二手 ASML XT 1950Hi #293752405 待售
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ID: 293752405
晶圆大小: 12"
优质的: 2010
Lithography system, 12"
(2) Load laser ports
Hard Disk Drive (HDD)
Immersion lithography with size:193 nm
Resolution capability: 38 nm
Overlay: 4 nm SMO / 7 nm MMO
Throughput: 148 WPH (12" wafer with 125 exposures at 30 mJ)
CYMER XLR-560i 193 nm 60 W/6 kHz Laser with E95 Bandwidth monitoring
Semi compliant MENV and FIMS Assembly
Controls: UNIX / SUN Architecture
AERIAL XP P-type Illumination system
Alignment: Blue align with narrow mark
Focus and Field-by-field levelling
Focus spot monitoring
Circuit Dependent Focus Edge Clearance (CD-FEC)
Dual E-chucks (Bonded SiC)
LS-MATCH2 (XT) Image streaming
Overhead reduction: 1 and 2
Productivity Enhancement Package (PEP)
In-situ metrology: Sensor module
ILIAS Lithoguide (SAMOS and PUPICOM)
UNICOM XT
Dose mapper ArF
(15) QUASAR XL Slots
Reticle shape correction
2DE Grid calibration
Twinscan Overlay package
Water cooling for electronics cabinet
IRL-XP Integrated reticle library for H-SPEC Systems
IRIS-XT Integrated reticle inspection system
Reticle streaming
Spotless G & H
Twinscan Grid mapper
TEAL PCDU-XT1900 Distribution unit
FSM flex package
Aux port 300 mm FOUP / 25 Wafers
XCDA Gas purification system
Purifier canister: Optics series, 10 MH, SS
Reticle with defect: 40 nm
SMASH XY
Power conditioner: 135 kVA
XCDA Gas purification system bypass manifold:
Manifold three valve: 10 m
Filter housing: Cabinet
ESI EX2600
Filter set
Standard and compliance:
CE Marked
S2 Compliant
Manual
Laser power: 60 W
Throughput: 148 WPH
ZEISS Starlight: 1950
2010 vintage.
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