二手 FSI / TEL / TOKYO ELECTRON Mercury MP #9161972 待售
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ID: 9161972
优质的: 1996
Spray processor, 8"
Software: 11
FSI Standard exhaust config: Yes
Dual exhaust: No
Turntable style (PFA vs. Ti vs. SS): PFA 918600-003
Motor and motor speed controller: Upgrade 232608-003
Booster pump: Yes, not dual
Helios: Yes
Ti T/C's: No
Canister remote length: 25'
Vertical lift kit length: 20'
Vertical lift kit: Some canisters
Center SP etch probe: No
SBSP: Yes
SBSP Etch probe: Yes
I/R Htr(P)ost Man / (C)hem spec: No
I/R Heater split manifold: No
I/R Heater bypass valves: No
CPU 286: No
CPU 486 25 mH: No
CPU 486 80 mH: No
CPU 586 Yes: 922081-001
HF Last: Yes
LPP w / Flowmeter: Yes
HF Last rinse bypass: Yes
DI MIX: Yes
H2SO4(Analog vs. NT): Yes
H2O2 (Analog vs. NT): NT 30-300, 915191-102
HF400: Yes
HF402 (Analog vs. NT): NT 15-150, 915191-101
HCL (Analog vs. NT): NT 15-150, 915191-101
NH4OH (Analog vs. NT): NT 15-150, 915191-101
Can position 1: Sulphuric (H2SO4)
Can position 2: Hydrofluoric (10:1)
Can position 3: Hydrofluoric (10:1)
Can position 4: Ammonium hydroxide (NH4OH)
Can position 5: Hydrochloric (HCl)
Can position 6: Hydrogen peroxide (H2O2)
HF / DI On-line blending: Yes
Manifold type: PFA
DI Flow switch / monitor: No
N2 Flow monitor: No
Recirculation: No
Chemical heater (Stand alone): No
N2 Heater: No
UPS: No
Component rinse: No
SECS Comm: Yes
Rear access: Yes
Chemical sampling: No
Photohelic monitor: Yes
MHS: No
Dual canister rotary board: No
Autofill: HF- SULFURIC
Remote touchscreen: No
Dual touchscreen: No
Direct feed: No
Process application #1: RCA Clean
Process application #2: B Clean
Process application #3: SPM Only
Process application #4: HF Last
Pressure / Flow settings
Bowl exhaust - IWC: 0.8 +/- 0.2
Bowl exhaust - FPM: N/A
1996 vintage.
FSI MERCURY MP是一款由FSI International, Inc开发的光刻胶设备。它用于半导体蚀刻过程中,半导体晶片暴露在紫外线下,改变了暴露材料的性质,更容易蚀刻掉。MERCURY MP系统使用真空光敏装置,允许对基板进行精确蚀刻。该机旨在为半导体晶片的细线蚀刻提供高性能、可靠的环境。真空光致抗蚀剂工具使用光投射资产和辐射室均匀暴露于紫外线。在辐照室中,高能紫外线投射到晶片上,使光敏材料暴露于光。曝光控制蚀刻深度,并消除了材料的底切或过度蚀刻的机会。该模型具有多种特点,有助于确保精确的控制和准确性。该设备使用精确的成像光学器件和坚固、高速的红外激光将光引导到晶圆上,允许非常精细的线路分辨率。该系统还利用精确的掩蔽和成像系统,结合高效的高性能光学投影单元(OPSM)进行均匀曝光。激光还能够快速调节其输出辐射,从而对曝光时间进行精确控制。FSI MERCURY MP机适合于广泛的光刻工艺,如深蚀刻和超细图桉。它还有一个先进的、可编程的用户界面,可以让用户快速、轻松地设置参数,实时查看蚀刻过程。MERCURY MP工具是一种功能强大、精密的光刻资产,适用于半导体行业的精密蚀刻。它是生产高密度集成电路以及其他微电子器件的理想选择。该模型提供了可靠和高性能的环境,具有精确的成像光学器件和坚固的高速激光器,以及可编程的用户界面,从而能够快速轻松地设置参数。
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