二手 LAM RESEARCH 2300 Versys #9161243 待售
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ID: 9161243
晶圆大小: 12"
Metal etcher, 12"
EFEM: Part no
Load port (1): 002-7200-21
Load port (2): 002-7200-32
Atm robot: No
Wafer alignment: 03121001
Power control rack:
AC Rack:
Model no: 2300
Vintage: 2003
Rear user interface monitor: Yes
Robot controller: No
P/C: Yes
Vacuum TM:
Airlock (Right): Yes
Airlock (Left): Yes
VTM Robot: No
TM / PM Facility lines: Yes
Slop valve load lock (Right): Yes
Slop valve load lock (Left): Yes
Vacuum TM: Part No
Inner door Assy (Air lock Right): 853-007861-231
Inner door Assy (Air lock Left): 853-007861-003
Inner door Assy (PM2): 853-007859-002
Inner door Assy (PM3): 853-007859-212
Inner door Assy (PM4): 853-007859-212
Process module:
PM2:
2300 Poly:
Model no: Metal 2300
Vintage: 2003
TCP Match: Yes
TCP Coil: Yes
Bias match: Yes
Process manometer:
Model no: E28B-23747
Range: 0.1 Torr
Process manometer valve assy: Yes
AC/SSR Box: Yes
Fore line manometer: Yes
Turbo pump fore line isolation valves, manometers: Yes
Turbo pump: Yes (ATM2300M)
VME Assembly: Yes
VAT Pendulum valve: Yes
Fore line Assy: Yes
He cooling / Lift box: Yes
Motor stepper board: Yes
RF Cart: PM2
Turbo controller: Yes
Generator (TCP): Yes (660-900984-008)
Generator (BIAS): Yes (3155059-026)
PM1:
Gas box (GIB): Yes
MFC 1_CL2: Yes
MFC 2_HBR: Yes
MFC 3_SF6: Yes
MFC 4_AR: Yes
MFC 5_N2: Yes
MFC 6_CF4: Yes
MFC 7_O2: Yes
MFC 8_SF6: Yes
MFC 9_HE: Yes
MFC 10_O2: Yes
MFC 11_NF3: Yes
MFC 12_30%O2/HE: Yes
Regulator (12/12): 12/12
RPDB Power box: Yes
PM3:
TCP Match: Yes
TCP Coil: Yes
Bias match: Yes
Process manometer:
Model no: E28B-23743
Range: 0.1 Torr
Process manometer valve assy: Yes
AC / SSR Box: Yes
Fore line manometer: Yes
Turbo pump fore line isolation valves, manometers: Yes
Turbo pump: Yes (ATM2300M)
VME Assembly: Yes
VAT Pendulum valve: Yes
Fore line Assy: Yes
He cooling / Lift box: Yes
Motor stepper board: Yes
RF Cart: PM2
Turbo controller: Yes
Generator (TCP): Yes (660-900984-008)
Generator (BIAS): Yes (3155059-026)
PM2:
Gas box (GIB): Yes
MFC 1_CL2: Yes
MFC 2_HBR: Yes
MFC 3_SF6: Yes
MFC 4_AR: Yes
MFC 5_N2: Yes
MFC 6_CF4: Yes
MFC 7_O2: No
MFC 8_SF6: Yes
MFC 9_HE: Yes
MFC 10_O2: Yes
MFC 11_NF3: Yes
MFC 12_30%O2/HE: Yes
Regulator(12/12): 10/12
PM4:
TCP Match: Yes
TCP Coil: Yes
Bias match: Yes
Process manometer:
Model no: E28B-23743
Range: 0.1 Torr
Process manometer valve assy: No
AC / SSR Box: Yes
Fore line manometer: Yes
Turbo pump fore line isolation valves, manometers: Yes
Turbo pump: Yes (ATM2300M)
VME Assembly: Yes
VAT Pendulum valve: Yes
Foreline Assy: No
He cooling / Lift box: Yes
Motor stepper board: Yes
RF Cart: PM2
Turbo controller: Yes
Generator (TCP): Yes (660-900984-008)
Generator (BIAS): Yes (3155059-026)
PM3:
Gas box (GIB): Yes
MFC 1_CL2: Yes
MFC 2_HBR: Yes
MFC 3_SF6: Yes
MFC 4_AR: Yes
MFC 5_N2: Yes
MFC 6_CF4: Yes
MFC 7_O2: Yes
MFC 8_SF6: Yes
MFC 9_HE: Yes
MFC 10_O2: Yes
MFC 11_NF3: Yes
MFC 12_30%O2/HE: Yes
Regulator(12/12): 12/12.
LAM RESEARCH 2300 Versys是一个全自动蚀刻/asher平台,由半导体制造技术的领先供应商LAM RESEARCH开发。它旨在满足设备生产商的具体需求,包括先进的CMOS、MEMS和电力行业的需求。Versys利用等离子体蚀刻和灰烬技术,精确创建高精度的特征,以严格的公差。蚀刻组件具有优化的LAMSource微波发生器、精密蚀刻室和专有的气体输送设备。Ashing组件采用ChamberPlus ashing工艺,高反应性、低泄漏、低温ashing系统。Versys的设计带有严密的工艺窗口,使其能够蚀刻、灰烬,并以微米级的精度定义特征。其高可靠性和可重复性进一步确保了精度,即使在复杂且最具挑战性的配置文件上也是如此。蚀刻和灰分过程由剂量监控和边缘管理,从而可以完全控制预定义和自定义地形中的蚀刻和灰分剖面。晶圆处理单元是完全自动化和基于解决方桉的,这简化了在一台机器上按时处理和加倍作业的交付。Versys用户友好,具有大而易于阅读的触摸屏界面、全面的蚀刻和灰库,以及强大的数据收集功能。它还提供实时性能监测和控制,包括对状态、警报和跟踪的审查。Versys是一个完整的蚀刻/灰分解决方桉,旨在提高产品性能和生产力。Versys是一款可靠的工具,具有较高的工艺产量和最长的正常运行时间,旨在以可靠、经济高效的方式快速提供产品改进。
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