二手 SEMITOOL Raider #293600285 待售
网址复制成功!
单击可缩放
ID: 293600285
晶圆大小: 12"
优质的: 2008
Systems, 12"
(8) Chambers
Substrate: Si, 12"
Chiller
DHF Mix tank
CO2 Bottle
S2 Computer
502SE Controller
Remote PPS
MARATHON Standard
Automation:
Type: (2) FOUP WIP (PGV compatible)
COAXIAL HT Robot
STI Robot controller
End effect controller:
Edge grip
Wet transfer edge grip
FOUP ID: ASYST, P/N: 9750-2000-000
HERMOS RF Tag reader
Vacuum source
Wafer protrusion sensor
Process module:
CPC 1, 10, 12
Process: SRD / Prewet
PTFE Spray chamber P/N: 271T0020-03
Rotor: Cantilever, N2 Wafer purge
Bulk fill supply with filter, 5"
IW Drain
Spray bar nozzel, P/N: 341 T0011-05
CPC 2
Process: Ni plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 110T0198-01, 111T0000-10
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction (mechanical)
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 3, 4, 9
Process: Solder plating (eutectic)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
CPC 5, 6, 7, 8
Process: Solder plating (high lead)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 11
Process: Cu Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 111T1197-01
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 50-55°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample Port
CPC 2
Ni Plating solution
Carbon polishing filter
Conditioning electrodes
pH Monitor
Sight tube
Power supply
Tank 2: High lead solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample Port
CPC 5, 6, 7, 8
Chemical: High lead plating Solution
Sight tube
Tank 3: Eutectic solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 3, 4, 9
Chemical: Eutectic plating solution
Sight tube
Tank 4: Cu
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 11
Cu Plating solution
Sight tube
Drains:
IW
Eutectic
Hi lead
Ni
Cu
Process:
Cu
Ni
Eutectic
High lead plating
Options:
(3) Heater chillers
AARU
Dl Booster pump cabinet and Interface
Power supply: 480 V, 4 Wire, 3 Phase
2008 vintage.
SEMITOOL Raider是由半导体设备制造商SEMITOOL于2001年推出的光阻设备。该系统使用喷涂涂层在半导体晶片上沉积一层光致抗蚀剂,用于随后的制图过程。入侵者的特点是有几个计算机控制的组件,包括一个负载锁定运输车,一个喷雾臂和一个粒子控制单元。SEMITOOL Raider每小时处理多达50个晶片,并在整个晶片表面产生均匀的抗蚀性轮廓。它从盒式磁带中卸载晶片,将其输送到喷雾臂,沉积抗蚀层,并将其输送到外部输送机。喷雾臂能够施加薄层(100-200 nm)的SU-8抗蚀剂。颗粒控制装置可确保颗粒不污染光致抗蚀剂,确保抗蚀剂涂层均匀。它监测喷雾室内的氧气浓度、湿度、温度和压力,以及监测环境中颗粒的浓度。Raider还有一个自动对焦单元,它可以保持对整个晶片表面的恒定聚焦。SEMITOOL Raider具有众多的安全特性,可以防止外部因素,如静电积聚和废气。每个系统都可以单独校准,以达到最大精度,喷雾臂完全机动化,以达到最大控制和精度。Raider是一种模块化机器,能够随着时间的推移升级其电子产品和组件。它的设计方式使其能够加工直径在1到12英寸之间的晶片。SEMITOOL Raider是半导体工业光刻胶应用的可靠选择工具。它维护程度低,可以例行处理大批量晶片,不需要过多的监督。它产生薄而均匀的抗蚀层,并确保环境保持清洁和无颗粒。Raider的构建考虑到了用户的安全,其各种安全功能确保操作员始终保持安全。
还没有评论