二手 DNS / DAINIPPON SK-2000 #118481 待售

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製造商
DNS / DAINIPPON
模型
SK-2000
ID: 118481
晶圆大小: 8"
优质的: 2003
Spin coater / Developer DUV track system, 8" Wafer flow direction: L-type Wafer type: Notch IF-B Spinner unit configuration: (2) Coaters B-ARC (2) Coaters (3) Developers Indexer: Left type Wafers: SEMI Standard wafers / Notch type Standard type (4) Uni cassettes Coater: SC1 (Unit 3) & SC2 (Unit 4): Includes: Cups EBR Function Resist lines: 8 Line Resist pump: PDS-105G-KPV4 Cup rinse function Back side rinse Cup rinse Pot rinse EBR (Edge bead removal) Prewet function SC3 (Unit 5) & SC4 (Unit 6): Cups: 1 Includes: EBR Function Resist pump: PDS-105G-KPV4 Resist lines: 4 Line Cup rinse function Back side rinse Cup rinse Pot rinse EBR (Edge bead removal) Prewet function Bake: HP: (6) Units (8, 9, 11, 12, 17, 18) RHP: (8) Units (25, 26, 28, 29, 31, 32, 35, 36) CP: (7) Units (7, 10, 16, 24, 27, 30, 34) AHL: (3) Units (13, 14, 15) EEW: Unit (33) Developer: SC1 (Unit 3) & SC2 (Unit 4): Cups Developer number nozzle DIW Rinse nozzle Back side rinse line Flow meters with sensor: DEV, DIW1, DIW2, Back-side rinse, ORG, FWD Includes: Dev1 Prewet DIW1 Back side rinse TR Includes: TR1 Arm TR2 Arm TR3 Arm Others: Thermo controller model: CET-CU, Mass 7kg THC Model: SPC-2313-UC-A CP Controller model: FRD-A200-UC HMDS Supply type: Quart bottle to buffer tank Thinner supply type: Canister tank Developer supply type: Facility supply EEW: Unit (33) Lamp house type with lamp house Miscellaneous: Signal tower lamp: 3 Color (Red, orange, green) Sub module configuration: Source bottle cabinet SC Cabinet ETU Cabinet Controller cabinet IFB ACU Cabinet Input power supply box Main gas valve close Gas (Air, N2) line purge Chemical (Developer, DIW) line purge Drain PCW end capping Gas line (N2) end capping Chemical (Developer, DIW) line end capping Spin unit (Coater & developer) exhaust line caping Bake unit exhaust line caping Leak check Main power: 3 Phase, 200 V, full load 20.44 kVA, 59A 50/60 Hz, 3 Wires and GND/PE Rating 400A, AIC 65kA, motor 8A 2003 vintage.
DNS/DAINIPPON SK-2000是为处理微细图桉而开发的高性能光刻胶设备。该系统采用独特、先进、精确的摄像机成像装置,旨在提供完美的配准和曝光控制,并允许使用各种光阻材料。为了获得最佳曝光和最大的灵活性,可以使用接触和投影工具。先进的接触曝光工具可产生极高质量的图像配准,在整个光掩模表面提供完全均匀的曝光。投影曝光工具旨在通过应用高精度光学机器来减少精细设备的失真,最终提高曝光精度、线性度和屈服度。该工具还提供高级功能,如亚微米分辨率、0.15微米最小曝光均匀性和曝光稳定性控制功能。亚微米分辨率保证了极小的光刻特征能够实现极好的精度和细节。曝光稳定性控制功能不仅允许精确调整曝光水平,还允许持续时间,这对于一致的结果至关重要。该资产拥有超高温曝光的高速模式,提高了吞吐量,减少了工艺时间。该模型的另一个特点是它能够从单个光源切换曝光波长,从而能够对不同的曝光类型使用多种灵敏度。关于DNS SK2000光致抗蚀剂设备,该设计对温度变化具有很强的鲁棒性,显着降低了颗粒,提高了整体暴露可靠性。总体而言,此系统为需要超精细图桉的光刻应用提供了最佳解决方桉。
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