二手 SEMITOOL Raider #293635960 待售
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ID: 293635960
晶圆大小: 12"
Single wafer processing system, 12"
Model No: RE12F2ECD1204
Substrate: Si, 12"
S2 Computer
502SE Controller
Remote PPS
MARATHON Standard
Interface: CDRU, AARU
(6) CCD Cameras
Process: Cu, Ni, Eutectic, High lead plating
Automation:
Type: (2) FOUP WIP (PGV Compatible)
COAXIAL HT Robot
STI Robot controller
End effect controller:
Edge grip
Wet transfer edge grip
FOUP ID: ASYST, P/N: 9750-2000-000
HERMOS RF Tag reader
Vacuum source
Wafer protrusion sensor
Process module:
CPC 1, 10, 12:
Process: SRD / Prewet
PTFE Spray chamber P/N: 271T0020-03
Rotor: Cantilever, N2 Wafer purge
Bulk fill supply with filter, 5"
IW Drain
Spray bar nozzel, P/N: 341 T0011-05
CPC 2:
Process: Ni Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 110T0198-01, 111T0000-10
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction (Mechanical)
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 3, 4, 9:
Process: Solder plating (Eutectic)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
CPC 5, 6, 7, 8:
Process: Solder plating (High lead)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 11:
Process: Cu Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 111T1197-01
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 50-55°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 2
Ni Plating solution
Carbon polishing filter
Conditioning electrodes
pH Monitor
Sight tube
Power supply
Tank 2: High lead solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 5, 6, 7, 8
Chemical: High lead plating solution
Sight tube
Tank 3: Eutectic solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 3, 4, 9
Chemical: Eutectic plating solution
Sight tube
Tank 4: Cu
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 11
Cu Plating solution
Sight tube
Drains: IW, Eutectic, Hi lead, Ni, Cu
Options:
(3) Heater chillers
Dl Booster pump cabinet and Interface
Power supply: 480 V, 4 Wire, 3-Phase.
SEMITOOL Raider光电抗蚀剂设备是一种全自动旋转涂层显影批处理器,专为生产光刻标线而设计。该系统能够产生具有一致特征尺寸、长宽比和分辨率的高质量光刻胶图桉。它具有多区域温度控制和多涂层及开发过程,提供精确和可重复的结果。Raider附带了一个用于配方控制的集成软件包,允许用户轻松地为每个配方指定参数设置。该软件具有工艺优化功能,以确保涂层质量和性能最佳。它还允许配方定制,包括能够为不同的光刻胶项目创建多种配方。SEMITOOL Raider利用一个健壮的雾化器单元,在基板上均匀分布和沉积光刻剂。雾化器具有可调的速度控制,以确保在基板上均匀涂层。在使用光致抗蚀剂后,将其在自旋烘干机中干燥,利用强制空气从光致抗蚀剂中除去任何残留的溶剂。入侵者配备了一个自动激光标记,允许用户在基板上创建模式。激光记号器具有可调节的电源设置,以确保最佳的分辨率和准确性。在创建图样后,将它们传送到Spin Wet站,在该站与润湿剂和开发人员接触,以便对图样进行精确蚀刻。蚀刻完成后,阵列将被转移到Spin Developer阶段。在这里,显影剂化学物质被应用到基材上,以激活蚀刻过程并去除任何不需要的残留物。开发过程由冲洗站完成,对开发的基板进行清洗和冲洗,以达到最佳的最终结果。利用SEMITOOL Raider光刻机为用户的光刻项目提供可靠、可重复的结果。该工具提供了从涂层到蚀刻再到开发过程的全面自动化和控制。集成的软件和多区控制环境使用户能够保持一致的模式大小、长宽比和分辨率,从而使他们有信心开发一致的标线。
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