二手 CANON FPA 2000 i1 #9134789 待售
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ID: 9134789
晶圆大小: 6"
Stepper, 6"
Wafer type: semi flat
Wafer chuck type: LC ring chuck
Track interface: DNS
Auto-feeder (in-line direction): Left, Type 2
Altitude: X m
Signal tower: yes
CE mark (Europe): yes
Edge beam removal: no
Reticle changer:
Reticle size: 5", type 2 with 14 slots
Reticle bar code reader: yes
Library slot number: 14
Workstation:
Workstation model: HP1000
Software:
Main software version: V5.25B
Gem software version: SECS
Facility requirements:
Main electrical supply: 3 Phase, 415 VAC
Exhaust
1x Heat exhaust for chamber
2x Control rack
(Setting 0.5 inc to 2 inc H2O)
CDA Supply: 3X 100psi
Cooling water supply: cooling Water in (pressure=1to5 kg/cm2)
Vacuum: 3X vacuum setting ≤ 550 mm Hg
Drain: 1X drain for chamber aircodition system
Chamber:
Chamber type: TBW-CD-50W
Wafer feeding unit:
Type of wafer feeding unit: Type II
Wafer size: 6"
Carriers: double carriers
Flat/notch finder: flat
Method: non-edge contact, back side holding
XY stage: 6" sliding stage
Tilt stage: yes
Reticle changer system: Type II with 14 slots
Size: 5" Reticle
Reticle alignment system: TV image processing with FRA2 mark
Alignment source: g-line
HeCd laser: No
Auto wafer alignment system:
Auto alignment source: HeNe Laser (1 for X, 1 for Y)
Method: through the len off axis auto alignment
Mode: die and die and AGA
Projection lens:
Magnification: X 1/5
Numerical aperture: 0.55
Illumintor:
Light source: 1 KW Hg Lamp
Exposure time control: light integrator
Masking function: variable with 4 independent masking blades
Auto focus:
Method: optical auto focus
Other: auto compensation for barometric pressure change
Mechanical prealignment: non-edge contact
TV prealigment: TV image processing
Monitor display: LCD.
CANON FPA 2000 i1是晶片步进器,一种光刻仪器,用于在半导体晶片边缘产生特定的图样。它能够以高精度和高精度生产各种尺寸的晶圆图样。CANON FPA2000-I1具有大、3至5 µm的场大小,能在高效、高速的操作中执行自动模式发生器对准和晶圆对准。FPA-2000I1中使用的光刻技术基于柔性轨道技术,这是一种独特的CANON特性,具有可变的柔性刚度,可以针对每个应用进行微调。这使它能够提供高精度的曝光控制以及快速、精确的对准和缝合,以适应要求最苛刻的半导体模式。CANON FPA 2000 I 1还配备了多曝光特性,使其实现了改进的模式均匀性。佳能FPA-2000I1拥有自动化曝光设备,包括照明、光学计量、边缘检测,以及全自动闭环曝光过程。它设计为连续运行,无需任何手动干预,并且可以在一次曝光的情况下实现关键模式控制。该系统配备了空气幕和精密的空气控制,减少污染,这对于实现清洁、高分辨率模式至关重要。FPA 2000 i1还提供了通用的阵列设计功能。该单元可以高精度地暴露二进制分辨率模式和密集线条,也可以用来形成圆形或蛇形模式。仪器还具有随着时间推移在单个晶片上整合多种模式的能力。FPA-2000 I 1包含多个内置安全功能。其机动化级被封闭和温度控制,以维持稳定的环境,而其机器人控制级控制位移和方向,以确保精确曝光。紧急停止按钮允许阻止未经授权的访问尝试。综上所述,CANON FPA-2000 I1是一种高精度晶圆步进器,具有先进的性能和可靠性。其柔性轨道技术和多曝光机使其成为任何晶片阵列应用的理想工具,其内置的安全措施确保操作安全。
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