二手 DNS / DAINIPPON 629 #9272101 待售
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ID: 9272101
Coater / Developer system, 6"
Specifications:
Variety: Coater
Loader / Unloader
Step motor driving system
Individual unit control
I/H Unit, 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer loading method: Handling arm with vacuum
Digital wafer sensor
Step motor driving system
Bake, 6"
Bake type: HP+CP (H.M.D.S)
Wafer loading method: Wire moving with cylinder
Spin unit (Develop):
Wafer size: 6"
Develop type: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving: Moving with step motor
Spin unit (Coater):
Wafer size: 6"
Coating method: Rotation with spin motor (Maximum 6000 RPM)
P/R Discharge method: Bellows pump
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
2 Nozzle type (1/8") / Track
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
P.R Dispense (maximum): 20 cc / 1 Stock
Waste liquid drain: Manual drain
Wafer moving: Moving with step motor
Bake:
Wafer size: 6"
Bake type: H.P 2-Stage
Bake temperature (maximum): 250°C
Wafer moving: Moving with cylinder
Utility specifications:
Main power:
AC 110 V / 30 A / Single phase
AC 220 V / 30 A / Single phase
Air pressure: 4~5 Kg/Cm²
N2 Pressure: 3~4 Kg/Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg)
Bake exhaust: 70 mm (20 mm Hg)
Variety: Develop
Composition
Loader I/H unit develop
I/H Unit unloader
Unit configurations:
Loader / Unloader
Wafer size: 6"
Step motor driving
Individual unit control
I/H Unit:
Wafer size: 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer moving method: Arm with vacuum
Digital wafer sensor
Step motor driving
Spin unit (Develop):
Wafer size: 6"
Develop method: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving method: Moving by step motor
Utility specifications:
Main power:
AC 110 V / 30 A / Single Phase
AC 220 V / 30 A / Single Phase
Air pressure: 4~5 Kg / Cm²
N2 Pressure: 3 ~ 4 Kg / Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg).
DNS/DAINIPPON 629是由DNS Screen Mfg. Co.开发的一款创新光刻设备。有限公司，旨在提高工厂效率，降低运营成本。该系统由三个组件组成：光敏材料、显影剂和曝光源。光致抗蚀剂材料是一种光敏溶剂溶解的聚合物，当暴露于某些波长的光时会变硬。显影剂起到溶剂的作用，在没有暴露的地方去除了光致抗蚀剂材料。这允许由光敏材料形成图样。最后，曝光源是一种辐照装置，其设计目的是发射特定波长的光，以暴露光敏材料。机器的工作原理是将光敏材料的薄膜喷涂到基材上。然后使用曝光源对光刻胶材料进行曝光，并使用显影剂去除未曝光的光刻胶材料区域。这会创建可用于多种用途的图样,例如创建用于在纺织品上进行丝网印刷的模板。与传统光刻相比,DNS 629工具具有多种优势。它需要更少和更便宜的组件,易于设置,并且需要更少的维护。此外,光刻材料的精确度很高,其图样偏差仅为1%,远好于传统光刻中提供的3-5%的范围。此外,该资产在成功打印错综复杂的图案方面提供了很大的灵活性。它能很好地处理各种基材，从纸张和织物到玻璃和陶瓷，并且可以轻松处理各种光刻材料。总而言之，DAINIPPON 629机型是寻求降低成本和提高效率的工厂的绝佳选择。它可以产生高精度和灵活性的复杂和详细的模式，使其成为许多应用程序的理想选择。
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