二手 DNS / DAINIPPON / SCREEN SU-3200 #293828146 待售
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ID: 293828146
晶圆大小: 3"
优质的: 2014
Wafer cleaning system, 3"
(8) Chambers
(4) Load port
Chemical: DHF, NH4OH ,H2O2 ,IPA ,03
Overhead Transport System (OHT)
SINFONIA TECHNOLOGY SELOP12F25-S7DB033F
Double robot arms
Process chamber unit:
Tower-1 : MPC-2,3
Tower-2 : MPC-4,5,6
Tower-3 : MPC-7,8,9
Chemical Cabinet:
SC-1
DHF
O3
CO2
CDA N2
DIW
PCW
FOUP Load port:
(4) Load port
FOUP Type: No N2 Purge
SINFONIA TECH NOLOGY
SELOP12F25-S7DB033F
30D65K-C212 Servo pack
Double robot arms
Material: Ceramic
KAWASAKI
3NT 420B-B029
NT4203452
XU-ACT153L-H01
YASUKAWA ELECTRIC CORP
30D65K-C212 Servo pack
Material: Ceramic
KAWASAKI
3SD940S-A006
SD9400150
E FLOW
e Flow SD90B-R11-F-VB
MPC chamber: 2, 3, 4, 5, 6, 7, 8, 9
Scan nozzle - 1:
Nozzle - 1: DHF (LFC), DIW(LFC)
Suck back drain
Nozzle - 2: O3 (MN), CO2W(MN)
Suck back drain
Nozzle - 3: IPA
Suck back drain
1 Upper nozzle N2 Purge
1 Lower nozzle N2 Purge
1 and 2 Nozzle rinse
Scan nozzle - 2:
Nozzle - 1: SC-1 (LFC), CO2W(MN)
Suck back drain
Nano spray 1: SC-1 (LFC), CO2W(MN)
Nano spray N2
Suck back drain
2 Upper nozzle N2 Purge
2 Lower nozzle N2 Purge
Back side nozzle:
Nozzle chemical dispense: DHF, SC-1, O3 ,CO2
Suck back Drain
Dispense
Fixed nozzle:
Nozzle rinse
Chuck pin rinse
Spin base rinse
Fixed cup
Exhaust duct rinse
Shutter N2 Blow
Chamber wall rinse
Shutter drive: Air cylinder
Chemical cabinet (SC-1):
Mixing tank capacity: 45 Liter
Material: PTFE Teflon
Circulation pump: Pillar / PE-20MA
Pump damper: Pillar / A20S013 / 14722-3
Temp controller: DNS Special
Heating exchange: DNS Special
Temp range: 20 ~ 80°C
(4) Flow meter
(2) Houshing filter
Chemical cabinet (DHF):
Mixing tank capacity: 45 Liter
Material: PTFE Teflon
Circulation pump: Pillar / PE-40MA
Pump damper: A40S018 / 14610-3
(2) Houshing filter
(4) Flow meter
Temp controller: KOMATSU
Heating exchange: KOMATSU
Temp range: 20 ~ 30°C
O3 Cabinet (LIQUOZON):
ASTeX GmbH PN: 14-0038-P00AA1007
DIO3 Outlet pressure: 14 - 36 psi (1.0 ~ 2.5 bar)
O2 Inlet pressure: 65 - 110 psi (4.5 ~ 7.6 bar)
CO2 Inlet pressure: 73 - 36 psi (5.0 ~ 7.6 bar)
UPW Inlet pressure: 48 - 73 psi (3.3 ~ 5.0 bar)
CDA Inlet pressure: 75 - 119 psi (5.2 ~ 8.2 bar)
Main cooling water pressure: 29 psi (2.0 bar)
Max cool water press: 73 psi (5.0 bar)
Missing parts:
Spin base: Material, Spin motor, Revolution, Acceleration, Revolution accuracy
Chuck: Chuck drive, Material, Wafer detection
Main H/D
Spin base (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
MPC board assy (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
MPC flow meter switch (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
CR ROBOT
INDEX ROBOT Servo drive
MPC - 2 (Chemical tray)
Power supply: Phase 3, 208V, 39kVA, 108A (Wire (S)+GND/PE, 50/60Hz
UPS Power supply: Phase 3, 208V, 20VA, 56A (Wire (S)+GND/PE, 50/60Hz
Power supply (4 - wire): 3/PE-200~230V ±10% 14A 50/60Hz
2014 vintage.
DNS/DAINIPPON/SCREEN SU-3200是半导体制造业在制造过程中用于清洁和干燥基板的湿式站。在进行下一个制造步骤之前，这种先进的设备在确保基板的清洁和质量方面起着关键作用。DNS SU-3200设计为处理基板的精度和一致性，以满足现代半导体制造的严格要求。SCREEN SU 3200的核心是其先进的清洁和干燥功能，这些功能对于去除底物中的污染物和残留物至关重要。湿站设有多个加工室，基板使用各种化学溶液和去离子水进行一系列清洗和冲洗循环。这些清洁过程经过精心控制，以达到高清洁度水平，防止最终半导体器件出现任何缺陷或可靠性问题。DNS SU 3200的主要特点之一是其灵活性和可扩展性，以适应半导体制造中常用的不同基材尺寸和类型。设备支持从小晶片到大面板的各种基材尺寸，让半导体制造商优化生产工艺，提高效率。而且，SU 3200可以用特定的清洗配方和工艺参数来定制，以满足不同半导体应用的独特需求。在性能方面，DNS/DAINIPPON/SCREEN SU 3200以其高吞吐量能力和高效的清洗过程为特点。该设备设计为在单批加工中处理大量基板，从而最大限度地提高生产率，减少制造周期时间。SCREEN SU-3200的清洁和干燥模块经过精心设计,可提供一致和可重复的结果,从而确保基板在整个制造过程中的质量和可靠性。DAINIPPON SU 3200配备了用户友好的界面和直观的控制系统，使操作员能够轻松设置处理配方，监控设备状态，分析清洁性能数据。该设备还配备了先进的传感器和监测系统，以确保清洁过程的安全和可靠性。这使半导体制造商能够在其生产设施中保持较高的工艺控制和质量标准。总之，DAINIPPON SU-3200湿式站是半导体制造中一种精密可靠的清洁干燥基板的解决方桉。SU-3200具有先进的清洁功能、高吞吐量性能和灵活的处理选项,对于希望在生产过程中实现高水平清洁和质量的半导体制造商来说,它是一个必不可少的工具。该设备的用户友好界面和先进的控制功能使其成为半导体行业优化制造效率和产品可靠性的宝贵资产。
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