二手 LAM RESEARCH 2300 Versys #9161243 待售

LAM RESEARCH 2300 Versys
ID: 9161243
晶圆大小: 12"
Metal etcher, 12" EFEM: Part no Load port (1): 002-7200-21 Load port (2): 002-7200-32 Atm robot: No Wafer alignment: 03121001 Power control rack: AC Rack: Model no: 2300 Vintage: 2003 Rear user interface monitor: Yes Robot controller: No P/C: Yes Vacuum TM: Airlock (Right): Yes Airlock (Left): Yes VTM Robot: No TM / PM Facility lines: Yes Slop valve load lock (Right): Yes Slop valve load lock (Left): Yes Vacuum TM: Part No Inner door Assy (Air lock Right): 853-007861-231 Inner door Assy (Air lock Left): 853-007861-003 Inner door Assy (PM2): 853-007859-002 Inner door Assy (PM3): 853-007859-212 Inner door Assy (PM4): 853-007859-212 Process module: PM2: 2300 Poly: Model no: Metal 2300 Vintage: 2003 TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23747 Range: 0.1 Torr Process manometer valve assy: Yes AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM1: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator (12/12): 12/12 RPDB Power box: Yes PM3: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: Yes AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM2: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: No MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 10/12 PM4: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: No AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Foreline Assy: No He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM3: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 12/12.
LAM RESEARCH 2300 Versys是一个全自动蚀刻/asher平台,由半导体制造技术的领先供应商LAM RESEARCH开发。它旨在满足设备生产商的具体需求,包括先进的CMOS、MEMS和电力行业的需求。Versys利用等离子体蚀刻和灰烬技术,精确创建高精度的特征,以严格的公差。蚀刻组件具有优化的LAMSource微波发生器、精密蚀刻室和专有的气体输送设备。Ashing组件采用ChamberPlus ashing工艺,高反应性、低泄漏、低温ashing系统。Versys的设计带有严密的工艺窗口,使其能够蚀刻、灰烬,并以微米级的精度定义特征。其高可靠性和可重复性进一步确保了精度,即使在复杂且最具挑战性的配置文件上也是如此。蚀刻和灰分过程由剂量监控和边缘管理,从而可以完全控制预定义和自定义地形中的蚀刻和灰分剖面。晶圆处理单元是完全自动化和基于解决方桉的,这简化了在一台机器上按时处理和加倍作业的交付。Versys用户友好,具有大而易于阅读的触摸屏界面、全面的蚀刻和灰库,以及强大的数据收集功能。它还提供实时性能监测和控制,包括对状态、警报和跟踪的审查。Versys是一个完整的蚀刻/灰分解决方桉,旨在提高产品性能和生产力。Versys是一款可靠的工具,具有较高的工艺产量和最长的正常运行时间,旨在以可靠、经济高效的方式快速提供产品改进。
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