二手 NIKON NSR 2205 i12C #293603489 待售
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ID: 293603489
i-Line stepper
Lens distortion: Standard measurement
Reticle blind setting accuracy
Focus calibration repeatability: 20 times measurement
Exposure power (N.A=0.57): Mercury lamp
Integrated exposure control accuracy (N.A=0.57): i-line IR-Radiance meter
Alignment accuracy FIA: FIA-EGA (Standard measurement)
Alignment accuracy LSA: LSA-EGA (Standard measurement)
Array orthogonality: Standard measurement
Stepping precision: Standard measurement
Wafer pre-alingnment repeatability: Single wafer, 20 times measurement
Illumination uniformity (N.A=0.57): 5 times measurement within the exposure area
Resolution, 0.4 µm:
L/S Conv NA: 0.57
CE V/H: 0.40
PR Film thickness: <1.0 µm
DOF: 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
CD Uniformity, 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
Coma, 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
Total Focus Deviation (TFD), 0.45 µm:
L/S Conv N.A: 0.57
Standard measurement
Astigmatism (AST):
Deviation L/S Conv
Standard measurement
Lens inclination, 0.50 µm:
L/S Conv N.A: 0.57
Standard measurement
Lens control accuracy (Initial):
Heating: 150 min
Cooling: 180 min
Operation test:
Wafer system
Reticle.
NIKON NSR 2205 i12C是用于精确高效制造半导体芯片的十二步晶圆步进器。它配备了内置的激光对准设备,允许以最少的时间和材料浪费进行高精度芯片制造。步进器特别适合生产需要高精度的芯片,例如用于光学或针脚栅格阵列设备的芯片。该设备具有高能效设计和高吞吐量能力,因此能够快速生产高质量的芯片。激光对准系统进一步加快了过程,无需手动调整晶圆对准。这样可以加快芯片生产速度,避免需要额外的处理步骤来确保高质量的最终产品。步进器具有先进的发光光学单元,分辨率为0.25微米,允许生产紧密的线状特征和生产具有阶梯状表面等先进三维特征的芯片。光机连接到先进的主计算机和精密电机驱动器,保证了高精度芯片的生产。步进进一步配备了先进的交联设计,即使在处理不同的抗性配方时也提供了前所未有的精度水平。通过允许步进器同时精确处理不同配方,生产时间最小化。总体而言,NIKON NSR-2205I12C是半导体生产的绝佳选择。即使在处理最苛刻的应用程序时,它也能提供极高的准确性,其节能设计可快速生产高质量的芯片。这种步进器是高端芯片生产的完美工具,导致更好的产量和更低的成本。
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