -38.2696 | -10.5415 | | -9.7745 | -39.9436 | -38.9972 | -10.5391 | | -9.7645 | -39.8327 | -39.0892 | -10.5296 | | -9.7701 | -40.2804 | -36.7024 | -10.5070 | | -9.7814 | -40.2261 | -37.8231 | -10.5325 | | -9.7794 | -39.8133 | -39.0155 | -10.5434 | | -9.7750 | -39.0829 | -39.1232 | -10.5357 | | -9.7797 | -40.6502 | -37.6666 | -10.5315 | | -9.7672 | -40.4168 | -36.7030 | -10.5050 | | -9.7761 | -39.1525 | -38.2369 | -10.5258 | | -9.7870 | -39.0503 | -38.4891 | -10.5392 | | -9.7577 | -41.1639 | -36.8837 | -10.5027 | | -9.7570 | -41.1076 | -38.2929 | -10.5199 | | -9.7714 | -40.7037 | -37.9743 | -10.5276 | | -9.7568 | -39.8498 | -38.0060 | -10.5080 | | -9.7710 | -39.3692 | -39.7966 | -10.5423 | | -9.7646 | -39.8609 | -37.4839 | -10.5090 | | -9.7721 | -39.6824 | -38.3422 | -10.5265 | | -9.7604 | -39.2479 | -37.4802 | -10.5008 | | -9.7536 | -39.2437 | -38.4132 | -10.5061 | | -9.7657 | -40.2048 | -37.6258 | -10.5141 | | -9.7762 | -39.6844 | -37.8291 | -10.5239 | | -9.7702 | -38.8947 | -37.6470 | -10.5105 | | -9.7612 | -40.1875 | -38.2415 | -10.5176 | | -9.7792 | -39.8850 | -37.5037 | -10.5240 | | -9.7729 | -39.1850 | -37.2381 | -10.5098 | | -9.7613 | -40.7197 | -37.9457 | -10.5173 | | -9.7705 | -39.9194 | -39.2022 | -10.5376 | | -9.7564 | -38.9419 | -39.4759 | -10.5207 | | -9.7694 | -39.1124 | -39.8978 | -10.5404 | | -9.7720 | -39.1279 | -38.2178 | -10.5212 | | -9.7916 | -39.8522 | -38.5405 | -10.5497 | | -9.7741 | -40.0793 | -38.6619 | -10.5352 | | -9.7691 | -39.9331 | -38.1660 | -10.5228 | | -9.7792 | -40.3889 | -38.7946 | -10.5440 | | -9.7717 | -39.1853 | -37.4060 | -10.5107 | | -9.7745 | -40.9147 | -38.2744 | -10.5360 | | -9.7732 | -39.6131 | -37.6885 | -10.5187 | | -9.7787 | -39.9724 | -37.8588 | -10.5287 | | -9.7762 | -40.0535 | -38.1205 | -10.5301 | | -9.7629 | -40.5288 | -36.8900 | -10.5039 | | -9.7702 | -39.5173 | -37.6971 | -10.5151 | | -9.7761 | -39.9947 | -38.1668 | -10.5303 | | -9.7680 | -38.8518 | -37.8147 | -10.5102 | | -9.7658 | -39.8365 | -37.7452 | -10.5134 | | -9.7689 | -40.1078 | -37.1308 | -10.5103 | | -9.7742 | -39.4813 | -38.4813 | -10.5291 | | -9.7727 | -39.9902 | -37.2798 | -10.5153 | | -9.7634 | -39.8633 | -37.0637 | -10.5023 | | -9.7711 | -38.2445 | -37.7369 | -10.5083 | | -9.7732 | -40.2596 | -37.2719 | -10.5174 | | -9.7761 | -40.3531 | -37.6834 | -10.5262 | | -9.7766 | -40.0425 | -38.9605 | -10.5413 | | -9.7674 | -39.8253 | -38.4360 | -10.5239 | | -9.7772 | -39.5769 | -38.3233 | -10.5307 | | -9.7698 | -38.7025 | -39.2795 | -10.5301 | | -9.7688 | -38.7997 | -38.1785 | -10.5153 | | -9.7768 | -39.4022 | -37.5756 | -10.5194 | | -9.7820 | -39.3415 | -38.4344 | -10.5354 | | -9.7578 | -39.4880 | -38.3495 | -10.5110 | | -9.7767 | -39.9885 | -38.1482 | -10.5306 | | -9.7615 | -39.7493 | -39.0979 | -10.5262 | | -9.7602 | -39.8560 | -38.0996 | -10.5126 | | -9.7674 | -39.6038 | -39.2936 | -10.5336 | | -9.7559 | -39.3433 | -38.7500 | -10.5134 | | -9.7652 | -40.7314 | -37.6660 | -10.5176 | | -9.7556 | -39.0180 | -38.6828 | -10.5101 | | -9.7736 | -38.5990 | -38.6164 | -10.5246 | | -9.7659 | -40.0684 | -37.5131 | -10.5120 | | -9.7717 | -40.3805 | -39.0647 | -10.5400 | | -9.7767 | -40.0894 | -39.2315 | -10.5453 | | -9.7738 | -39.3731 | -38.5647 | -10.5291 | | -9.7687 | -39.5713 | -38.4534 | -10.5238 | | -9.7522 | -38.9775 | -38.4677 | -10.5037 | | -9.7614 | -41.1591 | -37.7801 | -10.5180 | | -9.7636 | -41.2565 | -38.6489 | -10.5321 | | -9.7665 | -38.2850 | -37.7461 | -10.5041 | | -9.7770 | -39.8987 | -38.2130 | -10.5312 | +------------+------------+------------+------------+ ############################################################################ ############################################################################ Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19 System Qualification Exposure Layer : --- First --- Date/Time : Sun Aug 19 10:59:23 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : TTL Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1023.4 Wavelength [nm] : 248.281 Comments from: 'Exposure First Layer' : MPM 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYD_XXXX_MPM8_081912.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 49 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : First to Nominal Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_SU_DYNA_7X7 ============================================================================== Uncorrected values: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | max. image displacement x | 38.0 | 4.5 | | max. image displacement y | 37.5 | 7.4 | +----------------------------------+---------+---------+ Correctables: +------------------------------+----------+----------+ | | Mean |Std. Dev. | +==============================+==========+==========+ | RS height [um] | -0.072 | 1.431 | | RS tilt in x (Ry) [urad] | 216.176 | 32.303 | | Element 2 height [um] | 0.060 | 0.109 | | Translation in X [um] | 0.019 | 0.006 | | Translation in Y [um] | -0.004 | 0.005 | | Lens rotation [urad] | 0.157 | 0.116 | | Scan skew [urad] | 0.118 | 0.048 | | Scan scale [ppm] | 0.225 | 0.200 | +------------------------------+----------+----------+ Result after corrections: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | image distortion (NCE) x | 17.2 | 6.7 | | image distortion (NCE) y | 27.7 | 4.8 | +----------------------------------+---------+---------+ ############################################################################ ############################################################################ Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12 Wafer Stage Accuracy Exposure Layer : --- First --- Date/Time : Sat May 5 17:30:29 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : No Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1026.9 Wavelength [nm] : 248.278 Comments from: 'Exposure First Layer' : after hp laser replacement 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYW_SA_050512.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 20 Number of Marks per Field : 25 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -1 | -1 | | | St. Dev. | 2 | 2 | | | |Mean| + 3 Sigma | 7 | 7 | | | Maximum 99.7% | 7 | 7 | 8 | +------------------+---------+---------+---------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.001 | 0.001 | -1 | 1 | | Translation in Y [um] | -0.001 | 0.002 | -1 | 2 | | Rotation [urad] | -0.008 | 0.066 | -0 | 1 | | Magnification [ppm] | -0.029 | 0.086 | -1 | 2 | | 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 | | Trapezoid in X [um/cm2] | | | | | | Trapezoid in Y [um/cm2] | | | | | | 4th Ord. Trap. X [um/cm4] | | | | | | 4th Ord. Trap. Y [um/cm4] | | | | | | Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 | | Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 1 | | Residual Y [nm] | 1 | +--------------------+---------+ Wafer Stage Classification: +---------------------------+---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +===========================+=========+=========+=========+ | Stage Repeatability | 3 | 4 | | | Stage Accuracy | 7 | 7 | 8 | +---------------------------+---------+---------+---------+ ############################################################################ ############################################################################ Model - Metrology Calibration/Machine Matching/Intrafield Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012 Machine ID : XXXX : XXXX Reticle ID : 45441181A015 : 45441181A015 Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 79 : 79 Lens ID : 0105624A : 0105624A Energy [mJ/cm2] : 30.0 : 33.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.57 : 0.57 Sigma Inner : 0.00 : Sigma Outer : 0.75 : 0.75 Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 1014.1 : 1021.8 Wavelength [nm] : 248.288 : 248.282 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : WPM 'XY-Imaging Modelling' : Test Log Name : XYM_zmatchbcf09222012.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 16 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 0 | 0 | | | St. Dev. | 5 | 6 | | | |Mean| + 3 Sigma | 14 | 18 | | | Maximum 99.7% | 14 | 21 | 24 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+---------+---------+---------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+=========+=========+=========+===============+===============+ | 1 | 6 | 3 | 2 | 0.000 | -10.800 | | 2 | 5 | 4 | 2 | 10.800 | 0.000 | | 3 | 4 | 4 | 1 | 0.000 | -6.480 | | 4 | 4 | 2 | 2 | -10.800 | 0.000 | | 5 | 3 | 5 | 1 | -6.480 | 6.480 | | 6 | 3 | 6 | 1 | 10.800 | 10.800 | | 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500/500是用于半导体工业制造集成电路的晶圆步进器。它使用激光器以光刻方式定义基板上的特征。该设备高度精确,能够对宽度高达0.2微米的特征进行成像。它建立在刚性框架上,以确保最小的失真和振动,使其适合精确成像应用。该系统采用了F2激光源,其性能优于传统的氙离子激光源。它提供了一个均匀的光束,使成像更加精确。激光借助镜子和透镜的光路耦合到单元中,用光机快门控制晶圆的曝光。该机器采用了视频投影对准工具(VPAS),以提高光学对准的精度。此资产使用晶圆上网格模式的投影。对准传感器检测晶片的位置和倾斜度,以最大程度地减少误差。PAS 5500/500也使用两种类型的喷射器来精确定位晶圆和光学元件。机械喷射器用于较大的步骤,而压电喷射器用于较小的步骤。喷射器与电动旋转级相结合,可确保精确的旋转运动.ASML PAS 5500/500使用线性驱动器模型在XY方向上移动。它由位置编码器、电机和步进电机组成。该设备还具有几个光学元件,可协助成像过程。这些包括显微镜、反射镜、虹膜和冷凝器。该系统在成像过程中采用了定义明确的步进算法。这包括设置曝光时间、剂量和重复计数。重复计数确定阵列在晶圆上成像的次数。此功能与扫描结束识别单元一起,可实现精确的成像和优化的吞吐量。该机器与自动创建光掩码(APC)软件集成在一起,可帮助进行掩码生成过程。它包括掩码对齐、模具配准和OPC等功能。总体而言,PAS 5500/500是一种用于半导体制造的高度精确和自动化的晶圆步进工具。它利用F2激光源、用于光学对准的VPAS和APC软件等高级功能来实现卓越的成像性能。
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