二手 SEMITOOL Raider #293600285 待售

製造商
SEMITOOL
模型
Raider
ID: 293600285
晶圆大小: 12"
优质的: 2008
Systems, 12" (8) Chambers Substrate: Si, 12" Chiller DHF Mix tank CO2 Bottle S2 Computer 502SE Controller Remote PPS MARATHON Standard Automation: Type: (2) FOUP WIP (PGV compatible) COAXIAL HT Robot STI Robot controller End effect controller: Edge grip Wet transfer edge grip FOUP ID: ASYST, P/N: 9750-2000-000 HERMOS RF Tag reader Vacuum source Wafer protrusion sensor Process module: CPC 1, 10, 12 Process: SRD / Prewet PTFE Spray chamber P/N: 271T0020-03 Rotor: Cantilever, N2 Wafer purge Bulk fill supply with filter, 5" IW Drain Spray bar nozzel, P/N: 341 T0011-05 CPC 2 Process: Ni plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 110T0198-01, 111T0000-10 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction (mechanical) Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 3, 4, 9 Process: Solder plating (eutectic) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact CPC 5, 6, 7, 8 Process: Solder plating (high lead) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 11 Process: Cu Plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 111T1197-01 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 50-55°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample Port CPC 2 Ni Plating solution Carbon polishing filter Conditioning electrodes pH Monitor Sight tube Power supply Tank 2: High lead solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample Port CPC 5, 6, 7, 8 Chemical: High lead plating Solution Sight tube Tank 3: Eutectic solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample port CPC 3, 4, 9 Chemical: Eutectic plating solution Sight tube Tank 4: Cu Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 25°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample port CPC 11 Cu Plating solution Sight tube Drains: IW Eutectic Hi lead Ni Cu Process: Cu Ni Eutectic High lead plating Options: (3) Heater chillers AARU Dl Booster pump cabinet and Interface Power supply: 480 V, 4 Wire, 3 Phase 2008 vintage.
SEMITOOL Raider是由半导体设备制造商SEMITOOL于2001年推出的光阻设备。该系统使用喷涂涂层在半导体晶片上沉积一层光致抗蚀剂,用于随后的制图过程。入侵者的特点是有几个计算机控制的组件,包括一个负载锁定运输车,一个喷雾臂和一个粒子控制单元。SEMITOOL Raider每小时处理多达50个晶片,并在整个晶片表面产生均匀的抗蚀性轮廓。它从盒式磁带中卸载晶片,将其输送到喷雾臂,沉积抗蚀层,并将其输送到外部输送机。喷雾臂能够施加薄层(100-200 nm)的SU-8抗蚀剂。颗粒控制装置可确保颗粒不污染光致抗蚀剂,确保抗蚀剂涂层均匀。它监测喷雾室内的氧气浓度、湿度、温度和压力,以及监测环境中颗粒的浓度。Raider还有一个自动对焦单元,它可以保持对整个晶片表面的恒定聚焦。SEMITOOL Raider具有众多的安全特性,可以防止外部因素,如静电积聚和废气。每个系统都可以单独校准,以达到最大精度,喷雾臂完全机动化,以达到最大控制和精度。Raider是一种模块化机器,能够随着时间的推移升级其电子产品和组件。它的设计方式使其能够加工直径在1到12英寸之间的晶片。SEMITOOL Raider是半导体工业光刻胶应用的可靠选择工具。它维护程度低,可以例行处理大批量晶片,不需要过多的监督。它产生薄而均匀的抗蚀层,并确保环境保持清洁和无颗粒。Raider的构建考虑到了用户的安全,其各种安全功能确保操作员始终保持安全。
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