二手 DNS / DAINIPPON SK-2000 #118481 待售
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ID: 118481
晶圆大小: 8"
优质的: 2003
Spin coater / Developer DUV track system, 8"
Wafer flow direction: L-type
Wafer type: Notch
IF-B
Spinner unit configuration:
(2) Coaters
B-ARC (2) Coaters
(3) Developers
Indexer:
Left type
Wafers: SEMI Standard wafers / Notch type
Standard type
(4) Uni cassettes
Coater:
SC1 (Unit 3) & SC2 (Unit 4):
Includes:
Cups
EBR Function
Resist lines: 8 Line
Resist pump: PDS-105G-KPV4
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
SC3 (Unit 5) & SC4 (Unit 6):
Cups: 1
Includes:
EBR Function
Resist pump: PDS-105G-KPV4
Resist lines: 4 Line
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
Bake:
HP: (6) Units (8, 9, 11, 12, 17, 18)
RHP: (8) Units (25, 26, 28, 29, 31, 32, 35, 36)
CP: (7) Units (7, 10, 16, 24, 27, 30, 34)
AHL: (3) Units (13, 14, 15)
EEW: Unit (33)
Developer:
SC1 (Unit 3) & SC2 (Unit 4):
Cups
Developer number nozzle
DIW Rinse nozzle
Back side rinse line
Flow meters with sensor: DEV, DIW1, DIW2, Back-side rinse, ORG, FWD
Includes:
Dev1
Prewet
DIW1
Back side rinse
TR Includes:
TR1 Arm
TR2 Arm
TR3 Arm
Others:
Thermo controller model: CET-CU, Mass 7kg
THC Model: SPC-2313-UC-A
CP Controller model: FRD-A200-UC
HMDS Supply type: Quart bottle to buffer tank
Thinner supply type: Canister tank
Developer supply type: Facility supply
EEW:
Unit (33)
Lamp house type with lamp house
Miscellaneous:
Signal tower lamp: 3 Color (Red, orange, green)
Sub module configuration:
Source bottle cabinet
SC Cabinet
ETU Cabinet
Controller cabinet
IFB ACU Cabinet
Input power supply box
Main gas valve close
Gas (Air, N2) line purge
Chemical (Developer, DIW) line purge
Drain PCW end capping
Gas line (N2) end capping
Chemical (Developer, DIW) line end capping
Spin unit (Coater & developer) exhaust line caping
Bake unit exhaust line caping
Leak check
Main power: 3 Phase, 200 V, full load 20.44 kVA, 59A
50/60 Hz, 3 Wires and GND/PE
Rating 400A, AIC 65kA, motor 8A
2003 vintage.
DNS/DAINIPPON SK-2000是为处理微细图桉而开发的高性能光刻胶设备。该系统采用独特、先进、精确的摄像机成像装置,旨在提供完美的配准和曝光控制,并允许使用各种光阻材料。为了获得最佳曝光和最大的灵活性,可以使用接触和投影工具。先进的接触曝光工具可产生极高质量的图像配准,在整个光掩模表面提供完全均匀的曝光。投影曝光工具旨在通过应用高精度光学机器来减少精细设备的失真,最终提高曝光精度、线性度和屈服度。该工具还提供高级功能,如亚微米分辨率、0.15微米最小曝光均匀性和曝光稳定性控制功能。亚微米分辨率保证了极小的光刻特征能够实现极好的精度和细节。曝光稳定性控制功能不仅允许精确调整曝光水平,还允许持续时间,这对于一致的结果至关重要。该资产拥有超高温曝光的高速模式,提高了吞吐量,减少了工艺时间。该模型的另一个特点是它能够从单个光源切换曝光波长,从而能够对不同的曝光类型使用多种灵敏度。关于DNS SK2000光致抗蚀剂设备,该设计对温度变化具有很强的鲁棒性,显着降低了颗粒,提高了整体暴露可靠性。总体而言,此系统为需要超精细图桉的光刻应用提供了最佳解决方桉。
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