二手 DNS / DAINIPPON 80A #9133638 待售
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ID: 9133638
Scrubber
Top side spin
(1) Brush scrub
Brush material: Mohair brush or PVA brush
Brush contact distance: +1mm to -5mm max from wafer surface (adjustable at unit of 0.01mm)
Brush revolutions: 440 rpm/60Hz, 380 rpm/50Hz (allowance of revolutions: ±10% max), non-rotation also settable
Brush cleaning function: DI water washing at the brush standby zone by straight nozzle
(1) Nano spray nozzle scrub
Nozzle scanning scrub by high pressure DI water/N2
Nano nozzle angle: Approx 90 deg. to wafer surface
(1) Nano nozzle
Filter PALL DFA-4201 NIEY 0.1um
(1) DI water rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml/min
(1) Back rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 200 ml /min
(1) Brush cleaning
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml /min
Back Side Spin Scrubber Specification:
(1) Brush scrub
Brush: 0.1mm Nylon or PVA brush
Brush contact distance: +1mm to -5mm max from wafer surface(adjustable at unit of 0.01mm)
Brush revolutions: 440 rpm/60Hz, 380 rpm/50Hz (allowance of revolutions: ±10% max), non-rotation also settable
Brush cleaning function: DI water washing at the brush standby zone by straight nozzle
(1) D-sonic nozzle
Nozzle scanning scrub by D-sonic DI water
Nozzle material: PP,PFA,PVDF
Nozzle angle: Approx 90 deg. to wafer surface
(1) D-sonic DI water nozzle
Filter PALL DFA-4201 NIEY 0.1um
(1) DI water rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml/min
(1) Back rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 500 ml /min
(1) Brush cleaning
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml /min
Spin motor specifications (Top Side Unit):
Motor: brushless servo motor
Revolution: 0 rpm to 4000rpm
(subject to load of 150mm silicon wafer)
Max. acceleration: 50000 rpm/s
(subject to load of 150mm silicon wafer)
Accuracy: ±1.5 rpm
Max. revolutions: 9990 rpm(motor individual)
Spin Motor Specification:(Back Side Unit)
Motor: brushless servo motor
Chuck pin : PEEK
Revolution: 0 rpm to 6000 rpm
(subject to load of 150mm silicon wafer)
Max. acceleration: 1000 rpm/s
(subject to load of 150mm silicon wafer)
Accuracy: ±1.5 rpm
Max. revolutions: 9990 rpm(motor individual)
Chuck positioning mechanism: driven by spin motor
D-Sonic nozzle specifications:
Ultrasonic output: Max 48 W (1.5 MHz)
Output current: 0.3 to 0.9A
DI water flow rate: 0.6 to 1.0 L/min (variable by needle)
Other specifications:
(1) DI water
(1) N2
(1) Vacuum
(1) Dry Air
(2) Spin exhausts.
DNS/DAINIPPON 80A是一种用于各种集成电路元件的芯片制造过程中的光阻设备。它是一个单一、自成一体的平台,提供对生产高性能、高产量半导体集成电路的过程至关重要的液晶抵抗化学、曝光光学、曝光后处理步骤。该系统包括一个汞弧灯,为单次或垂直双次曝光提供高霓虹灯-氙线输出。真空光学组件包含一个真空积分器,一个可调焦距间隔的可调聚焦冷凝器透镜,偏振玻璃和虹膜隔膜。光学组件还包含一个"火花"指示指示器,可用于通过磨砂冷凝器透镜观察电弧放电。抗蚀剂化学方法采用水基溶液,具有无软烘烤能力。这允许消除中间的开发步骤,从而提高吞吐量。抗蚀剂化学还具有对温度、湿度和光线照射影响的主动校正功能。该单元还包含一个曝光后处理或PET模块,旨在优化机器的性能。该模块包含红外能源和等离子体滤波器。等离子体滤波器减少了暴露的抗蚀层的排便,而红外能量源加速了固化过程,有助于减少发育时间。可以使用其他PET组件根据特定的应用程序要求进一步定制该工具。DNS 80A光刻资产是一种全自动模型,设计用于生产高性能和高产半导体集成电路的光刻设备。它的设计采用了最新的光学和抵抗化学技术,以优化吞吐量和产量,同时提供了一个成功的过程必不可少的灵活性。
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