二手 EEJA / ELECTROPLATING ENGINEERS OF JAPAN Cup-Plater #9280818 待售
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ID: 9280818
Electro Chemical Deposition (ECD) system
Used for Cu & Ni plating
Bench(Inner table): FM PVC material (Ivory)
Attached drawings:
Layout: K133-0001P-1
Process piping diagram: K133-0002M-1
Nitogen piping diagram: K133-0003M-1
Air piping diagram: K133-0004M-1
Vacuum piping diagram: K133-0005K-1
Plating cup:
Cup: HT-PVC material
Plating jigs:
Anode: Pt/Ti
Cathode: Ring type
Top plate: HT-PVC
Top ring: HT-PVC
Bridge disk: HT-PVC
Seal packing: Silicon
Top ring packing: Silicon
Diffuser: HT-PVC
Wafer press cup: Acrylic
Cylinder for pressure
Vacuum tweezers: Teflon(NC)
Reservoir tank:
Tank: HT-PVC
Capacity: 40 L
Level sensors: 2 points: low level ,empty level
Circulation pump: MD-100FY-3, 3 Phase, 200 V
Filter:10" length
Flow meter: 4-40L/min
Heater / Heater fuse: Teflon heater 2KW
Valve: Clean: HT-PVC
Piping: Clean: HT-PVC
Thermo sensor: Pt100 OHM
Di. Water rinse tank:
Tank: PVC
Capacity: 20L
Drain valve: Clean: PVC
Piping: Clean: PVC
Drag-out tank:
Tank: PVC
Capacity: 20L
Overflow: Not equipped
Drain valve: Clean: PVC
Piping: Clean: PVC
Process controller PLC:
Control range: plating control, interlock, alarm
Rectifier:
Capacity: 0-20 V, 4 A, constant current / constant voltage
Waveform: Direct Current
Touch panel:
Recipe choice
Recipe edit
Parameter set
Start
Manual pump operation
Alarm
Auto/Manual choice
Signal tower(3 color):
Plating: Green signal
Stand-by: Yellow signal
Alarm: Red signal
Others:
Hand shower: Front side
(2) Fluorescent light: 20W
Nitrogen gun : Front side
Vacuum tweezer- Front side
Nitrogen piping unit
Air piping unit
Vacuum piping unit.
EEJA/JAPAN CUP-Plater电镀工程师是为中等尺寸的基板设计的光敏涂层系统,具有优异的粘合力和薄薄的涂层厚度。EEJA Cup- Plater使用光刻,一种将图样转移到基板上的光刻工艺。这种模式转移是由光源或辐射完成的,可以采取紫外线灯、X射线、电子束、激光束等形式。基板再涂覆一种光致抗蚀剂,是一种对光和辐射能敏感的聚合物,形成薄膜。利用JAPAN CUP PLATER的电镀工程师,将光刻胶涂在基板上一层薄而均匀的层中。这是由于镀层结构的独特设计采用了杯形镀膜,允许涂层在特定区域实现。CUP PLATER还使用电镀工艺来施加光致抗蚀剂,利用基板和浴池材料之间的受控电势。当电势通过浴池时,它会导致溶液中溶解的金属原子被吸引到基板上,从而形成均匀的、纤薄的光致抗蚀剂涂层。除了电镀工艺外,EEJA CUP PLATER还利用了干燥工艺。这种干燥过程使用热气,如氮气或空气,蒸发光刻胶内的液体,从而产生快速的干燥时间和均匀的涂层厚度。JAPAN CUP的电镀工程师-PLATER的烘干能力也有助于提供优于传统自旋涂层或真空沉积工艺的附着力和均匀性。总体而言,杯式电镀器是一种有用且高效的系统,它以统一和高效的方式将光刻胶涂覆到大型基板上。它具有快速、均匀地干燥光刻胶的能力,使其成为需要均匀涂层厚度和牢固附着力的涂层应用的绝佳选择。此外,其精密的电镀工艺和杯状的镀浴有助于实现精确的薄涂层以及优异的附着性能。
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