二手 CANON FPA 2000 i1 #9134789 待售

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ID: 9134789
晶圆大小: 6"
Stepper, 6" Wafer type: semi flat Wafer chuck type: LC ring chuck Track interface: DNS Auto-feeder (in-line direction): Left, Type 2 Altitude: X m Signal tower: yes CE mark (Europe): yes Edge beam removal: no Reticle changer: Reticle size: 5", type 2 with 14 slots Reticle bar code reader: yes Library slot number: 14 Workstation: Workstation model: HP1000 Software: Main software version: V5.25B Gem software version: SECS Facility requirements: Main electrical supply: 3 Phase, 415 VAC Exhaust 1x Heat exhaust for chamber 2x Control rack (Setting 0.5 inc to 2 inc H2O) CDA Supply: 3X 100psi Cooling water supply: cooling Water in (pressure=1to5 kg/cm2) Vacuum: 3X vacuum setting ≤ 550 mm Hg Drain: 1X drain for chamber aircodition system Chamber: Chamber type: TBW-CD-50W Wafer feeding unit: Type of wafer feeding unit: Type II Wafer size: 6" Carriers: double carriers Flat/notch finder: flat Method: non-edge contact, back side holding XY stage: 6" sliding stage Tilt stage: yes Reticle changer system: Type II with 14 slots Size: 5" Reticle Reticle alignment system: TV image processing with FRA2 mark Alignment source: g-line HeCd laser: No Auto wafer alignment system: Auto alignment source: HeNe Laser (1 for X, 1 for Y) Method: through the len off axis auto alignment Mode: die and die and AGA Projection lens: Magnification: X 1/5 Numerical aperture: 0.55 Illumintor: Light source: 1 KW Hg Lamp Exposure time control: light integrator Masking function: variable with 4 independent masking blades Auto focus: Method: optical auto focus Other: auto compensation for barometric pressure change Mechanical prealignment: non-edge contact TV prealigment: TV image processing Monitor display: LCD.
CANON FPA 2000 i1是晶片步进器,一种光刻仪器,用于在半导体晶片边缘产生特定的图样。它能够以高精度和高精度生产各种尺寸的晶圆图样。CANON FPA2000-I1具有大、3至5 µm的场大小,能在高效、高速的操作中执行自动模式发生器对准和晶圆对准。FPA-2000I1中使用的光刻技术基于柔性轨道技术,这是一种独特的CANON特性,具有可变的柔性刚度,可以针对每个应用进行微调。这使它能够提供高精度的曝光控制以及快速、精确的对准和缝合,以适应要求最苛刻的半导体模式。CANON FPA 2000 I 1还配备了多曝光特性,使其实现了改进的模式均匀性。佳能FPA-2000I1拥有自动化曝光设备,包括照明、光学计量、边缘检测,以及全自动闭环曝光过程。它设计为连续运行,无需任何手动干预,并且可以在一次曝光的情况下实现关键模式控制。该系统配备了空气幕和精密的空气控制,减少污染,这对于实现清洁、高分辨率模式至关重要。FPA 2000 i1还提供了通用的阵列设计功能。该单元可以高精度地暴露二进制分辨率模式和密集线条,也可以用来形成圆形或蛇形模式。仪器还具有随着时间推移在单个晶片上整合多种模式的能力。FPA-2000 I 1包含多个内置安全功能。其机动化级被封闭和温度控制,以维持稳定的环境,而其机器人控制级控制位移和方向,以确保精确曝光。紧急停止按钮允许阻止未经授权的访问尝试。综上所述,CANON FPA-2000 I1是一种高精度晶圆步进器,具有先进的性能和可靠性。其柔性轨道技术和多曝光机使其成为任何晶片阵列应用的理想工具,其内置的安全措施确保操作安全。
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