二手 DNS / DAINIPPON SU-3000 #293809737 待售
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ID: 293809737
晶圆大小: 12"
优质的: 2008
Wafer cleaner, 12"
(4) Chambers
(4) Chemical cabinets: NH4OH, BHF, IPA
(2) Handling systems
Overhead transport system
Indexer unit
(4) Load ports
YASUKAWA XU-ACT153L-B01 ID/R Unit
Transfer unit
YASUKAWA XU-RC615L-A12 CR Unit
Fan Filter unit (FFU):
Type: 2T-445950GGE-SWALY
Material: Fluoridation resin filter
Capacity: 99.995 <% / 0.1 μm
Range: 0~0.4 m/sec and 0~0.6 m/sec
Process chamber: (4) MPC Chambers
Shield plate:
Shield plate IPA Dispense: IPA
Shield plate DIW Dispense: CO2 Water
Shield plate nozzle drain: CO2 Water
Shield plate nozzle drain: IPA
Scan nozzle 1:
Chemical 2 Dispense: DHF
DIW Dispense: CO2 Water
Chemical 4 Dispense: Bulk HF
Port 20 DHF reclaim line valve open: DHF
Port 21 ACID drain line valve close: Acid
Port 20 N2 Purge
Chemical 2 Nozzle drain: DHF
DIW and chemical 4 nozzle drain: CO2 Water and bulk HF
Scan nozzle 2:
DIW Dispense: CO2 Water
Nano spray: N2
Nano spray DIW Dispense: CO2 Water
Nano spray chemical 3 dispense: SC-1
Nano nozzle 2 chemical 3 dispense: SC-1
Nano spray composite: N2 and CO2 Water
Nano spray composite: N2 and SC-1
Scan nozzle 2 chemical 3 nozzle drain: SC-1
Backside nozzle:
Chemical 2 dispense: DHF
Chemical 3 dispense: SC-1
DIW Dispense: CO2 Water
Backside nozzle 5 Chemical 4 Dispense: Bulk HF
Backside umbrella nozzle dispense: CO2 Water
Backside nozzle pre dispense
Backside nozzle drain
Fixed nozzle:
Chuck rinse nozzle dispense: CO2 Water
Spin base rinse nozzle dispense: CO2 Water
Shield plate surface rinse nozzle Dispense: CO2 Water
Fixed nozzle dispense: CO2 Water
Spin base:
Material: PCTFE
Spin motor: AC Servo motor
Maximum revolution: 3000 RPM
Maximum acceleration: 1000 RPM/sec
Revolution accuracy: ±3 RPM (at 3000 RPM)
Chuck:
Chuck drive: Pulse motor
Material: PCTFE, ETFE
Wafer detection: Detection by chuck pins
Shield plate:
Material: HT-PVC
Revolution drive: AC Servo motor
Maximum revolution: 3000 RPM
Maximum acceleration: 1000 RPM/sec
Revolution accuracy: ±3 rpm (at 3000 RPM)
Up / Down shift: AC Servo motor
Minimum distance to the wafer surface: 0.3 mm
Splash guard:
Chemical collection structure
Material: PTFE
Up / Down shift: AC Servo motor
Shutter:
Drive: Air cylinder
(2) Chemical cabinets
Temperature control of low temperature
Chemical used: HF, NH4OH, IPA
Chemical mixing ratio: Premix
Range of temperature control: 20°C~35°C
Chemical filter: Chemlock housing, 0.1 μm
Circulation pump: Pillar
KOMATSU NES-2123-7 Circulator
KOMATSU GRS-612 Temperature controller
E-Flow:
Module: SD16L-24S W
HORIBA OE-960CE Resistivity meter
Resistivity sensor: ESD-001C-T
Sensor cable: CK-10M
Sensor holder: EFA-30
Relay: MY2N-CR DC24V
Fire extinguisher controller: Auto pulse 542R
2008 vintage.
DNS/DAINIPPON SU-3000湿站是一种高效可靠的湿蚀刻设备,用于工程和制造业的各种应用。它配备了脉冲式HF/HCl蚀刻室、两个独立的工作箱、高压流体输送系统以及用于改进材料装卸的集成托盘单元。DNS SU-3000的独特设计为用户提供了更高的安全性,提高了蚀刻结果的质量,并显着减少了废料。HF/HCl蚀刻室的设计旨在提供精确的蚀刻控制水平和准确性,同时最大限度地减少操作它所需的能量。腔室内部涂有耐腐蚀的陶瓷材料,以防止侵蚀,并确保一致的蚀刻过程。浮雕表面采用水文几何形状和纵向抛物线建造,为用户提供均匀的蚀刻深度和极高精度和精确度的表面光洁度。除了HF/HCl蚀刻室外,DAINIPPON SU 3000还包括两个独立的工作槽,每个工作槽支持不同的蚀刻工艺。因为每个罐体的设计,放置在其中的材料可以很容易地从一个移动到另一个,允许快速的方法交换和化学溷合。每个罐体都配有一个蠕动泵和一台压力机来输送HF/HCl溶液,最大压力为50 bar(725 psi)。DNS SU 3000还包括一个集成的托盘工具,用于改进物料加载和处理。托盘采用人体工程学设计,便于装卸蚀刻材料。该资产的设计目的是大大减少停机时间,并且在较短的时间内比其他湿蚀刻系统执行更多的工艺。总体而言,SU-3000湿站是一种顶级的蚀刻模型,非常适合在各种应用中使用。这些设备提高了安全性,提高了蚀刻结果的质量,并大大减少了废料。它以严格的质量控制标准为后盾,在可靠性和精确度方面达到最高标准。
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